JPS52108776A - Pattern sticking device - Google Patents
Pattern sticking deviceInfo
- Publication number
- JPS52108776A JPS52108776A JP2462776A JP2462776A JPS52108776A JP S52108776 A JPS52108776 A JP S52108776A JP 2462776 A JP2462776 A JP 2462776A JP 2462776 A JP2462776 A JP 2462776A JP S52108776 A JPS52108776 A JP S52108776A
- Authority
- JP
- Japan
- Prior art keywords
- sticking device
- pattern sticking
- pattern
- interval
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2462776A JPS52108776A (en) | 1976-03-09 | 1976-03-09 | Pattern sticking device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2462776A JPS52108776A (en) | 1976-03-09 | 1976-03-09 | Pattern sticking device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52108776A true JPS52108776A (en) | 1977-09-12 |
JPS5319901B2 JPS5319901B2 (enrdf_load_stackoverflow) | 1978-06-23 |
Family
ID=12143368
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2462776A Granted JPS52108776A (en) | 1976-03-09 | 1976-03-09 | Pattern sticking device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52108776A (enrdf_load_stackoverflow) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS571229A (en) * | 1980-05-02 | 1982-01-06 | Perkin Elmer Corp | Device for automatically positioning wafer |
JPS59107515A (ja) * | 1982-12-13 | 1984-06-21 | Hitachi Ltd | X線露光装置 |
JPS60108913A (ja) * | 1983-11-18 | 1985-06-14 | Canon Inc | 電歪素子制御装置 |
JPS6187334A (ja) * | 1985-10-18 | 1986-05-02 | Tokyo Erekutoron Kk | ウエハ露光方法 |
JPS63107022A (ja) * | 1986-10-24 | 1988-05-12 | Hitachi Ltd | マスクとウエハ間の間隙測定装置 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6012583U (ja) * | 1983-07-05 | 1985-01-28 | 象印チエンブロツク株式会社 | 吊下げクランプ |
JPS61169705U (enrdf_load_stackoverflow) * | 1985-04-10 | 1986-10-21 |
-
1976
- 1976-03-09 JP JP2462776A patent/JPS52108776A/ja active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS571229A (en) * | 1980-05-02 | 1982-01-06 | Perkin Elmer Corp | Device for automatically positioning wafer |
JPS59107515A (ja) * | 1982-12-13 | 1984-06-21 | Hitachi Ltd | X線露光装置 |
JPS60108913A (ja) * | 1983-11-18 | 1985-06-14 | Canon Inc | 電歪素子制御装置 |
JPS6187334A (ja) * | 1985-10-18 | 1986-05-02 | Tokyo Erekutoron Kk | ウエハ露光方法 |
JPS63107022A (ja) * | 1986-10-24 | 1988-05-12 | Hitachi Ltd | マスクとウエハ間の間隙測定装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS5319901B2 (enrdf_load_stackoverflow) | 1978-06-23 |
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