JPS5355984A - Ion beam irradiating method and its device - Google Patents

Ion beam irradiating method and its device

Info

Publication number
JPS5355984A
JPS5355984A JP13092876A JP13092876A JPS5355984A JP S5355984 A JPS5355984 A JP S5355984A JP 13092876 A JP13092876 A JP 13092876A JP 13092876 A JP13092876 A JP 13092876A JP S5355984 A JPS5355984 A JP S5355984A
Authority
JP
Japan
Prior art keywords
ion beam
beam irradiating
irradiating method
ion
irradiating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13092876A
Other languages
Japanese (ja)
Other versions
JPS5945217B2 (en
Inventor
Minoru Inoue
Hiroshi Yasuda
Haruo Tsuchikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP51130928A priority Critical patent/JPS5945217B2/en
Publication of JPS5355984A publication Critical patent/JPS5355984A/en
Publication of JPS5945217B2 publication Critical patent/JPS5945217B2/en
Expired legal-status Critical Current

Links

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  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE: To carry out ion irradiation at the selected area eliminating use of the mask material, by shaping the ion beam generated from an ion source into a desired shape by use of two units of slit and irradiating the beam onto the substance to be processed.
COPYRIGHT: (C)1978,JPO&Japio
JP51130928A 1976-10-29 1976-10-29 Ion beam irradiation method and equipment used therefor Expired JPS5945217B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51130928A JPS5945217B2 (en) 1976-10-29 1976-10-29 Ion beam irradiation method and equipment used therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51130928A JPS5945217B2 (en) 1976-10-29 1976-10-29 Ion beam irradiation method and equipment used therefor

Publications (2)

Publication Number Publication Date
JPS5355984A true JPS5355984A (en) 1978-05-20
JPS5945217B2 JPS5945217B2 (en) 1984-11-05

Family

ID=15045991

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51130928A Expired JPS5945217B2 (en) 1976-10-29 1976-10-29 Ion beam irradiation method and equipment used therefor

Country Status (1)

Country Link
JP (1) JPS5945217B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1981003239A1 (en) * 1980-05-02 1981-11-12 Hitachi Ltd Ion implantation apparatus for semiconductor manufacture

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03116726U (en) * 1990-03-15 1991-12-03

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1981003239A1 (en) * 1980-05-02 1981-11-12 Hitachi Ltd Ion implantation apparatus for semiconductor manufacture

Also Published As

Publication number Publication date
JPS5945217B2 (en) 1984-11-05

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