JPS503958A - - Google Patents

Info

Publication number
JPS503958A
JPS503958A JP48091783A JP9178373A JPS503958A JP S503958 A JPS503958 A JP S503958A JP 48091783 A JP48091783 A JP 48091783A JP 9178373 A JP9178373 A JP 9178373A JP S503958 A JPS503958 A JP S503958A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48091783A
Other versions
JPS5815939B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS503958A publication Critical patent/JPS503958A/ja
Publication of JPS5815939B2 publication Critical patent/JPS5815939B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
JP48091783A 1972-08-18 1973-08-17 タンソシツザイリヨウオ ジヨキヨスルホウホウ Expired JPS5815939B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US28176472A 1972-08-18 1972-08-18

Publications (2)

Publication Number Publication Date
JPS503958A true JPS503958A (ja) 1975-01-16
JPS5815939B2 JPS5815939B2 (ja) 1983-03-28

Family

ID=23078694

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48091783A Expired JPS5815939B2 (ja) 1972-08-18 1973-08-17 タンソシツザイリヨウオ ジヨキヨスルホウホウ

Country Status (5)

Country Link
JP (1) JPS5815939B2 (ja)
DE (1) DE2341216C2 (ja)
FR (1) FR2196611A5 (ja)
GB (1) GB1408067A (ja)
IT (1) IT992983B (ja)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5856340A (ja) * 1981-09-30 1983-04-04 Toshiba Corp 半導体ウエハ浄化方法
JPS59161824A (ja) * 1983-03-04 1984-09-12 Seimitsu Entapuraizu:Kk 光照射装置
JPS6049630A (ja) * 1983-08-29 1985-03-18 Fujitsu Ltd 半導体装置の製造方法
JPS6039239U (ja) * 1983-08-24 1985-03-19 ウシオ電機株式会社 紫外線洗浄装置
JPS6039238U (ja) * 1983-08-24 1985-03-19 ウシオ電機株式会社 紫外線洗浄装置
JPS6039240U (ja) * 1983-08-24 1985-03-19 ウシオ電機株式会社 紫外線洗浄装置
JPS6053029A (ja) * 1983-09-02 1985-03-26 Ushio Inc 紫外線洗浄装置
JPS6127635A (ja) * 1984-07-17 1986-02-07 Samuko Internatl Kenkyusho:Kk フオトレジストの高能率乾式除去装置
JPS6153335A (ja) * 1984-08-22 1986-03-17 Tohoku Richo Kk プラスチツクのドライエツチング法
JPS6177852A (ja) * 1984-09-26 1986-04-21 Fujitsu Ltd パターン形成方法
JPS61123143A (ja) * 1984-11-19 1986-06-11 Fujitsu Ltd レジスト灰化方法
JPS61163342A (ja) * 1985-01-14 1986-07-24 Ricoh Co Ltd フオトレジスト除去方法
JPS63186430A (ja) * 1987-01-29 1988-08-02 Tokyo Electron Ltd アッシング方法及びアッシング装置
JPH02290551A (ja) * 1988-12-22 1990-11-30 Univ Dayton 改良されたガスクロマトグラフィー法及びその装置
JPH05117061A (ja) * 1991-04-25 1993-05-14 Abb Patent Gmbh 表面処理方法
JPH05322867A (ja) * 1990-03-05 1993-12-07 Univ Dayton 改良されたガスクロマトグラフィー分析法とその装置

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4341592A (en) * 1975-08-04 1982-07-27 Texas Instruments Incorporated Method for removing photoresist layer from substrate by ozone treatment
GB2118028B (en) * 1982-04-05 1985-12-18 Maxwell Lab Inc Decontaminating surfaces
US5068040A (en) * 1989-04-03 1991-11-26 Hughes Aircraft Company Dense phase gas photochemical process for substrate treatment
JPH05109674A (ja) * 1991-10-18 1993-04-30 Ushio Inc レジスト膜の灰化方法と灰化装置
DE4202158C1 (ja) * 1992-01-27 1993-07-22 Siemens Ag, 8000 Muenchen, De
US5417826A (en) * 1992-06-15 1995-05-23 Micron Technology, Inc. Removal of carbon-based polymer residues with ozone, useful in the cleaning of plasma reactors

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2443373A (en) * 1943-08-20 1948-06-15 Victor N Borsoff Method of removing carbon and carbonaceous matter
US3664899A (en) * 1969-12-29 1972-05-23 Gen Electric Removal of organic polymeric films from a substrate

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5856340A (ja) * 1981-09-30 1983-04-04 Toshiba Corp 半導体ウエハ浄化方法
JPS59161824A (ja) * 1983-03-04 1984-09-12 Seimitsu Entapuraizu:Kk 光照射装置
JPH0447957Y2 (ja) * 1983-08-24 1992-11-12
JPS6039239U (ja) * 1983-08-24 1985-03-19 ウシオ電機株式会社 紫外線洗浄装置
JPS6039238U (ja) * 1983-08-24 1985-03-19 ウシオ電機株式会社 紫外線洗浄装置
JPS6039240U (ja) * 1983-08-24 1985-03-19 ウシオ電機株式会社 紫外線洗浄装置
JPS6049630A (ja) * 1983-08-29 1985-03-18 Fujitsu Ltd 半導体装置の製造方法
JPS6053029A (ja) * 1983-09-02 1985-03-26 Ushio Inc 紫外線洗浄装置
JPS6127635A (ja) * 1984-07-17 1986-02-07 Samuko Internatl Kenkyusho:Kk フオトレジストの高能率乾式除去装置
JPS6153335A (ja) * 1984-08-22 1986-03-17 Tohoku Richo Kk プラスチツクのドライエツチング法
JPS6177852A (ja) * 1984-09-26 1986-04-21 Fujitsu Ltd パターン形成方法
JPH0473871B2 (ja) * 1984-09-26 1992-11-24
JPS61123143A (ja) * 1984-11-19 1986-06-11 Fujitsu Ltd レジスト灰化方法
JPS61163342A (ja) * 1985-01-14 1986-07-24 Ricoh Co Ltd フオトレジスト除去方法
JPS63186430A (ja) * 1987-01-29 1988-08-02 Tokyo Electron Ltd アッシング方法及びアッシング装置
JPH02290551A (ja) * 1988-12-22 1990-11-30 Univ Dayton 改良されたガスクロマトグラフィー法及びその装置
JPH05322867A (ja) * 1990-03-05 1993-12-07 Univ Dayton 改良されたガスクロマトグラフィー分析法とその装置
JPH05117061A (ja) * 1991-04-25 1993-05-14 Abb Patent Gmbh 表面処理方法

Also Published As

Publication number Publication date
DE2341216A1 (de) 1974-02-28
DE2341216C2 (de) 1985-11-07
IT992983B (it) 1975-09-30
GB1408067A (en) 1975-10-01
JPS5815939B2 (ja) 1983-03-28
FR2196611A5 (ja) 1974-03-15

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