JPS52153673A - Method of manufacturing mask for xxray lithography - Google Patents

Method of manufacturing mask for xxray lithography

Info

Publication number
JPS52153673A
JPS52153673A JP7095277A JP7095277A JPS52153673A JP S52153673 A JPS52153673 A JP S52153673A JP 7095277 A JP7095277 A JP 7095277A JP 7095277 A JP7095277 A JP 7095277A JP S52153673 A JPS52153673 A JP S52153673A
Authority
JP
Japan
Prior art keywords
xxray
lithography
manufacturing mask
mask
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7095277A
Other languages
English (en)
Japanese (ja)
Inventor
Kotsuho Deiruku
Wainganto Kasupaaru
Shiyusutaauorudan Hansu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Corp
Original Assignee
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Corp filed Critical Siemens Corp
Publication of JPS52153673A publication Critical patent/JPS52153673A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Physical Vapour Deposition (AREA)
JP7095277A 1976-06-15 1977-06-15 Method of manufacturing mask for xxray lithography Pending JPS52153673A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762626851 DE2626851C3 (de) 1976-06-15 1976-06-15 Verfahren zur Herstellung von Masken für die Röntgenlithographie

Publications (1)

Publication Number Publication Date
JPS52153673A true JPS52153673A (en) 1977-12-20

Family

ID=5980611

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7095277A Pending JPS52153673A (en) 1976-06-15 1977-06-15 Method of manufacturing mask for xxray lithography

Country Status (7)

Country Link
JP (1) JPS52153673A (enrdf_load_stackoverflow)
BE (1) BE855701A (enrdf_load_stackoverflow)
DE (1) DE2626851C3 (enrdf_load_stackoverflow)
FR (1) FR2355314A1 (enrdf_load_stackoverflow)
GB (1) GB1544787A (enrdf_load_stackoverflow)
IT (1) IT1083777B (enrdf_load_stackoverflow)
NL (1) NL186201C (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55500707A (enrdf_load_stackoverflow) * 1978-09-13 1980-09-25
JPS6169133A (ja) * 1985-05-07 1986-04-09 Chiyou Lsi Gijutsu Kenkyu Kumiai 軟ｘ線露光方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2089524B (en) * 1980-12-17 1984-12-05 Westinghouse Electric Corp High resolution lithographic process
GB2121980B (en) * 1982-06-10 1986-02-05 Standard Telephones Cables Ltd X ray masks
DE3435178A1 (de) * 1983-09-26 1985-04-04 Canon K.K., Tokio/Tokyo Gegenstand mit maskenstruktur fuer die lithografie
DE3338717A1 (de) * 1983-10-25 1985-05-02 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung einer roentgenmaske mit metalltraegerfolie

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1948141A1 (de) * 1968-09-23 1970-04-23 Polaroid Corp Optisches Element mit Antireflexueberzug

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55500707A (enrdf_load_stackoverflow) * 1978-09-13 1980-09-25
JPS6169133A (ja) * 1985-05-07 1986-04-09 Chiyou Lsi Gijutsu Kenkyu Kumiai 軟ｘ線露光方法

Also Published As

Publication number Publication date
NL7706552A (nl) 1977-12-19
FR2355314B1 (enrdf_load_stackoverflow) 1981-08-14
DE2626851A1 (de) 1977-12-22
GB1544787A (en) 1979-04-25
DE2626851B2 (de) 1981-07-02
DE2626851C3 (de) 1982-03-18
FR2355314A1 (fr) 1978-01-13
NL186201C (nl) 1990-10-01
BE855701A (fr) 1977-10-03
IT1083777B (it) 1985-05-25

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