JPS5141791A - - Google Patents

Info

Publication number
JPS5141791A
JPS5141791A JP50097232A JP9723275A JPS5141791A JP S5141791 A JPS5141791 A JP S5141791A JP 50097232 A JP50097232 A JP 50097232A JP 9723275 A JP9723275 A JP 9723275A JP S5141791 A JPS5141791 A JP S5141791A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50097232A
Other versions
JPS5434431B2 (ja
Inventor
Jozefu Papa Antonii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Union Carbide Corp
Original Assignee
Union Carbide Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Union Carbide Corp filed Critical Union Carbide Corp
Publication of JPS5141791A publication Critical patent/JPS5141791A/ja
Publication of JPS5434431B2 publication Critical patent/JPS5434431B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • C08J9/04—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof using blowing gases generated by a previously added blowing agent
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2361/00—Characterised by the use of condensation polymers of aldehydes or ketones; Derivatives of such polymers
    • C08J2361/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08J2361/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
JP9723275A 1974-08-13 1975-08-12 Expired JPS5434431B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US49707274A 1974-08-13 1974-08-13
US05/595,744 US4033909A (en) 1974-08-13 1975-07-14 Stable phenolic resoles

Publications (2)

Publication Number Publication Date
JPS5141791A true JPS5141791A (ja) 1976-04-08
JPS5434431B2 JPS5434431B2 (ja) 1979-10-26

Family

ID=27052388

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9723275A Expired JPS5434431B2 (ja) 1974-08-13 1975-08-12

Country Status (9)

Country Link
US (1) US4033909A (ja)
JP (1) JPS5434431B2 (ja)
AU (1) AU8382775A (ja)
BR (1) BR7505131A (ja)
DE (1) DE2535869A1 (ja)
FR (1) FR2281943A1 (ja)
GB (1) GB1510728A (ja)
NL (1) NL7509595A (ja)
SE (1) SE7509040L (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5882790U (ja) * 1981-11-30 1983-06-04 カツラ電工株式会社 けい光灯用ソケツト
JPS636026A (ja) * 1986-06-27 1988-01-12 Nippon Zeon Co Ltd ノボラツク樹脂の精製方法
JPS6346238A (ja) * 1986-04-04 1988-02-27 Sekisui Plastics Co Ltd 高発泡フェノール樹脂発泡体の製造法
JPH07502295A (ja) * 1991-12-18 1995-03-09 クラリアント・ファイナンス・（ビーブイアイ）・リミテッド ノボラック樹脂中の金属イオンの低減

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4033910A (en) * 1975-09-26 1977-07-05 Union Carbide Corporation Methyl formate as an adjuvant in phenolic foam formation
US4176216A (en) * 1977-07-28 1979-11-27 Union Carbide Corporation Cellular products derived from phenol/formaldehyde resoles
US4176106A (en) * 1977-07-28 1979-11-27 Union Carbide Corporation Phenol/formaldehyde resoles and cellular products derived therefrom
JPS5437190A (en) * 1977-08-29 1979-03-19 Hitachi Chem Co Ltd Preparation of phenolic resin
US4289814A (en) * 1979-01-23 1981-09-15 The Dow Chemical Co. Stabilized phenolic resins
US4235762A (en) * 1979-01-23 1980-11-25 The Dow Chemical Company Stabilized phenolic resins
US4310653A (en) * 1980-10-08 1982-01-12 Desoto, Inc. Production of monomeric etherified bisphenol-formaldehyde condensates
US4444912A (en) * 1981-07-10 1984-04-24 Koppers Company, Inc. Phenolic foam and composition and method for preparing the same
US4478958A (en) * 1981-07-10 1984-10-23 Kopper Company, Inc. Method for preparing phenolic foams using anhydrous aryl sulfonic acid catalysts
US4539338A (en) * 1982-07-09 1985-09-03 Koppers Company, Inc. Phenol formaldehyde resoles for making phenolic foam
US5446126A (en) * 1991-04-01 1995-08-29 Ocg Microelectronic Materials, Inc. Method for removing metal impurities from resist components
US5446125A (en) * 1991-04-01 1995-08-29 Ocg Microelectronic Materials, Inc. Method for removing metal impurities from resist components
US5378802A (en) * 1991-09-03 1995-01-03 Ocg Microelectronic Materials, Inc. Method for removing impurities from resist components and novolak resins
US5580949A (en) * 1991-12-18 1996-12-03 Hoechst Celanese Corporation Metal ion reduction in novolak resins and photoresists
JP3184530B2 (ja) * 1992-03-06 2001-07-09 クラリアント・ファイナンス・（ビーブイアイ）・リミテッド 金属イオンレベルが低いフォトレジスト
US5830990A (en) * 1992-07-10 1998-11-03 Clariant Finance (Bvi) Limited Low metals perfluorooctanoic acid and top anti-reflective coatings for photoresists
SG52770A1 (en) * 1992-07-10 1998-09-28 Hoechst Celanese Corp Metal ion reduction in top anti-reflective coatings for photoresists
DE69313132T2 (de) * 1992-11-25 1997-12-11 Hoechst Celanese Corp Metallionenreduzierung in antireflexunterschichten für photoresist
US5476750A (en) * 1992-12-29 1995-12-19 Hoechst Celanese Corporation Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists
US5525315A (en) * 1993-12-07 1996-06-11 Shipley Company, L.L.C. Process for removing heavy metal ions with a chelating cation exchange resin
US5686561A (en) * 1994-08-23 1997-11-11 Hoechst Celanese Corporation Metal ion reduction in novolak resin solution using an anion exchange resin
US5521052A (en) * 1994-12-30 1996-05-28 Hoechst Celanese Corporation Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom
US5837417A (en) * 1994-12-30 1998-11-17 Clariant Finance (Bvi) Limited Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition
US5614352A (en) * 1994-12-30 1997-03-25 Hoechst Celanese Corporation Metal ion reduction in novolak resins solution in PGMEA by chelating ion exchange resin
US5618655A (en) * 1995-07-17 1997-04-08 Olin Corporation Process of reducing trace levels of metal impurities from resist components
US5623042A (en) * 1995-07-19 1997-04-22 Olin Corporation Process for reducing trace levels of metallic impurities in cyclized polyisoprene resin
US5739265A (en) * 1995-09-20 1998-04-14 Clariant Finance (Bvi) Ltd. Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom
US5693749A (en) * 1995-09-20 1997-12-02 Hoechst Celanese Corporation Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom
US5750031A (en) * 1995-09-26 1998-05-12 Clariant Finance (Bvi) Limited Process for producing surfactant having a low metal ion level and developer produced therefrom
US5656413A (en) * 1995-09-28 1997-08-12 Hoechst Celanese Corporation Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom
US5962183A (en) * 1995-11-27 1999-10-05 Clariant Finance (Bvi) Limited Metal ion reduction in photoresist compositions by chelating ion exchange resin
US5665517A (en) * 1996-01-11 1997-09-09 Hoechst Celanese Corporation Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom
GB9706219D0 (en) * 1997-03-24 1997-05-14 Evans Albert E J A method of producing foam and components and apparatus for use in the method
US5936071A (en) * 1998-02-02 1999-08-10 Clariant Finance (Bvi) Limited Process for making a photoactive compound and photoresist therefrom
US20060172231A1 (en) * 2002-08-08 2006-08-03 Fujifilm Electronic Materials U.S.A., Inc Use of an oxidizer to improve trace metals removal from photoresist and photoresist components
JP2010538154A (ja) * 2007-09-21 2010-12-09 サン ゴバン アブレシブ インコーポレーティド フェノール樹脂配合物および研磨製品用コーティング
CN114456784B (zh) * 2021-12-07 2023-06-02 中国海洋石油集团有限公司 长存储性酚醛树脂交联剂及利用其制备得到的高温高盐凝胶

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3432453A (en) * 1964-10-05 1969-03-11 Fiberglas Canada Ltd De-ionizing treatment for phenolic resins using a soluble ammonium salt
US3624247A (en) * 1970-03-26 1971-11-30 Fiberglas Canada Ltd Deionizing treatment for phenolic resins using a soluble ammonium salt

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2865875A (en) * 1956-07-19 1958-12-23 Catalin Corp Of America Low ash phenol-formaldehyde resins and process of preparation
US3657188A (en) * 1970-03-02 1972-04-18 Butler Manufacturing Co Continuous production of resoles

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3432453A (en) * 1964-10-05 1969-03-11 Fiberglas Canada Ltd De-ionizing treatment for phenolic resins using a soluble ammonium salt
US3624247A (en) * 1970-03-26 1971-11-30 Fiberglas Canada Ltd Deionizing treatment for phenolic resins using a soluble ammonium salt

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5882790U (ja) * 1981-11-30 1983-06-04 カツラ電工株式会社 けい光灯用ソケツト
JPS6346238A (ja) * 1986-04-04 1988-02-27 Sekisui Plastics Co Ltd 高発泡フェノール樹脂発泡体の製造法
JPH0542974B2 (ja) * 1986-04-04 1993-06-30 Sekisui Plastics
JPS636026A (ja) * 1986-06-27 1988-01-12 Nippon Zeon Co Ltd ノボラツク樹脂の精製方法
JPH0680119B2 (ja) * 1986-06-27 1994-10-12 日本ゼオン株式会社 ノボラツク樹脂の精製方法
JPH07502295A (ja) * 1991-12-18 1995-03-09 クラリアント・ファイナンス・（ビーブイアイ）・リミテッド ノボラック樹脂中の金属イオンの低減
JP2003160625A (ja) * 1991-12-18 2003-06-03 Clariant Finance (Bvi) Ltd ノボラック樹脂中の金属イオンの低減

Also Published As

Publication number Publication date
BR7505131A (pt) 1976-08-03
AU8382775A (en) 1977-02-17
JPS5434431B2 (ja) 1979-10-26
US4033909A (en) 1977-07-05
FR2281943A1 (fr) 1976-03-12
SE7509040L (sv) 1976-04-15
DE2535869A1 (de) 1976-03-04
NL7509595A (nl) 1976-02-17
GB1510728A (en) 1978-05-17

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