JPS51100716A - - Google Patents

Info

Publication number
JPS51100716A
JPS51100716A JP51007863A JP786376A JPS51100716A JP S51100716 A JPS51100716 A JP S51100716A JP 51007863 A JP51007863 A JP 51007863A JP 786376 A JP786376 A JP 786376A JP S51100716 A JPS51100716 A JP S51100716A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP51007863A
Other languages
Japanese (ja)
Other versions
JPS5929850B2 (ja
Inventor
Nemuseku Jozefu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Imperial Chemical Industries Ltd
Original Assignee
Imperial Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imperial Chemical Industries Ltd filed Critical Imperial Chemical Industries Ltd
Publication of JPS51100716A publication Critical patent/JPS51100716A/ja
Publication of JPS5929850B2 publication Critical patent/JPS5929850B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/91—Polymers modified by chemical after-treatment
    • C08G63/912—Polymers modified by chemical after-treatment derived from hydroxycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025—Crosslinking or vulcanising agents; including accelerators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
JP51007863A 1975-01-27 1976-01-27 光重合性組成物 Expired JPS5929850B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB3366/75A GB1539192A (en) 1975-01-27 1975-01-27 Photopolymerisable compositions

Publications (2)

Publication Number Publication Date
JPS51100716A true JPS51100716A (sv) 1976-09-06
JPS5929850B2 JPS5929850B2 (ja) 1984-07-24

Family

ID=9756970

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51007863A Expired JPS5929850B2 (ja) 1975-01-27 1976-01-27 光重合性組成物

Country Status (13)

Country Link
JP (1) JPS5929850B2 (sv)
AU (1) AU500898B2 (sv)
BE (1) BE837782A (sv)
DE (1) DE2602574C2 (sv)
DK (1) DK32176A (sv)
FR (1) FR2298558A1 (sv)
GB (1) GB1539192A (sv)
IE (1) IE42402B1 (sv)
IT (1) IT1068132B (sv)
NL (1) NL7600760A (sv)
NZ (1) NZ179793A (sv)
SE (1) SE431990B (sv)
ZA (1) ZA76429B (sv)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5513780A (en) * 1978-05-09 1980-01-30 Dynachem Corp Fluoran coupler containing phototropic photosensitive composition
JPS6076735A (ja) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol 光硬化樹脂組成物
JPS6078443A (ja) * 1983-10-05 1985-05-04 Agency Of Ind Science & Technol 光不溶性樹脂組成物
JPS6078442A (ja) * 1983-10-04 1985-05-04 Agency Of Ind Science & Technol 光硬化性樹脂組成物
JPS62102242A (ja) * 1985-10-28 1987-05-12 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 光硬化性組成物
JPS63261352A (ja) * 1987-04-20 1988-10-28 Fuji Photo Film Co Ltd 感光性組成物
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1516352A (en) 1974-05-02 1978-07-05 Gen Electric Halonium salts
NL7812075A (nl) * 1977-12-16 1979-06-19 Gen Electric Hardbare, harsbevattende materialen en werkwijze voor het opschuimen hiervan.
GB2013208B (en) * 1977-12-16 1982-11-24 Gen Electric Heat curable compositions
EP0010897B1 (en) * 1978-10-27 1984-01-25 Imperial Chemical Industries Plc Polymerisable compositions, derived coatings and other polymerised products
DE2854011C2 (de) * 1978-12-14 1983-04-21 General Electric Co., Schenectady, N.Y. Hitzehärtbare Masse und Verfahren zu deren Herstellung
US4279717A (en) * 1979-08-03 1981-07-21 General Electric Company Ultraviolet curable epoxy silicone coating compositions
DE3029247C2 (de) * 1979-08-03 1996-04-11 Gen Electric UV-härtbare Siliconüberzugsmassen, Verfahren zu deren Herstellung und deren Verwendung
US4336366A (en) * 1980-02-29 1982-06-22 Ciba-Geigy Corporation Thermally polymerizable mixtures and processes for the thermally-initiated polymerization of cationically polymerizable compounds
DE3107087A1 (de) * 1980-02-29 1981-12-24 CIBA-GEIGY AG, 4002 Basel "photopolymerisierbare gemische und verfahren zur photopolymerisation von kationisch polymerisierbaren verbindungen"
US4351708A (en) * 1980-02-29 1982-09-28 Ciba-Geigy Corporation Photochemically or thermally polymerizable mixtures
US4439517A (en) * 1982-01-21 1984-03-27 Ciba-Geigy Corporation Process for the formation of images with epoxide resin
US4482679A (en) * 1982-09-18 1984-11-13 Ciba-Geigy Corporation Heat-curable epoxy compositions containing diaryliodosyl salts
US4537725A (en) * 1982-09-18 1985-08-27 Ciba-Geigy Corporation Diaryliodosyl salts
US4518676A (en) * 1982-09-18 1985-05-21 Ciba Geigy Corporation Photopolymerizable compositions containing diaryliodosyl salts
JPS60206328A (ja) * 1984-03-30 1985-10-17 Matsushita Electric Ind Co Ltd 高周波回路装置
US4689289A (en) * 1986-04-30 1987-08-25 General Electric Company Block polymer compositions
US4857437A (en) * 1986-12-17 1989-08-15 Ciba-Geigy Corporation Process for the formation of an image
DE3940965A1 (de) * 1989-12-12 1991-06-13 Basf Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefstrukturen
EP0502819A1 (de) * 1991-03-01 1992-09-09 Ciba-Geigy Ag Säurekatalytisch vernetzbare Copolymere
US5292614A (en) * 1991-08-02 1994-03-08 Mitsubishi Kasei Corporation Negative photosensitive composition and method for forming a resist pattern
US5286600A (en) * 1991-08-27 1994-02-15 Mitsubishi Kasei Corporation Negative photosensitive composition and method for forming a resist pattern by means thereof
EP0659781A3 (de) * 1993-12-21 1995-09-27 Ciba Geigy Ag Maleinimidcopolymere, insbesonder für Photoresists.
DE69815073T3 (de) 1997-03-14 2008-07-03 Minnesota Mining And Manufacturing Co., St. Paul Auf-anfrage-härtung von feuchtigkeithärtbaren zusammensetzungen mit reaktiven funktionellen silangruppen
GB9921779D0 (en) 1999-09-16 1999-11-17 Ciba Sc Holding Ag UV-Curable compositions
EP1978408B1 (en) 2007-03-29 2011-10-12 FUJIFILM Corporation Negative resist composition and pattern forming method using the same
WO2009063824A1 (ja) 2007-11-14 2009-05-22 Fujifilm Corporation 塗布膜の乾燥方法及び平版印刷版原版の製造方法
JP2009236355A (ja) 2008-03-26 2009-10-15 Fujifilm Corp 乾燥方法及び装置
JP5743783B2 (ja) 2011-07-27 2015-07-01 富士フイルム株式会社 感光性組成物、平版印刷版原版、及びポリウレタン
EP4077413A1 (en) 2019-12-18 2022-10-26 3M Innovative Properties Company Composition including unsaturated polyester resin, epoxy resin, and photoinitiator and method of using the same
FR3105231B1 (fr) * 2019-12-18 2021-12-10 Photon Polymers Procede photoradicalaire de durcissement d’une resine alkyde

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1516352A (en) 1974-05-02 1978-07-05 Gen Electric Halonium salts

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5513780A (en) * 1978-05-09 1980-01-30 Dynachem Corp Fluoran coupler containing phototropic photosensitive composition
JPS6352369B2 (sv) * 1978-05-09 1988-10-18 Dynachem Corp
JPS6076735A (ja) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol 光硬化樹脂組成物
JPS6078442A (ja) * 1983-10-04 1985-05-04 Agency Of Ind Science & Technol 光硬化性樹脂組成物
JPH0336421B2 (sv) * 1983-10-04 1991-05-31 Kogyo Gijutsuin
JPH0344287B2 (sv) * 1983-10-04 1991-07-05 Kogyo Gijutsuin
JPS6078443A (ja) * 1983-10-05 1985-05-04 Agency Of Ind Science & Technol 光不溶性樹脂組成物
JPH0565869B2 (sv) * 1983-10-05 1993-09-20 Kogyo Gijutsuin
JPS62102242A (ja) * 1985-10-28 1987-05-12 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 光硬化性組成物
JPS63261352A (ja) * 1987-04-20 1988-10-28 Fuji Photo Film Co Ltd 感光性組成物
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same

Also Published As

Publication number Publication date
IT1068132B (it) 1985-03-21
AU500898B2 (en) 1979-06-07
AU1053676A (en) 1977-08-11
FR2298558A1 (fr) 1976-08-20
DE2602574C2 (de) 1983-04-21
NL7600760A (nl) 1976-07-29
ZA76429B (en) 1977-09-28
JPS5929850B2 (ja) 1984-07-24
BE837782A (fr) 1976-07-22
IE42402B1 (en) 1980-07-30
SE431990B (sv) 1984-03-12
DE2602574A1 (de) 1976-07-29
IE42402L (en) 1976-07-27
GB1539192A (en) 1979-01-31
DK32176A (da) 1976-07-28
NZ179793A (en) 1978-04-03
SE7600771L (sv) 1976-07-28
FR2298558B1 (sv) 1980-05-30

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