JPS5521109B2 - - Google Patents
Info
- Publication number
- JPS5521109B2 JPS5521109B2 JP13009775A JP13009775A JPS5521109B2 JP S5521109 B2 JPS5521109 B2 JP S5521109B2 JP 13009775 A JP13009775 A JP 13009775A JP 13009775 A JP13009775 A JP 13009775A JP S5521109 B2 JPS5521109 B2 JP S5521109B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13009775A JPS5253778A (en) | 1975-10-29 | 1975-10-29 | Ion plating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13009775A JPS5253778A (en) | 1975-10-29 | 1975-10-29 | Ion plating apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5253778A JPS5253778A (en) | 1977-04-30 |
| JPS5521109B2 true JPS5521109B2 (en, 2012) | 1980-06-07 |
Family
ID=15025872
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13009775A Granted JPS5253778A (en) | 1975-10-29 | 1975-10-29 | Ion plating apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5253778A (en, 2012) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6210267A (ja) * | 1985-07-05 | 1987-01-19 | Seiko Electronic Components Ltd | イオンプレーティング装置 |
| JPS63105960A (ja) * | 1986-06-07 | 1988-05-11 | Kawasaki Steel Corp | 密着性に優れたイオンプレ−テイング被膜をそなえる金属ストリツプの製造方法およびイオンプレ−テイング装置 |
| US5474611A (en) * | 1992-05-20 | 1995-12-12 | Yoichi Murayama, Shincron Co., Ltd. | Plasma vapor deposition apparatus |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5025146Y2 (en, 2012) * | 1971-02-03 | 1975-07-29 | ||
| JPS5120170B2 (en, 2012) * | 1972-01-27 | 1976-06-23 | ||
| JPS5229991B2 (en, 2012) * | 1973-03-20 | 1977-08-05 | ||
| JPS539191B2 (en, 2012) * | 1973-07-03 | 1978-04-04 |
-
1975
- 1975-10-29 JP JP13009775A patent/JPS5253778A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5253778A (en) | 1977-04-30 |