JPS52129282A - Growth method of thin film by reduced pressure vapor phase growth method - Google Patents

Growth method of thin film by reduced pressure vapor phase growth method

Info

Publication number
JPS52129282A
JPS52129282A JP4492276A JP4492276A JPS52129282A JP S52129282 A JPS52129282 A JP S52129282A JP 4492276 A JP4492276 A JP 4492276A JP 4492276 A JP4492276 A JP 4492276A JP S52129282 A JPS52129282 A JP S52129282A
Authority
JP
Japan
Prior art keywords
growth method
thin film
reduced pressure
vapor phase
pressure vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4492276A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5433112B2 (cs
Inventor
Daijiro Kudo
Kazuo Maeda
Yoshiki Tanigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4492276A priority Critical patent/JPS52129282A/ja
Priority to SE7704276A priority patent/SE432162B/xx
Priority to US05/787,495 priority patent/US4179326A/en
Priority to GB16011/77A priority patent/GB1575578A/en
Priority to IT22668/77A priority patent/IT1114781B/it
Priority to DE2718026A priority patent/DE2718026C3/de
Priority to FR7712288A priority patent/FR2348983A1/fr
Publication of JPS52129282A publication Critical patent/JPS52129282A/ja
Publication of JPS5433112B2 publication Critical patent/JPS5433112B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP4492276A 1976-04-22 1976-04-22 Growth method of thin film by reduced pressure vapor phase growth method Granted JPS52129282A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP4492276A JPS52129282A (en) 1976-04-22 1976-04-22 Growth method of thin film by reduced pressure vapor phase growth method
SE7704276A SE432162B (sv) 1976-04-22 1977-04-14 Forfarande for att utifran en anga bringa en tunn film att tillvexa
US05/787,495 US4179326A (en) 1976-04-22 1977-04-14 Process for the vapor growth of a thin film
GB16011/77A GB1575578A (en) 1976-04-22 1977-04-18 Process for the vapour deposition of a thin film
IT22668/77A IT1114781B (it) 1976-04-22 1977-04-20 Processo per l'accresciemento,da fase vapore,di una sottile pellicola
DE2718026A DE2718026C3 (de) 1976-04-22 1977-04-22 Verfahren zum Beschichten von Halbleiterplättchen aus der Dampfphase und deren Anwendung
FR7712288A FR2348983A1 (fr) 1976-04-22 1977-04-22 Procede de depot d'une couche mince sous forme vapeur

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4492276A JPS52129282A (en) 1976-04-22 1976-04-22 Growth method of thin film by reduced pressure vapor phase growth method

Publications (2)

Publication Number Publication Date
JPS52129282A true JPS52129282A (en) 1977-10-29
JPS5433112B2 JPS5433112B2 (cs) 1979-10-18

Family

ID=12704952

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4492276A Granted JPS52129282A (en) 1976-04-22 1976-04-22 Growth method of thin film by reduced pressure vapor phase growth method

Country Status (1)

Country Link
JP (1) JPS52129282A (cs)

Also Published As

Publication number Publication date
JPS5433112B2 (cs) 1979-10-18

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