JPS5210079A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS5210079A
JPS5210079A JP50085937A JP8593775A JPS5210079A JP S5210079 A JPS5210079 A JP S5210079A JP 50085937 A JP50085937 A JP 50085937A JP 8593775 A JP8593775 A JP 8593775A JP S5210079 A JPS5210079 A JP S5210079A
Authority
JP
Japan
Prior art keywords
semiconductor device
silicon
film
chargo
dure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50085937A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5628376B2 (is"
Inventor
Masayoshi Kitamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
New Japan Radio Co Ltd
Japan Radio Co Ltd
Original Assignee
New Japan Radio Co Ltd
Japan Radio Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by New Japan Radio Co Ltd, Japan Radio Co Ltd filed Critical New Japan Radio Co Ltd
Priority to JP50085937A priority Critical patent/JPS5210079A/ja
Publication of JPS5210079A publication Critical patent/JPS5210079A/ja
Publication of JPS5628376B2 publication Critical patent/JPS5628376B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Bipolar Transistors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
JP50085937A 1975-07-14 1975-07-14 Semiconductor device Granted JPS5210079A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50085937A JPS5210079A (en) 1975-07-14 1975-07-14 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50085937A JPS5210079A (en) 1975-07-14 1975-07-14 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS5210079A true JPS5210079A (en) 1977-01-26
JPS5628376B2 JPS5628376B2 (is") 1981-07-01

Family

ID=13872663

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50085937A Granted JPS5210079A (en) 1975-07-14 1975-07-14 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS5210079A (is")

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60177876U (ja) * 1984-05-07 1985-11-26 株式会社 ソフイア パチンコ遊技機における流下球検出装置

Also Published As

Publication number Publication date
JPS5628376B2 (is") 1981-07-01

Similar Documents

Publication Publication Date Title
JPS5212576A (en) Wafer washing drying device
JPS5431273A (en) Manufacture of semiconductor device
JPS53135263A (en) Production of semiconductor device
JPS5210079A (en) Semiconductor device
JPS5255871A (en) Production of semiconductor
JPS5373072A (en) Formation of oxidized film
JPS51136289A (en) Semi-conductor producing
JPS5292486A (en) Manufacture of mis-type semiconductor device
JPS51121267A (en) Semiconductor wafer measuring device
JPS5352370A (en) Wafer susceptor
JPS5258472A (en) Selective oxidation
JPS51145267A (en) Manufacture of semiconductor device
JPS543473A (en) Manufacture of semiconductor device
JPS5242365A (en) Tool for semiconductors
JPS51113461A (en) A method for manufacturing semiconductor devices
JPS53133373A (en) Manufacture of semiconductor device
JPS5210676A (en) Semiconductor device
JPS51123073A (en) Insulated gate (type) semiconductor device
JPS51125698A (en) The formation of silicon dioxide film
JPS5377168A (en) Production of semiconductor device
JPS5268371A (en) Semiconductor device
JPS5211867A (en) Manufacturing method of a semiconductor device
JPS5339872A (en) Etching method of wafers
JPS51112277A (en) Semiconductor device and its production method
JPS51147259A (en) Manufacturing process of semiconductor device