JPH11514305A - 集積光学部品用の三次元構造重合体層の製造方法 - Google Patents
集積光学部品用の三次元構造重合体層の製造方法Info
- Publication number
- JPH11514305A JPH11514305A JP9509703A JP50970397A JPH11514305A JP H11514305 A JPH11514305 A JP H11514305A JP 9509703 A JP9509703 A JP 9509703A JP 50970397 A JP50970397 A JP 50970397A JP H11514305 A JPH11514305 A JP H11514305A
- Authority
- JP
- Japan
- Prior art keywords
- dry resist
- exposure
- polymerized
- dry
- structural
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/25—Preparing the ends of light guides for coupling, e.g. cutting
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4201—Packages, e.g. shape, construction, internal or external details
- G02B6/4202—Packages, e.g. shape, construction, internal or external details for coupling an active element with fibres without intermediate optical elements, e.g. fibres with plane ends, fibres with shaped ends, bundles
- G02B6/4203—Optical features
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
- G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2011/00—Optical elements, e.g. lenses, prisms
- B29L2011/0016—Lenses
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Eyeglasses (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Overhead Projectors And Projection Screens (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Graft Or Block Polymers (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.ドライレジスト技術および粒子ビーム誘導蒸着を使用して、集積光学部品に 使用するための三次元構造重合体層を製造する方法において、 露光により重合可能なドライレジストを基板に付与し、 該ドライレジストを、画像処理の方法を使用してサブミクロンの精度で予め 計算されそして所望の光学構造の形状を示す構造領域における空間と時間の関数 として予め定められた照射線量割合で露光し、そして 露光により重合された構造領域を乾式工程によって未露光ドライレジストか ら作り出すことを特徴とする方法。 2.フォトンまたは粒子ビームによって重合可能なオクタビニルシルセスキオキ サンが、ドライレジストとして、好ましく使用される請求項1に記載の方法。 3.露光により重合された構造領域が物理的現像、たとえば高真空下における加 熱によって該ドライレジストから作り出される請求項1に記載の方法。 4.露光により重合された構造領域が空気による加熱のごとき物理的現像によっ て該ドライレジストから作り出される請求項1に記載の方法。 5.露光により重合された構造領域がガス放電中での処理のごとき乾式化学現像 によって該ドライレジストから作り出される請求項1に記載の方法。 6.母材として使用される重合可能なドライレジストが、露光前に光学構造体の 光学的端面に付与される請求項1に記載の方法。 7.金属を含有するまたは含有しない有機重合体であって、粒子ビームによって 直接に重合および蒸着ができる有機重合体を、母材材料として、露光の間に、光 学構造体の光学的端面に付与し、そして、この際、照射線量を制御することによ って重合された構造領域を作り出す請求項1に記載の方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19531860 | 1995-08-30 | ||
DE19531860.9 | 1995-08-30 | ||
DE19630705A DE19630705A1 (de) | 1995-08-30 | 1996-07-30 | Verfahren zur Herstellung von 3-dimensional strukturierten Polymerschichten für die integrierte Optik |
DE19630705.8 | 1996-07-30 | ||
PCT/DE1996/001579 WO1997007970A2 (de) | 1995-08-30 | 1996-08-24 | Verfahren zur herstellung von 3-dimensional strukturierten polymerschichten für die integrierte optik |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH11514305A true JPH11514305A (ja) | 1999-12-07 |
JP4002606B2 JP4002606B2 (ja) | 2007-11-07 |
Family
ID=26018117
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50970397A Expired - Fee Related JP4002606B2 (ja) | 1995-08-30 | 1996-08-24 | 集積光学部品用の三次元構造重合体層の製造方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US6291139B1 (ja) |
EP (1) | EP0847329B1 (ja) |
JP (1) | JP4002606B2 (ja) |
AT (1) | ATE194544T1 (ja) |
DE (2) | DE19630705A1 (ja) |
WO (1) | WO1997007970A2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006121113A1 (ja) * | 2005-05-12 | 2006-11-16 | Tokyo Ohka Kogyo Co., Ltd. | 三次元微小成形体製造用感光性ドライフィルムおよび感光性樹脂組成物 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0847545B1 (de) | 1995-08-30 | 2000-02-16 | Deutsche Telekom AG | Verfahren zur verbesserung des kontrastes bei der strukturierung von 3-dimensionalen oberflächen |
DE19630705A1 (de) | 1995-08-30 | 1997-03-20 | Deutsche Telekom Ag | Verfahren zur Herstellung von 3-dimensional strukturierten Polymerschichten für die integrierte Optik |
US6198557B1 (en) | 1997-06-25 | 2001-03-06 | Deutsche Telekom Ag | Telecommunication system having frequency-dividing optical components for the parallel processing of optical pulses |
KR101101698B1 (ko) * | 2002-10-21 | 2011-12-30 | 나노잉크, 인크. | 나노미터-수준으로 제어된 구조, 이의 제작을 위한 방법 및장치, 및 마스크 복구, 강화, 및 제작에의 적용 |
DE102008048459A1 (de) | 2008-09-23 | 2010-03-25 | Pp-Mid Gmbh | Polymerformkörper mit leitfähigen Strukturen auf der Oberfläche, sowie Verfahren zu dessen Herstellung |
DE102008061051A1 (de) | 2008-12-08 | 2010-06-10 | Pp-Mid Gmbh | Leiterplatten-Anordnung und leitfähige Klebstoffe zum Verbinden von Bauteilen mit der Leiterplatte sowie Verfahren zu deren Herstellung |
WO2010015420A1 (de) * | 2008-08-08 | 2010-02-11 | Pp-Mid Gmbh | Polymerformkörper und leiterplatten-anordnung, sowie verfahren zu deren herstellung |
EP2151830A1 (de) | 2008-08-08 | 2010-02-10 | pp-mid GmbH | Polymerformkörper mit leitfähigen Strukturen auf der Oberfläche, sowie Verfahren zu dessen Herstellung |
DE102009011538A1 (de) | 2009-03-03 | 2010-09-09 | Pp-Mid Gmbh | Leiterplatten-Anordnung, sowie Verfahren zu deren Herstellung |
EP2916151B1 (en) * | 2014-03-05 | 2020-01-01 | Corning Optical Communications LLC | Method of forming a fiber coupling device |
CN107283835A (zh) * | 2017-07-21 | 2017-10-24 | 中国科学院微电子研究所 | 一种3d打印装置 |
Family Cites Families (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4357364A (en) | 1981-04-27 | 1982-11-02 | Rockwell International Corporation | High rate resist polymerization method |
SU1045312A1 (ru) * | 1981-10-15 | 1983-09-30 | Институт Неорганической Химии Со Ан Ссср | Способ литографии |
US4560641A (en) * | 1982-03-26 | 1985-12-24 | Hitachi, Ltd. | Method for forming fine multilayer resist patterns |
US4430153A (en) | 1983-06-30 | 1984-02-07 | International Business Machines Corporation | Method of forming an RIE etch barrier by in situ conversion of a silicon containing alkyl polyamide/polyimide |
DE3410885A1 (de) | 1984-03-24 | 1985-10-03 | Ibm Deutschland Gmbh, 7000 Stuttgart | Fehlerkorrigierte korpuskularstrahllithographie |
US4814626A (en) | 1985-12-13 | 1989-03-21 | Siemens Aktiengesellschaft | Method for high precision position measurement of two-dimensional structures |
DE3705361A1 (de) | 1987-02-17 | 1988-08-25 | Fraunhofer Ges Forschung | Einrichtung zur zerstoerungsfreien bilderzeugung und ortsselektiven oberflaechenbearbeitung in fokussierten ionenstrahlsystemen |
US5298112A (en) | 1987-08-28 | 1994-03-29 | Kabushiki Kaisha Toshiba | Method for removing composite attached to material by dry etching |
US5292620A (en) * | 1988-01-15 | 1994-03-08 | E. I. Du Pont De Nemours And Company | Optical waveguide devices, elements for making the devices and methods of making the devices and elements |
FR2652423B1 (fr) | 1989-09-22 | 1992-05-22 | Ardt Rgle Dev Techn | Procede de microlithographie pour la realisation de structures superficielles submicrometriques sur un substrat du type d'une plaquette de silicium, ainsi qu'un dispositif le mettant en óoeuvre. |
CH680214A5 (ja) | 1989-11-06 | 1992-07-15 | Balzers Hochvakuum | |
US5104684A (en) | 1990-05-25 | 1992-04-14 | Massachusetts Institute Of Technology | Ion beam induced deposition of metals |
DE4112695C3 (de) | 1990-12-21 | 1998-07-23 | Eos Electro Optical Syst | Verfahren und Vorrichtung zum Herstellen eines dreidimensionalen Objekts |
DE4202651A1 (de) | 1992-01-30 | 1993-08-05 | Fraunhofer Ges Forschung | Verfahren zur trockenentwicklung einer siliziumhaltigen ultraviolett- und/oder elektronenstrahlempfindlichen lackschicht |
EP0571727A1 (en) | 1992-04-23 | 1993-12-01 | International Business Machines Corporation | Apparatus and method for focussed ion beam deposition by controlling beam parameters |
JPH05303008A (ja) * | 1992-04-27 | 1993-11-16 | Fujitsu Ltd | 固体撮像装置及びその製造方法 |
US5439780A (en) * | 1992-04-29 | 1995-08-08 | At&T Corp. | Energy sensitive materials and methods for their use |
JP3730263B2 (ja) | 1992-05-27 | 2005-12-21 | ケーエルエー・インストルメンツ・コーポレーション | 荷電粒子ビームを用いた自動基板検査の装置及び方法 |
GB9225270D0 (en) | 1992-12-03 | 1993-01-27 | Gec Ferranti Defence Syst | Depositing different materials on a substrate |
TW269017B (ja) * | 1992-12-21 | 1996-01-21 | Ciba Geigy Ag | |
US5288368A (en) | 1992-12-23 | 1994-02-22 | At&T Bell Laboratories | Electron beam lithography with reduced charging effects |
TW276353B (ja) | 1993-07-15 | 1996-05-21 | Hitachi Seisakusyo Kk | |
WO1995002472A1 (en) | 1993-07-16 | 1995-01-26 | Fusion Systems Corporation | Post treatment of a coated substrate with a gas containing excited halogen to remove residues |
JPH07209536A (ja) * | 1994-01-13 | 1995-08-11 | Nippon Telegr & Teleph Corp <Ntt> | ポリイミド光導波路製造装置及びポリイミド光導波路の製造方法 |
US5422897A (en) | 1994-01-28 | 1995-06-06 | British Telecommunications Public Limited Company | Two-stage mono-mode optical fibre laser |
GB9409033D0 (en) | 1994-05-06 | 1994-06-29 | Univ Southampton | Optical fibre laser |
DE4416597B4 (de) | 1994-05-11 | 2006-03-02 | Nawotec Gmbh | Verfahren und Vorrichtung zur Herstellung der Bildpunkt-Strahlungsquellen für flache Farb-Bildschirme |
FR2720198B1 (fr) | 1994-05-20 | 1996-07-19 | France Telecom | Laser à fibre optique polarisé linéairement. |
DE4424236A1 (de) * | 1994-07-09 | 1996-01-18 | Deutsche Bundespost Telekom | Verfahren zur Strukturierung der Oberfläche eines aus einem Polymer bestehenden Körpers und nach dem Verfahren hergestellte Anordnungen |
DE19506880A1 (de) | 1995-02-17 | 1996-08-22 | Hertz Inst Heinrich | Verfahren zur Herstellung von optischen Übergitterstrukturen mittels Elektronenstrahllithographie |
JPH0950951A (ja) | 1995-08-04 | 1997-02-18 | Nikon Corp | リソグラフィ方法およびリソグラフィ装置 |
DE19630705A1 (de) | 1995-08-30 | 1997-03-20 | Deutsche Telekom Ag | Verfahren zur Herstellung von 3-dimensional strukturierten Polymerschichten für die integrierte Optik |
DE19628353A1 (de) | 1995-08-30 | 1997-03-06 | Deutsche Telekom Ag | Verfahren zur Verbesserung des Kontrastes bei der Strukturierung von 3-dimensionalen Oberflächen |
GB9519546D0 (en) | 1995-09-25 | 1995-11-29 | Gec Marconi Avionics Holdings | Depositing optical coatings |
DE19545721C2 (de) | 1995-12-07 | 2003-02-20 | Deutsche Telekom Ag | Verfahren und Vorrichtung zum Herstellen und präzisen Positionieren von optischen Mikrokomponenten auf einer über einer optischen Einrichtung |
US5849639A (en) | 1997-11-26 | 1998-12-15 | Lucent Technologies Inc. | Method for removing etching residues and contaminants |
-
1996
- 1996-07-30 DE DE19630705A patent/DE19630705A1/de not_active Withdrawn
- 1996-08-24 US US09/029,505 patent/US6291139B1/en not_active Expired - Lifetime
- 1996-08-24 AT AT96942998T patent/ATE194544T1/de not_active IP Right Cessation
- 1996-08-24 EP EP96942998A patent/EP0847329B1/de not_active Expired - Lifetime
- 1996-08-24 JP JP50970397A patent/JP4002606B2/ja not_active Expired - Fee Related
- 1996-08-24 DE DE59605600T patent/DE59605600D1/de not_active Expired - Lifetime
- 1996-08-24 WO PCT/DE1996/001579 patent/WO1997007970A2/de active IP Right Grant
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006121113A1 (ja) * | 2005-05-12 | 2006-11-16 | Tokyo Ohka Kogyo Co., Ltd. | 三次元微小成形体製造用感光性ドライフィルムおよび感光性樹脂組成物 |
JP2006317698A (ja) * | 2005-05-12 | 2006-11-24 | Tokyo Ohka Kogyo Co Ltd | 三次元微小成形体製造用感光性ドライフィルムおよび感光性樹脂組成物 |
Also Published As
Publication number | Publication date |
---|---|
ATE194544T1 (de) | 2000-07-15 |
DE19630705A1 (de) | 1997-03-20 |
EP0847329A2 (de) | 1998-06-17 |
EP0847329B1 (de) | 2000-07-12 |
DE59605600D1 (de) | 2000-08-17 |
WO1997007970A2 (de) | 1997-03-06 |
JP4002606B2 (ja) | 2007-11-07 |
US6291139B1 (en) | 2001-09-18 |
WO1997007970A3 (de) | 1997-06-05 |
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