JPS5250285A - Apparatus for inspecting defects of patterns having directional charac teristics - Google Patents

Apparatus for inspecting defects of patterns having directional charac teristics

Info

Publication number
JPS5250285A
JPS5250285A JP50125413A JP12541375A JPS5250285A JP S5250285 A JPS5250285 A JP S5250285A JP 50125413 A JP50125413 A JP 50125413A JP 12541375 A JP12541375 A JP 12541375A JP S5250285 A JPS5250285 A JP S5250285A
Authority
JP
Japan
Prior art keywords
directional
patterns
inspecting defects
charac teristics
defects
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50125413A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5624203B2 (en, 2012
Inventor
Masakata Minami
Hidekazu Sekizawa
Hiroshi Masuda
Tomohide Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP50125413A priority Critical patent/JPS5250285A/ja
Publication of JPS5250285A publication Critical patent/JPS5250285A/ja
Publication of JPS5624203B2 publication Critical patent/JPS5624203B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Character Discrimination (AREA)
JP50125413A 1975-10-20 1975-10-20 Apparatus for inspecting defects of patterns having directional charac teristics Granted JPS5250285A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50125413A JPS5250285A (en) 1975-10-20 1975-10-20 Apparatus for inspecting defects of patterns having directional charac teristics

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50125413A JPS5250285A (en) 1975-10-20 1975-10-20 Apparatus for inspecting defects of patterns having directional charac teristics

Publications (2)

Publication Number Publication Date
JPS5250285A true JPS5250285A (en) 1977-04-22
JPS5624203B2 JPS5624203B2 (en, 2012) 1981-06-04

Family

ID=14909482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50125413A Granted JPS5250285A (en) 1975-10-20 1975-10-20 Apparatus for inspecting defects of patterns having directional charac teristics

Country Status (1)

Country Link
JP (1) JPS5250285A (en, 2012)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5077082A (en, 2012) * 1973-11-08 1975-06-24

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5077082A (en, 2012) * 1973-11-08 1975-06-24

Also Published As

Publication number Publication date
JPS5624203B2 (en, 2012) 1981-06-04

Similar Documents

Publication Publication Date Title
FR2316635A1 (fr) Methode permettant de former des masques epais
JPS5328375A (en) Inspecting method
JPS5265671A (en) Apparatus for testing defects in pattern
GB1461141A (en) Method for inspecting flaws of material
NO141064C (no) Apparat til aa redusere intensiteten av lys
JPS5250285A (en) Apparatus for inspecting defects of patterns having directional charac teristics
JPS5238887A (en) Apparatus for inspection of pattern defects
JPS5250284A (en) Apparatus for inspecting defects of patterns having directional charac teristics
JPS5254483A (en) Method of inspecting photo mask patterns, etc.
JPS5250749A (en) Inspector for defects in directional pattern
JPS5428688A (en) Defect judging method of quadrilateral patterns
JPS53102792A (en) Simultaneous inspecting apparatus of inside and outside of body to be inspected
JPS5223355A (en) Process for fabricating a flush type light wave guiding path
JPS57102611A (en) Liquid crystal display device equipped with mask
NO144321C (no) Apparat for absorbsjon av gasser.
JPS5414790A (en) Surface inspecting apparatus
JPS528884A (en) No reflow detector unit
JPS5252391A (en) Device for visually indicating light pattern
JPS5232676A (en) Pattern check system
JPS5222479A (en) Method of inspecting masks
JPS5382492A (en) Surface inspecting method
JPS5440686A (en) Defect inspector
JPS5231674A (en) Defects pattern detection system
JPS51120774A (en) Multi-wavelength analyzer
JPS5232271A (en) Inspection method and equipment for photomask pattern