JPS5191664A - - Google Patents
Info
- Publication number
- JPS5191664A JPS5191664A JP12447575A JP12447575A JPS5191664A JP S5191664 A JPS5191664 A JP S5191664A JP 12447575 A JP12447575 A JP 12447575A JP 12447575 A JP12447575 A JP 12447575A JP S5191664 A JPS5191664 A JP S5191664A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- H10P50/617—
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
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- H10P14/47—
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- H10P32/16—
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- H10P34/422—
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- H10P52/00—
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- H10P95/00—
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrodes Of Semiconductors (AREA)
- Led Devices (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB4508174A GB1465567A (en) | 1974-10-17 | 1974-10-17 | Deposition of materials onto semiconductors |
| GB3673175 | 1975-09-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5191664A true JPS5191664A (cg-RX-API-DMAC10.html) | 1976-08-11 |
Family
ID=26263225
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12447575A Pending JPS5191664A (cg-RX-API-DMAC10.html) | 1974-10-17 | 1975-10-17 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4024029A (cg-RX-API-DMAC10.html) |
| JP (1) | JPS5191664A (cg-RX-API-DMAC10.html) |
| CA (1) | CA1047654A (cg-RX-API-DMAC10.html) |
| DE (1) | DE2546697A1 (cg-RX-API-DMAC10.html) |
| FR (1) | FR2288389A1 (cg-RX-API-DMAC10.html) |
| NL (1) | NL7512238A (cg-RX-API-DMAC10.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS575383A (en) * | 1980-06-13 | 1982-01-12 | Fujitsu Ltd | Manufacture of semiconductor device |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4147564A (en) * | 1977-11-18 | 1979-04-03 | Sri International | Method of controlled surface texturization of crystalline semiconductor material |
| US4144139A (en) * | 1977-11-30 | 1979-03-13 | Solarex Corporation | Method of plating by means of light |
| DE2755418A1 (de) * | 1977-12-13 | 1979-06-21 | Bosch Gmbh Robert | Verfahren zur herstellung eines halbleiter-bauelements |
| US4217183A (en) * | 1979-05-08 | 1980-08-12 | International Business Machines Corporation | Method for locally enhancing electroplating rates |
| US4379022A (en) * | 1979-05-08 | 1983-04-05 | International Business Machines Corporation | Method for maskless chemical machining |
| US4507181A (en) * | 1984-02-17 | 1985-03-26 | Energy Conversion Devices, Inc. | Method of electro-coating a semiconductor device |
| GB2188774B (en) * | 1986-04-02 | 1990-10-31 | Westinghouse Electric Corp | Method of forming a conductive pattern on a semiconductor surface |
| US5171608A (en) * | 1990-09-28 | 1992-12-15 | The Unites States Of America As Represented By The Secretary Of The Navy | Method of pattern transfer in photolithography using laser induced metallization |
| US5882435A (en) * | 1993-09-30 | 1999-03-16 | Siemens Solar Gmbh | Process for the metal coating of solar cells made of crystalline silicon |
| US6902659B2 (en) * | 1998-12-01 | 2005-06-07 | Asm Nutool, Inc. | Method and apparatus for electro-chemical mechanical deposition |
| US6413388B1 (en) * | 2000-02-23 | 2002-07-02 | Nutool Inc. | Pad designs and structures for a versatile materials processing apparatus |
| US6534116B2 (en) * | 2000-08-10 | 2003-03-18 | Nutool, Inc. | Plating method and apparatus that creates a differential between additive disposed on a top surface and a cavity surface of a workpiece using an external influence |
| EP1063696B1 (en) * | 1999-06-22 | 2007-08-22 | Interuniversitair Micro-Elektronica Centrum Vzw | A method for improving the quality of a metal-containing layer deposited from a plating bath |
| US6355153B1 (en) * | 1999-09-17 | 2002-03-12 | Nutool, Inc. | Chip interconnect and packaging deposition methods and structures |
| US6921551B2 (en) * | 2000-08-10 | 2005-07-26 | Asm Nutool, Inc. | Plating method and apparatus for controlling deposition on predetermined portions of a workpiece |
| US20040170753A1 (en) * | 2000-12-18 | 2004-09-02 | Basol Bulent M. | Electrochemical mechanical processing using low temperature process environment |
| US7172497B2 (en) * | 2001-01-05 | 2007-02-06 | Asm Nutool, Inc. | Fabrication of semiconductor interconnect structures |
| US7250104B2 (en) * | 2003-08-08 | 2007-07-31 | Novellus Systems, Inc. | Method and system for optically enhanced metal planarization |
| US20050230262A1 (en) * | 2004-04-20 | 2005-10-20 | Semitool, Inc. | Electrochemical methods for the formation of protective features on metallized features |
| US20060183321A1 (en) * | 2004-09-27 | 2006-08-17 | Basol Bulent M | Method for reduction of gap fill defects |
| US8500985B2 (en) * | 2006-07-21 | 2013-08-06 | Novellus Systems, Inc. | Photoresist-free metal deposition |
| US7732329B2 (en) * | 2006-08-30 | 2010-06-08 | Ipgrip, Llc | Method and apparatus for workpiece surface modification for selective material deposition |
| US20080237048A1 (en) * | 2007-03-30 | 2008-10-02 | Ismail Emesh | Method and apparatus for selective electrofilling of through-wafer vias |
| US20080277285A1 (en) * | 2007-05-08 | 2008-11-13 | Interuniversitair Microelektronica Centrum Vzw (Imec) | Bipolar electroless processing methods |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1295071A (fr) | 1960-07-05 | 1962-06-01 | Siemens Ag | Procédé pour déposer par électrolyse des couches minces sur des supports |
| US3294583A (en) * | 1962-06-14 | 1966-12-27 | Sprague Electric Co | Process of coating a silicon semiconductor with indium using an ion beam |
| USB436421I5 (cg-RX-API-DMAC10.html) * | 1965-01-27 | |||
| US3458368A (en) * | 1966-05-23 | 1969-07-29 | Texas Instruments Inc | Integrated circuits and fabrication thereof |
| US3529961A (en) * | 1966-12-27 | 1970-09-22 | Gen Electric | Formation of thin films of gold,nickel or copper by photolytic deposition |
| US3506545A (en) * | 1967-02-14 | 1970-04-14 | Ibm | Method for plating conductive patterns with high resolution |
| US3516855A (en) * | 1967-05-29 | 1970-06-23 | Ibm | Method of depositing conductive ions by utilizing electron beam |
| US3551213A (en) * | 1968-09-04 | 1970-12-29 | Bell Telephone Labor Inc | Geometrically selective ion bombardment by means of the photoelectric effect |
-
1975
- 1975-10-16 CA CA237,781A patent/CA1047654A/en not_active Expired
- 1975-10-16 FR FR7531722A patent/FR2288389A1/fr active Granted
- 1975-10-16 US US05/623,079 patent/US4024029A/en not_active Expired - Lifetime
- 1975-10-17 NL NL7512238A patent/NL7512238A/xx not_active Application Discontinuation
- 1975-10-17 DE DE19752546697 patent/DE2546697A1/de not_active Withdrawn
- 1975-10-17 JP JP12447575A patent/JPS5191664A/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS575383A (en) * | 1980-06-13 | 1982-01-12 | Fujitsu Ltd | Manufacture of semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2546697A1 (de) | 1976-04-29 |
| NL7512238A (nl) | 1976-04-21 |
| FR2288389A1 (fr) | 1976-05-14 |
| CA1047654A (en) | 1979-01-30 |
| US4024029A (en) | 1977-05-17 |
| FR2288389B1 (cg-RX-API-DMAC10.html) | 1982-04-23 |