JPS5215267A - Fine processing method - Google Patents

Fine processing method

Info

Publication number
JPS5215267A
JPS5215267A JP50091127A JP9112775A JPS5215267A JP S5215267 A JPS5215267 A JP S5215267A JP 50091127 A JP50091127 A JP 50091127A JP 9112775 A JP9112775 A JP 9112775A JP S5215267 A JPS5215267 A JP S5215267A
Authority
JP
Japan
Prior art keywords
processing method
fine processing
film
irradiating
high resolution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50091127A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5521460B2 (enrdf_load_stackoverflow
Inventor
Keisuke Kobayashi
Yoshiki Kato
Seiji Yonezawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50091127A priority Critical patent/JPS5215267A/ja
Priority to NL7608152A priority patent/NL7608152A/xx
Priority to FR7622830A priority patent/FR2319926A1/fr
Priority to DE19762633947 priority patent/DE2633947A1/de
Publication of JPS5215267A publication Critical patent/JPS5215267A/ja
Publication of JPS5521460B2 publication Critical patent/JPS5521460B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Laser Beam Processing (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP50091127A 1975-07-28 1975-07-28 Fine processing method Granted JPS5215267A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP50091127A JPS5215267A (en) 1975-07-28 1975-07-28 Fine processing method
NL7608152A NL7608152A (nl) 1975-07-28 1976-07-22 Werkwijze voor de vorming van patronen.
FR7622830A FR2319926A1 (fr) 1975-07-28 1976-07-27 Procede de realisation d'un dessin sur un substrat
DE19762633947 DE2633947A1 (de) 1975-07-28 1976-07-28 Verfahren zur ausbildung eines musters

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50091127A JPS5215267A (en) 1975-07-28 1975-07-28 Fine processing method

Publications (2)

Publication Number Publication Date
JPS5215267A true JPS5215267A (en) 1977-02-04
JPS5521460B2 JPS5521460B2 (enrdf_load_stackoverflow) 1980-06-10

Family

ID=14017853

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50091127A Granted JPS5215267A (en) 1975-07-28 1975-07-28 Fine processing method

Country Status (1)

Country Link
JP (1) JPS5215267A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60154619A (ja) * 1984-01-24 1985-08-14 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 金属層をエツチングする方法
JPS60187026A (ja) * 1984-01-24 1985-09-24 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 金属層をエツチングする方法
WO2005045911A1 (ja) * 2003-11-11 2005-05-19 Asahi Glass Company, Limited パターン形成方法、およびこれにより製造される電子回路、並びにこれを用いた電子機器

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60150508A (ja) * 1984-01-18 1985-08-08 日本写真印刷株式会社 透明電極基板の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4833910A (enrdf_load_stackoverflow) * 1971-09-01 1973-05-15
JPS51123582A (en) * 1975-04-21 1976-10-28 Fujitsu Ltd Semiconductor device production system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4833910A (enrdf_load_stackoverflow) * 1971-09-01 1973-05-15
JPS51123582A (en) * 1975-04-21 1976-10-28 Fujitsu Ltd Semiconductor device production system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60154619A (ja) * 1984-01-24 1985-08-14 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 金属層をエツチングする方法
JPS60187026A (ja) * 1984-01-24 1985-09-24 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 金属層をエツチングする方法
WO2005045911A1 (ja) * 2003-11-11 2005-05-19 Asahi Glass Company, Limited パターン形成方法、およびこれにより製造される電子回路、並びにこれを用いた電子機器
US7790358B2 (en) 2003-11-11 2010-09-07 Asahi Glass Company, Limited Pattern formation method, electronic circuit manufactured by the same, and electronic device using the same

Also Published As

Publication number Publication date
JPS5521460B2 (enrdf_load_stackoverflow) 1980-06-10

Similar Documents

Publication Publication Date Title
SE7610739L (sv) Forfarande for framstellning av plantryckformar medelst laserstralar
JPS5215267A (en) Fine processing method
JPS52143776A (en) Electron beam exposure apparatus
JPS5427369A (en) Pattern formation method
JPS5239893A (en) Device for irradiating a laser beam
JPS51130222A (en) A process for producing an electron beam resist image
JPS51148365A (en) Electron beam exposure method
JPS51148370A (en) Electron ray exposure method
JPS51145270A (en) Method of errosive-printing elaborate pattern on metal plate, semicond uctor, etc.
JPS5442979A (en) Electron beam exposure device
JPS51116497A (en) Electron beam irradiating device
JPS5227995A (en) Rotating device for electron beam irradiation
JPS5355984A (en) Ion beam irradiating method and its device
JPS5322368A (en) Pattern inspection method
JPS5228684A (en) Electron beam radiation method onto coated wire
JPS53114744A (en) Etching method
JPS53140646A (en) High frequency irradiation device
JPS52119179A (en) Electron beam exposing method
JPS524590A (en) Accelerated photo-oxidation of olefinic polymer
JPS5432978A (en) Correcting method for pattern
JPS53127267A (en) Inspection method for pattern
JPS51148369A (en) Manufacturing method of semiconductor
JPS5350978A (en) Electron beam exposure method
JPS5267977A (en) Micro pattern fixation method for semiconductor unit
JPS5414170A (en) Exposure method of electron beam