JPH11338162A5 - - Google Patents
Info
- Publication number
- JPH11338162A5 JPH11338162A5 JP1998147270A JP14727098A JPH11338162A5 JP H11338162 A5 JPH11338162 A5 JP H11338162A5 JP 1998147270 A JP1998147270 A JP 1998147270A JP 14727098 A JP14727098 A JP 14727098A JP H11338162 A5 JPH11338162 A5 JP H11338162A5
- Authority
- JP
- Japan
- Prior art keywords
- mask
- stage
- optical system
- exposure apparatus
- illumination optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14727098A JP4324989B2 (ja) | 1998-05-28 | 1998-05-28 | 露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14727098A JP4324989B2 (ja) | 1998-05-28 | 1998-05-28 | 露光装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11338162A JPH11338162A (ja) | 1999-12-10 |
| JPH11338162A5 true JPH11338162A5 (https=) | 2005-10-06 |
| JP4324989B2 JP4324989B2 (ja) | 2009-09-02 |
Family
ID=15426425
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14727098A Expired - Lifetime JP4324989B2 (ja) | 1998-05-28 | 1998-05-28 | 露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4324989B2 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003076030A (ja) * | 2001-09-06 | 2003-03-14 | Hitachi Electronics Eng Co Ltd | 露光装置における光照射装置 |
| JP5057382B2 (ja) * | 2007-12-18 | 2012-10-24 | Nskテクノロジー株式会社 | 露光装置及び基板の製造方法 |
| JP5105167B2 (ja) * | 2007-12-26 | 2012-12-19 | Nskテクノロジー株式会社 | 近接露光装置及び近接露光装置用マスクアダプタ |
| JP5141648B2 (ja) * | 2009-07-29 | 2013-02-13 | 大日本印刷株式会社 | プロキシミティ露光装置及びこのプロキシミティ露光装置を用いた露光方法 |
| JP2018045060A (ja) * | 2016-09-13 | 2018-03-22 | キヤノン株式会社 | 照明装置、露光装置及び物品の製造方法 |
-
1998
- 1998-05-28 JP JP14727098A patent/JP4324989B2/ja not_active Expired - Lifetime
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20130301022A1 (en) | Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine | |
| US6753534B2 (en) | Positioning stage with stationary and movable magnet tracks | |
| JP2862385B2 (ja) | 露光装置 | |
| KR970003775B1 (ko) | 석판 인쇄 시스템의 마스크 로딩용 마스크 트레이 및 마스크 로딩방법 | |
| JP4342663B2 (ja) | 周辺露光装置 | |
| JPH11338162A5 (https=) | ||
| JP2986080B2 (ja) | 回転レチクル走査式投影リソグラフィ装置および方法 | |
| JP5057382B2 (ja) | 露光装置及び基板の製造方法 | |
| US20080225248A1 (en) | Apparatus, systems and methods for removing liquid from workpiece during workpiece processing | |
| JP4324989B2 (ja) | 露光装置 | |
| KR101169240B1 (ko) | 노광 장치용 광조사 장치, 노광 장치 및 노광 방법 | |
| JP3862131B2 (ja) | 近接露光装置 | |
| JP2000250227A (ja) | 露光装置 | |
| JP3340720B2 (ja) | 周辺露光装置 | |
| JPH08314158A (ja) | 精密両面露光装置および露光方法ならびに透光板の固定方法 | |
| JP4310056B2 (ja) | 露光装置 | |
| JP3809092B2 (ja) | 露光装置用光源システム | |
| KR20010046478A (ko) | 수직형 대면적 노광장치 | |
| US20030230729A1 (en) | Positioning stage with stationary and movable magnet tracks | |
| JP5702122B2 (ja) | 露光装置用光照射装置 | |
| JP2005121959A5 (https=) | ||
| JP2008020844A (ja) | 近接露光装置 | |
| JPH01261821A (ja) | 縮小投影露光装置 | |
| JP2012189800A (ja) | 近接露光装置 | |
| KR101578385B1 (ko) | 근접 노광 장치, 근접 노광 방법 및 조명 광학계 |