JPS5521460B2 - - Google Patents
Info
- Publication number
- JPS5521460B2 JPS5521460B2 JP9112775A JP9112775A JPS5521460B2 JP S5521460 B2 JPS5521460 B2 JP S5521460B2 JP 9112775 A JP9112775 A JP 9112775A JP 9112775 A JP9112775 A JP 9112775A JP S5521460 B2 JPS5521460 B2 JP S5521460B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Laser Beam Processing (AREA)
- Electrodes Of Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50091127A JPS5215267A (en) | 1975-07-28 | 1975-07-28 | Fine processing method |
| NL7608152A NL7608152A (nl) | 1975-07-28 | 1976-07-22 | Werkwijze voor de vorming van patronen. |
| FR7622830A FR2319926A1 (fr) | 1975-07-28 | 1976-07-27 | Procede de realisation d'un dessin sur un substrat |
| DE19762633947 DE2633947A1 (de) | 1975-07-28 | 1976-07-28 | Verfahren zur ausbildung eines musters |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50091127A JPS5215267A (en) | 1975-07-28 | 1975-07-28 | Fine processing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5215267A JPS5215267A (en) | 1977-02-04 |
| JPS5521460B2 true JPS5521460B2 (enrdf_load_stackoverflow) | 1980-06-10 |
Family
ID=14017853
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50091127A Granted JPS5215267A (en) | 1975-07-28 | 1975-07-28 | Fine processing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5215267A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1985003378A1 (fr) * | 1984-01-18 | 1985-08-01 | Nissha Printing Co., Ltd. | Procede de fabrication d'un substrat d'electrode transparent |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4490210A (en) * | 1984-01-24 | 1984-12-25 | International Business Machines Corporation | Laser induced dry chemical etching of metals |
| US4490211A (en) * | 1984-01-24 | 1984-12-25 | International Business Machines Corporation | Laser induced chemical etching of metals with excimer lasers |
| JPWO2005045911A1 (ja) * | 2003-11-11 | 2007-11-29 | 旭硝子株式会社 | パターン形成方法、およびこれにより製造される電子回路、並びにこれを用いた電子機器 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5117081B2 (enrdf_load_stackoverflow) * | 1971-09-01 | 1976-05-31 | ||
| JPS51123582A (en) * | 1975-04-21 | 1976-10-28 | Fujitsu Ltd | Semiconductor device production system |
-
1975
- 1975-07-28 JP JP50091127A patent/JPS5215267A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1985003378A1 (fr) * | 1984-01-18 | 1985-08-01 | Nissha Printing Co., Ltd. | Procede de fabrication d'un substrat d'electrode transparent |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5215267A (en) | 1977-02-04 |