JPH11354507A5 - - Google Patents

Info

Publication number
JPH11354507A5
JPH11354507A5 JP1998160202A JP16020298A JPH11354507A5 JP H11354507 A5 JPH11354507 A5 JP H11354507A5 JP 1998160202 A JP1998160202 A JP 1998160202A JP 16020298 A JP16020298 A JP 16020298A JP H11354507 A5 JPH11354507 A5 JP H11354507A5
Authority
JP
Japan
Prior art keywords
gas
dry etching
etching method
workpiece
semiconductor laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998160202A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11354507A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP16020298A priority Critical patent/JPH11354507A/ja
Priority claimed from JP16020298A external-priority patent/JPH11354507A/ja
Publication of JPH11354507A publication Critical patent/JPH11354507A/ja
Publication of JPH11354507A5 publication Critical patent/JPH11354507A5/ja
Pending legal-status Critical Current

Links

JP16020298A 1998-06-09 1998-06-09 ドライエッチング方法および半導体装置 Pending JPH11354507A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16020298A JPH11354507A (ja) 1998-06-09 1998-06-09 ドライエッチング方法および半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16020298A JPH11354507A (ja) 1998-06-09 1998-06-09 ドライエッチング方法および半導体装置

Publications (2)

Publication Number Publication Date
JPH11354507A JPH11354507A (ja) 1999-12-24
JPH11354507A5 true JPH11354507A5 (enExample) 2005-10-13

Family

ID=15710007

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16020298A Pending JPH11354507A (ja) 1998-06-09 1998-06-09 ドライエッチング方法および半導体装置

Country Status (1)

Country Link
JP (1) JPH11354507A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2806324B1 (fr) * 2000-03-15 2002-09-27 Air Liquide Procede et dispositif de mise en oeuvre d'une reaction chimique et procede de traitement de surface utilisant de tels procede et dispositif

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