JPS5521460B2 - - Google Patents

Info

Publication number
JPS5521460B2
JPS5521460B2 JP9112775A JP9112775A JPS5521460B2 JP S5521460 B2 JPS5521460 B2 JP S5521460B2 JP 9112775 A JP9112775 A JP 9112775A JP 9112775 A JP9112775 A JP 9112775A JP S5521460 B2 JPS5521460 B2 JP S5521460B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9112775A
Other languages
Japanese (ja)
Other versions
JPS5215267A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP50091127A priority Critical patent/JPS5215267A/ja
Priority to NL7608152A priority patent/NL7608152A/xx
Priority to FR7622830A priority patent/FR2319926A1/fr
Priority to DE19762633947 priority patent/DE2633947A1/de
Publication of JPS5215267A publication Critical patent/JPS5215267A/ja
Publication of JPS5521460B2 publication Critical patent/JPS5521460B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Laser Beam Processing (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP50091127A 1975-07-28 1975-07-28 Fine processing method Granted JPS5215267A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP50091127A JPS5215267A (en) 1975-07-28 1975-07-28 Fine processing method
NL7608152A NL7608152A (nl) 1975-07-28 1976-07-22 Werkwijze voor de vorming van patronen.
FR7622830A FR2319926A1 (fr) 1975-07-28 1976-07-27 Procede de realisation d'un dessin sur un substrat
DE19762633947 DE2633947A1 (de) 1975-07-28 1976-07-28 Verfahren zur ausbildung eines musters

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50091127A JPS5215267A (en) 1975-07-28 1975-07-28 Fine processing method

Publications (2)

Publication Number Publication Date
JPS5215267A JPS5215267A (en) 1977-02-04
JPS5521460B2 true JPS5521460B2 (enrdf_load_stackoverflow) 1980-06-10

Family

ID=14017853

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50091127A Granted JPS5215267A (en) 1975-07-28 1975-07-28 Fine processing method

Country Status (1)

Country Link
JP (1) JPS5215267A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1985003378A1 (fr) * 1984-01-18 1985-08-01 Nissha Printing Co., Ltd. Procede de fabrication d'un substrat d'electrode transparent

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4490210A (en) * 1984-01-24 1984-12-25 International Business Machines Corporation Laser induced dry chemical etching of metals
US4490211A (en) * 1984-01-24 1984-12-25 International Business Machines Corporation Laser induced chemical etching of metals with excimer lasers
JPWO2005045911A1 (ja) * 2003-11-11 2007-11-29 旭硝子株式会社 パターン形成方法、およびこれにより製造される電子回路、並びにこれを用いた電子機器

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5117081B2 (enrdf_load_stackoverflow) * 1971-09-01 1976-05-31
JPS51123582A (en) * 1975-04-21 1976-10-28 Fujitsu Ltd Semiconductor device production system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1985003378A1 (fr) * 1984-01-18 1985-08-01 Nissha Printing Co., Ltd. Procede de fabrication d'un substrat d'electrode transparent

Also Published As

Publication number Publication date
JPS5215267A (en) 1977-02-04

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