JPS52109879A - Formating method of matching domain - Google Patents
Formating method of matching domainInfo
- Publication number
- JPS52109879A JPS52109879A JP783977A JP783977A JPS52109879A JP S52109879 A JPS52109879 A JP S52109879A JP 783977 A JP783977 A JP 783977A JP 783977 A JP783977 A JP 783977A JP S52109879 A JPS52109879 A JP S52109879A
- Authority
- JP
- Japan
- Prior art keywords
- inpurity
- matching domain
- opening
- introducing
- formating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title abstract 2
- 238000001259 photo etching Methods 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/762—Charge transfer devices
- H01L29/765—Charge-coupled devices
- H01L29/768—Charge-coupled devices with field effect produced by an insulated gate
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Weting (AREA)
Abstract
PURPOSE:To enable the matching area with small dimension independently of the photo etching method, by forming the opening to the mask containing inpurity provided on the base, further by providing the second inpurity introducing mask in it, and by introducing the inpurity after narrowing the width of the opening with the exposure and photo etching from the tilt angle by coating the photo sensitive resin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP783977A JPS52109879A (en) | 1977-01-28 | 1977-01-28 | Formating method of matching domain |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP783977A JPS52109879A (en) | 1977-01-28 | 1977-01-28 | Formating method of matching domain |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13633975A Division JPS5275189A (en) | 1975-11-14 | 1975-11-14 | Charge transfer device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52109879A true JPS52109879A (en) | 1977-09-14 |
JPS562423B2 JPS562423B2 (en) | 1981-01-20 |
Family
ID=11676767
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP783977A Granted JPS52109879A (en) | 1977-01-28 | 1977-01-28 | Formating method of matching domain |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52109879A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4924366A (en) * | 1972-06-28 | 1974-03-04 | ||
JPS5046488A (en) * | 1973-08-14 | 1975-04-25 |
-
1977
- 1977-01-28 JP JP783977A patent/JPS52109879A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4924366A (en) * | 1972-06-28 | 1974-03-04 | ||
JPS5046488A (en) * | 1973-08-14 | 1975-04-25 |
Also Published As
Publication number | Publication date |
---|---|
JPS562423B2 (en) | 1981-01-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5325113A (en) | Method for prevention of falsification | |
JPS52109879A (en) | Formating method of matching domain | |
JPS5461931A (en) | Forming method of photo resist patterns | |
JPS5314568A (en) | Photolithography treatment system device | |
JPS51136289A (en) | Semi-conductor producing | |
JPS51136288A (en) | Photo etching using non-crystalline carchogenide glass thin film | |
JPS54141573A (en) | Mask for exposure | |
JPS5310265A (en) | Impurity diffusion method | |
JPS56137632A (en) | Pattern forming | |
JPS51114931A (en) | Photoresist pattern formation method | |
JPS51136287A (en) | Photo mask using non-crystalline carchognide glass thin film | |
JPS51118392A (en) | Manuforcturing process for semiconductor unit | |
JPS52143019A (en) | Developing agent for positive type radiation sensitive material | |
JPS53135578A (en) | Mark protection method | |
JPS54162546A (en) | Image formation method | |
JPS53147468A (en) | Production of semiconductor device | |
JPS539122A (en) | Color photographic light sensitive material | |
JPS53117385A (en) | Exposure mask for patterning | |
JPS5360177A (en) | Photo mask | |
JPS52129276A (en) | Production of semiconductor device | |
JPS5370769A (en) | Production of semiconductor device | |
JPS534476A (en) | Mask alignment method to semiconductor substrate | |
JPS539473A (en) | Photoetching process | |
JPS5248997A (en) | Electrochromic display device | |
JPS5432068A (en) | Manufacture of semiconductor device |