JPS52131751A - Measuring method for thickness of transparent film - Google Patents

Measuring method for thickness of transparent film

Info

Publication number
JPS52131751A
JPS52131751A JP4927376A JP4927376A JPS52131751A JP S52131751 A JPS52131751 A JP S52131751A JP 4927376 A JP4927376 A JP 4927376A JP 4927376 A JP4927376 A JP 4927376A JP S52131751 A JPS52131751 A JP S52131751A
Authority
JP
Japan
Prior art keywords
thickness
measuring method
transparent film
film
enbedding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4927376A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5549241B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Maejima
Shoichi Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4927376A priority Critical patent/JPS52131751A/ja
Publication of JPS52131751A publication Critical patent/JPS52131751A/ja
Publication of JPS5549241B2 publication Critical patent/JPS5549241B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
JP4927376A 1976-04-27 1976-04-27 Measuring method for thickness of transparent film Granted JPS52131751A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4927376A JPS52131751A (en) 1976-04-27 1976-04-27 Measuring method for thickness of transparent film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4927376A JPS52131751A (en) 1976-04-27 1976-04-27 Measuring method for thickness of transparent film

Publications (2)

Publication Number Publication Date
JPS52131751A true JPS52131751A (en) 1977-11-04
JPS5549241B2 JPS5549241B2 (enrdf_load_stackoverflow) 1980-12-11

Family

ID=12826224

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4927376A Granted JPS52131751A (en) 1976-04-27 1976-04-27 Measuring method for thickness of transparent film

Country Status (1)

Country Link
JP (1) JPS52131751A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57122507U (enrdf_load_stackoverflow) * 1981-01-26 1982-07-30
FI65949C (fi) * 1982-10-27 1984-08-10 Kalervo Virtanen Signalanordning foer fordon
JPS6225282A (ja) * 1985-07-26 1987-02-03 Roudoushiyou Sangyo Anzen Kenkyusho 接触検出装置
JPH0314480U (enrdf_load_stackoverflow) * 1989-06-26 1991-02-14

Also Published As

Publication number Publication date
JPS5549241B2 (enrdf_load_stackoverflow) 1980-12-11

Similar Documents

Publication Publication Date Title
JPS53135348A (en) Etching method for multilayer film
JPS5669837A (en) Manufacture of semiconductor device
JPS5232270A (en) Passivation film formaion by sputtering
JPS52131751A (en) Measuring method for thickness of transparent film
JPS5231762A (en) Method of measuring thickness and composition of thin film formed on s ubstrate
JPS5349955A (en) Spin coating method
JPS5315755A (en) Manufacture of display panel electrode
JPS5422168A (en) Glass coating method for semiconductor element
JPS5387668A (en) Forming method of patterns
JPS542657A (en) Manufacture for semiconductor device
JPS5232671A (en) Manufacturing process of semiconductor device
JPS5441673A (en) Semiconductor device and its manufacture
JPS52155058A (en) Film formation method
JPS53114348A (en) Measuring method for diffusion depth of semiconductor substrate
JPS5228872A (en) Method for measuring the size of thin plane
JPS53105973A (en) Manufacture of semiconductor device
JPS52153412A (en) Production of electric substrate
JPS51127181A (en) Films having selective transmittance for light
JPS5231665A (en) Growing method of semiconductor crystal
JPS5384712A (en) Photographic material
JPS5322369A (en) Flaw mending method of photo mask materials
JPS533168A (en) Semiconductor evaporating apparatus
JPS5351973A (en) Photo mask
JPS5244657A (en) Method of measuring thin film charcteristics by fluorescent x-rays met hod
JPS51147292A (en) Semiconductor hall effect element and its manufacturing process