SE7509040L - Fenolhartser och forfarande for framstellning derav - Google Patents

Fenolhartser och forfarande for framstellning derav

Info

Publication number
SE7509040L
SE7509040L SE7509040A SE7509040A SE7509040L SE 7509040 L SE7509040 L SE 7509040L SE 7509040 A SE7509040 A SE 7509040A SE 7509040 A SE7509040 A SE 7509040A SE 7509040 L SE7509040 L SE 7509040L
Authority
SE
Sweden
Prior art keywords
phenolo
resins
procedures
manufacture
phenolo resins
Prior art date
Application number
SE7509040A
Other languages
English (en)
Swedish (sv)
Inventor
A J Papa
Original Assignee
Union Carbide Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Union Carbide Corp filed Critical Union Carbide Corp
Publication of SE7509040L publication Critical patent/SE7509040L/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • C08J9/04—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof using blowing gases generated by a previously added blowing agent
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2361/00—Characterised by the use of condensation polymers of aldehydes or ketones; Derivatives of such polymers
    • C08J2361/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08J2361/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
SE7509040A 1974-08-13 1975-08-12 Fenolhartser och forfarande for framstellning derav SE7509040L (sv)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US49707274A 1974-08-13 1974-08-13
US05/595,744 US4033909A (en) 1974-08-13 1975-07-14 Stable phenolic resoles

Publications (1)

Publication Number Publication Date
SE7509040L true SE7509040L (sv) 1976-04-15

Family

ID=27052388

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7509040A SE7509040L (sv) 1974-08-13 1975-08-12 Fenolhartser och forfarande for framstellning derav

Country Status (9)

Country Link
US (1) US4033909A (ja)
JP (1) JPS5434431B2 (ja)
AU (1) AU8382775A (ja)
BR (1) BR7505131A (ja)
DE (1) DE2535869A1 (ja)
FR (1) FR2281943A1 (ja)
GB (1) GB1510728A (ja)
NL (1) NL7509595A (ja)
SE (1) SE7509040L (ja)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4033910A (en) * 1975-09-26 1977-07-05 Union Carbide Corporation Methyl formate as an adjuvant in phenolic foam formation
US4176106A (en) * 1977-07-28 1979-11-27 Union Carbide Corporation Phenol/formaldehyde resoles and cellular products derived therefrom
US4176216A (en) * 1977-07-28 1979-11-27 Union Carbide Corporation Cellular products derived from phenol/formaldehyde resoles
JPS5437190A (en) * 1977-08-29 1979-03-19 Hitachi Chem Co Ltd Preparation of phenolic resin
US4289814A (en) * 1979-01-23 1981-09-15 The Dow Chemical Co. Stabilized phenolic resins
US4235762A (en) * 1979-01-23 1980-11-25 The Dow Chemical Company Stabilized phenolic resins
US4310653A (en) * 1980-10-08 1982-01-12 Desoto, Inc. Production of monomeric etherified bisphenol-formaldehyde condensates
US4478958A (en) * 1981-07-10 1984-10-23 Kopper Company, Inc. Method for preparing phenolic foams using anhydrous aryl sulfonic acid catalysts
US4444912A (en) * 1981-07-10 1984-04-24 Koppers Company, Inc. Phenolic foam and composition and method for preparing the same
JPS5882790U (ja) * 1981-11-30 1983-06-04 カツラ電工株式会社 けい光灯用ソケツト
US4539338A (en) * 1982-07-09 1985-09-03 Koppers Company, Inc. Phenol formaldehyde resoles for making phenolic foam
JPS6346238A (ja) * 1986-04-04 1988-02-27 Sekisui Plastics Co Ltd 高発泡フェノール樹脂発泡体の製造法
JPH0680119B2 (ja) * 1986-06-27 1994-10-12 日本ゼオン株式会社 ノボラツク樹脂の精製方法
US5446126A (en) * 1991-04-01 1995-08-29 Ocg Microelectronic Materials, Inc. Method for removing metal impurities from resist components
US5446125A (en) * 1991-04-01 1995-08-29 Ocg Microelectronic Materials, Inc. Method for removing metal impurities from resist components
US5378802A (en) * 1991-09-03 1995-01-03 Ocg Microelectronic Materials, Inc. Method for removing impurities from resist components and novolak resins
US5580949A (en) * 1991-12-18 1996-12-03 Hoechst Celanese Corporation Metal ion reduction in novolak resins and photoresists
SG48902A1 (en) * 1991-12-18 1998-05-18 Hoechst Celanese Corp Metal ion reduction in novolak resins
JP3184530B2 (ja) * 1992-03-06 2001-07-09 クラリアント・ファイナンス・（ビーブイアイ）・リミテッド 金属イオンレベルが低いフォトレジスト
SG52770A1 (en) * 1992-07-10 1998-09-28 Hoechst Celanese Corp Metal ion reduction in top anti-reflective coatings for photoresists
US5830990A (en) * 1992-07-10 1998-11-03 Clariant Finance (Bvi) Limited Low metals perfluorooctanoic acid and top anti-reflective coatings for photoresists
JP3727335B2 (ja) * 1992-11-25 2005-12-14 Ａｚエレクトロニックマテリアルズ株式会社 フォトレジスト用底部反射防止塗料における金属イオンの低減
US5476750A (en) * 1992-12-29 1995-12-19 Hoechst Celanese Corporation Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists
US5525315A (en) * 1993-12-07 1996-06-11 Shipley Company, L.L.C. Process for removing heavy metal ions with a chelating cation exchange resin
US5686561A (en) * 1994-08-23 1997-11-11 Hoechst Celanese Corporation Metal ion reduction in novolak resin solution using an anion exchange resin
US5614352A (en) * 1994-12-30 1997-03-25 Hoechst Celanese Corporation Metal ion reduction in novolak resins solution in PGMEA by chelating ion exchange resin
US5521052A (en) * 1994-12-30 1996-05-28 Hoechst Celanese Corporation Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom
US5837417A (en) * 1994-12-30 1998-11-17 Clariant Finance (Bvi) Limited Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition
US5618655A (en) * 1995-07-17 1997-04-08 Olin Corporation Process of reducing trace levels of metal impurities from resist components
US5623042A (en) * 1995-07-19 1997-04-22 Olin Corporation Process for reducing trace levels of metallic impurities in cyclized polyisoprene resin
US5693749A (en) * 1995-09-20 1997-12-02 Hoechst Celanese Corporation Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom
US5739265A (en) * 1995-09-20 1998-04-14 Clariant Finance (Bvi) Ltd. Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom
US5750031A (en) * 1995-09-26 1998-05-12 Clariant Finance (Bvi) Limited Process for producing surfactant having a low metal ion level and developer produced therefrom
US5656413A (en) * 1995-09-28 1997-08-12 Hoechst Celanese Corporation Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom
US5962183A (en) * 1995-11-27 1999-10-05 Clariant Finance (Bvi) Limited Metal ion reduction in photoresist compositions by chelating ion exchange resin
US5665517A (en) * 1996-01-11 1997-09-09 Hoechst Celanese Corporation Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom
GB9706219D0 (en) * 1997-03-24 1997-05-14 Evans Albert E J A method of producing foam and components and apparatus for use in the method
US5936071A (en) * 1998-02-02 1999-08-10 Clariant Finance (Bvi) Limited Process for making a photoactive compound and photoresist therefrom
US20060172231A1 (en) * 2002-08-08 2006-08-03 Fujifilm Electronic Materials U.S.A., Inc Use of an oxidizer to improve trace metals removal from photoresist and photoresist components
EP2197926A1 (en) * 2007-09-21 2010-06-23 Saint-Gobain Abrasives, Inc. Phenolic resin formulation and coatings for abrasive products
CN114456784B (zh) * 2021-12-07 2023-06-02 中国海洋石油集团有限公司 长存储性酚醛树脂交联剂及利用其制备得到的高温高盐凝胶

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2865875A (en) * 1956-07-19 1958-12-23 Catalin Corp Of America Low ash phenol-formaldehyde resins and process of preparation
US3432453A (en) * 1964-10-05 1969-03-11 Fiberglas Canada Ltd De-ionizing treatment for phenolic resins using a soluble ammonium salt
US3657188A (en) * 1970-03-02 1972-04-18 Butler Manufacturing Co Continuous production of resoles
US3624247A (en) * 1970-03-26 1971-11-30 Fiberglas Canada Ltd Deionizing treatment for phenolic resins using a soluble ammonium salt

Also Published As

Publication number Publication date
US4033909A (en) 1977-07-05
JPS5141791A (ja) 1976-04-08
DE2535869A1 (de) 1976-03-04
NL7509595A (nl) 1976-02-17
BR7505131A (pt) 1976-08-03
JPS5434431B2 (ja) 1979-10-26
AU8382775A (en) 1977-02-17
FR2281943A1 (fr) 1976-03-12
GB1510728A (en) 1978-05-17

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