JPS52156782A - Planetary jig for vacuum evaporation - Google Patents
Planetary jig for vacuum evaporationInfo
- Publication number
- JPS52156782A JPS52156782A JP7314976A JP7314976A JPS52156782A JP S52156782 A JPS52156782 A JP S52156782A JP 7314976 A JP7314976 A JP 7314976A JP 7314976 A JP7314976 A JP 7314976A JP S52156782 A JPS52156782 A JP S52156782A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum evaporation
- planetary jig
- evaporated
- back surface
- planetary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
PURPOSE:To prevent the sticking of the evaporated substance to the back surface of the back surface of the material to be evaporated (e.g. semiconductor wafer) due to goinground of the evaporated substance, by arranging the shutter plate formed so as to cover the groove at the circumferential part of the substrate while conforming to the groove part.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7314976A JPS52156782A (en) | 1976-06-23 | 1976-06-23 | Planetary jig for vacuum evaporation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7314976A JPS52156782A (en) | 1976-06-23 | 1976-06-23 | Planetary jig for vacuum evaporation |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52156782A true JPS52156782A (en) | 1977-12-27 |
Family
ID=13509834
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7314976A Pending JPS52156782A (en) | 1976-06-23 | 1976-06-23 | Planetary jig for vacuum evaporation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52156782A (en) |
-
1976
- 1976-06-23 JP JP7314976A patent/JPS52156782A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB839082A (en) | Improvements in or relating to processes for making transistors | |
JPS52156782A (en) | Planetary jig for vacuum evaporation | |
JPS51135363A (en) | Method of manufacturing semiconductors and its equipment | |
JPS5415674A (en) | Semiconductor device containing schottky barrier | |
JPS5265183A (en) | Production process of thin film of compounds | |
JPS544567A (en) | Growing apparatus of ion beam crystal | |
JPS53108885A (en) | Evaporating device | |
JPS5380160A (en) | Manufacture of substrate for semiconductor device | |
JPS533168A (en) | Semiconductor evaporating apparatus | |
JPS5223265A (en) | Method of processing semiconductor materials | |
JPS5267983A (en) | Semiconductor unit | |
JPS52127752A (en) | Pduction of semiconductor unit | |
JPS532071A (en) | Manufacture of semiconductor device | |
JPS5372453A (en) | Manufacture for semiconductor device | |
JPS5267959A (en) | Manufacture of semiconductor element | |
JPS533167A (en) | Semiconductor evaporating apparatus | |
JPS5277584A (en) | Growing crystal | |
JPS5252366A (en) | Improvement of crystallinity of semiconductor crystals | |
JPS51132966A (en) | Semiconductor device | |
JPS5384691A (en) | Production of semiconductor device | |
JPS53135269A (en) | Forming method for electrode to semiconductor surface | |
JPS5367353A (en) | Manufacturing device of semiconductor crystal | |
JPS53104158A (en) | Manufacture for semiconductor device | |
JPS51118394A (en) | Light united semiconductor unit and manufacturing process | |
JPS5218168A (en) | Electrode formation method of semiconductor |