JPH11309638A - Vacuum suction pad - Google Patents

Vacuum suction pad

Info

Publication number
JPH11309638A
JPH11309638A JP10118946A JP11894698A JPH11309638A JP H11309638 A JPH11309638 A JP H11309638A JP 10118946 A JP10118946 A JP 10118946A JP 11894698 A JP11894698 A JP 11894698A JP H11309638 A JPH11309638 A JP H11309638A
Authority
JP
Japan
Prior art keywords
suction
workpiece
vacuum suction
vacuum
annular groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10118946A
Other languages
Japanese (ja)
Inventor
Hiroyuki Morioka
裕之 森岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP10118946A priority Critical patent/JPH11309638A/en
Publication of JPH11309638A publication Critical patent/JPH11309638A/en
Pending legal-status Critical Current

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Jigs For Machine Tools (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a durable vacuum suction pad whose suction ports are hardly clogged. SOLUTION: In this suction pad 1, a suction surface 9 provided with suction ports 3 for sucking and fixing a work piece, is formed out of ceramics, and concurrently, an annular groove 10 which is slightly smaller in diameter than the outer shape of an item to be sucked up, and is laid along the outer shape, is recessed in the suction surface 9 so as to be provided. And a frame shaped sealing member 11 made out of an elastic body is disposed to the annular groove 10 in a state that its head is raised up above the suction surface 9, so that the vacuum suction pad 1 is formed up.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、研磨、研削、切削
等の加工を施す被加工物を真空吸引にて精度良く固定す
ることができるとともに、吸着面上の吸引孔に殆ど目詰
まりを生じることがない真空吸着盤に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is capable of accurately fixing a workpiece to be polished, ground, cut, or the like by vacuum suction, and almost causing clogging of a suction hole on a suction surface. The present invention relates to a vacuum suction disk without any problem.

【0002】[0002]

【従来技術】従来、例えばシリコンウエハの製造工程で
は、高純度シリコンを溶融し、種結晶と呼ばれる単結晶
シリコンを溶融液に接触させたあと徐々に引き上げるこ
とにより単結晶シリコンのインゴットを製作し、得られ
たインゴットを薄板状に切断加工したあと、研削加工や
研磨加工をそれぞれ施すことにより製作されるのである
が、この研削加工や研磨加工時にシリコンウエハを精度
良く固定するのに真空吸着盤が使用されている。
2. Description of the Related Art Conventionally, for example, in a manufacturing process of a silicon wafer, a single crystal silicon ingot is manufactured by melting high-purity silicon, bringing single crystal silicon called a seed crystal into contact with a molten liquid, and gradually pulling it up. It is manufactured by cutting the obtained ingot into a thin plate and then performing grinding and polishing, respectively.A vacuum suction machine is used to fix the silicon wafer accurately during the grinding and polishing. in use.

【0003】また、シリコンウエハへのデバイス形成時
に積層膜の表面を平坦化するための研磨加工時やデバイ
スを形成したシリコンウエハを所定の肉厚となるまで削
る研削加工時においてもシリコンウエハを固定するのに
真空吸着盤が使用されている。
[0003] In addition, the silicon wafer is fixed also during polishing for flattening the surface of the laminated film when forming a device on the silicon wafer or during grinding for shaving the silicon wafer on which the device is formed to a predetermined thickness. Vacuum suction cups are used to do this.

【0004】この種の真空吸着盤には大きくわけて2種
類のものがあり、例えば、図5に示す真空吸着盤21
は、略円盤状をした枠体24の中央に形成された凹部2
5に吸引板22を接合してなり、該吸引板22を多数の
貫通微小孔からなる吸引孔23を備えた緻密質体により
形成したものであり、また、図6に示す真空吸着盤31
は、略円盤状をした枠体34の中央に形成された凹部3
5に吸引板32を接合してなり、該吸引板32を連続し
た3次元網目構造の微小空孔からなる吸引孔33を備え
た多孔質体により形成したものがあった。
There are roughly two types of vacuum suction disks of this type. For example, a vacuum suction disk 21 shown in FIG.
Is a concave portion 2 formed at the center of a substantially disk-shaped frame 24.
5, a suction plate 22 is formed by a dense body having a suction hole 23 composed of a large number of penetrating micro holes. The vacuum suction disk 31 shown in FIG.
Is a concave portion 3 formed in the center of a substantially disk-shaped frame body 34.
In some cases, a suction plate 32 was joined to the suction pipe 5, and the suction plate 32 was formed of a porous body having suction holes 33 formed of continuous microscopic pores having a three-dimensional network structure.

【0005】そして、いずれの真空吸着盤21,31も
吸引孔23,33を介して真空吸引することにより吸着
面26,36に載置したシリコンウエハなどの被加工物
を吸引固定するようになっていた。
[0005] Each of the vacuum suction plates 21 and 31 is vacuum-sucked through the suction holes 23 and 33 to thereby fix a workpiece such as a silicon wafer placed on the suction surfaces 26 and 36 by suction. I was

【0006】また、これら真空吸着盤21,31の吸着
面26,36は、被加工物を精度良く固定するために高
剛性を有するとともに高精度に平坦化でき、しかも、酸
性やアルカリ性等の薬品に対して優れた耐薬品性を有し
ていることが必要であることから、少なくとも吸引板2
2,32を構成する緻密質体や多孔質体としてアルミナ
や炭化珪素を主成分とするセラミックスにより形成した
ものがあった(特開平4−35827号公報参照)。
The suction surfaces 26 and 36 of the vacuum suction disks 21 and 31 have high rigidity and can be flattened with high precision in order to fix a workpiece with high precision. It is necessary to have excellent chemical resistance to
Some of the dense bodies and porous bodies constituting the second and second ceramics were formed of ceramics containing alumina or silicon carbide as a main component (see JP-A-4-35827).

【0007】[0007]

【発明が解決しようとする課題】ところが、図5や図6
に示す真空吸着盤21,31により被加工物を保持した
状態で研磨、研削あるいは切削等の加工を施すと、吸着
面26,36に存在する吸引孔23,33が次第に目詰
まりを起こし、所定の吸引力が得られなくなるために被
加工物を精度良く保持できなくなるといった課題があっ
た。
However, FIG. 5 and FIG.
When the workpiece is held by the vacuum suction disks 21 and 31 shown in FIG. 1 and the workpiece is polished, ground or cut, the suction holes 23 and 33 existing in the suction surfaces 26 and 36 gradually become clogged. There has been a problem that the workpiece cannot be held with high accuracy because the suction force cannot be obtained.

【0008】即ち、真空吸着盤21,31の吸着面2
6,36に被加工物を吸引固定したとしても真空吸着盤
21,31の吸着面26,36や被加工物の面粗度や平
面精度等の影響により両者を完全に密着させることは難
しく、被加工物と吸着面26,36との間に微小な隙間
が形成されることは避けられなかった。その為、例え
ば、被加工物の研磨加工では、上記微少な隙間から砥粒
や研磨粉あるいはゴミ等の異物を含んだ研磨液が吸着面
26,36上の吸引孔23,33に吸い込まれて堆積す
る結果、吸引孔23,33を目詰まりさせていた。
That is, the suction surface 2 of the vacuum suction disks 21 and 31
Even if the workpiece is suction-fixed to the workpieces 6, 36, it is difficult to completely adhere the workpieces due to the influence of the surface roughness and planar accuracy of the suction surfaces 26, 36 of the vacuum suction disks 21, 31 and the workpiece. The formation of a minute gap between the workpiece and the suction surfaces 26 and 36 was inevitable. Therefore, for example, in the polishing process of the workpiece, the polishing liquid containing foreign matter such as abrasive grains, polishing powder or dust is sucked into the suction holes 23 and 33 on the suction surfaces 26 and 36 from the minute gaps. As a result, the suction holes 23 and 33 are clogged.

【0009】しかも、吸着面26,36の吸引孔23,
33に入り込んだ異物は洗浄処理を施しても完全に除去
することが難しかった。特に吸着面26,36が多孔質
体からなる真空吸着盤31では、吸引孔33が3次元網
目構造に入り組んだ構造をしていることから殆ど除去で
きず、初期の状態に戻すことは困難であった。
Moreover, the suction holes 23 of the suction surfaces 26, 36,
It is difficult to completely remove the foreign matter that has entered 33 even if a cleaning process is performed. In particular, in the vacuum suction plate 31 in which the suction surfaces 26 and 36 are made of a porous material, the suction holes 33 have a three-dimensional network structure, so that they can hardly be removed, and it is difficult to return to the initial state. there were.

【0010】また、被加工物の搬送は真空吸引機能を備
えた搬送アームによって、真空吸着盤21,31の吸着
面26,36へ載置したり、吸着面26,36から離脱
させるのであるが、吸着面26,36がセラミックスの
ような硬質材料からなる場合、載置あるいは離脱時にお
ける摺動によって被加工物を傷つけてしまうといった恐
れもあった。
The workpiece is transported by a transport arm having a vacuum suction function, and is placed on the suction surfaces 26 and 36 of the vacuum suction disks 21 and 31 and detached from the suction surfaces 26 and 36. When the suction surfaces 26 and 36 are made of a hard material such as ceramics, there is a fear that the workpiece may be damaged by sliding at the time of mounting or detaching.

【0011】[0011]

【課題を解決するための手段】そこで、本発明は上記課
題に鑑み、被加工物を吸引固定するための吸引孔を備え
た吸着面に、上記被加工物の外形より小さくかつその外
形に沿った環状溝を凹設するとともに、該環状溝に弾性
体からなる枠状のシール部材を前記吸着面より頭出させ
た状態で配設して真空吸着盤を構成したものである。
SUMMARY OF THE INVENTION In view of the above-mentioned problems, the present invention provides a suction surface provided with a suction hole for sucking and fixing a workpiece, which is smaller than the outer shape of the workpiece and along the outer shape of the workpiece. And a frame-shaped sealing member made of an elastic body is disposed in the annular groove so as to protrude from the suction surface to form a vacuum suction disk.

【0012】[0012]

【作用】本発明の真空吸着盤によれば、吸着面に載置し
た被加工物を吸引孔より真空吸引して吸引固定すること
により、吸着面より頭出させてあるシール部材が被加工
物と気密に密着して空気の漏れを防ぐことができるた
め、被加工物の周縁においても大きな吸引力を得ること
ができるとともに、外部より砥粒や研磨粉あるいはゴミ
等の異物が吸引孔に吸い込まれることが殆どないため、
吸引孔の目詰まりを防ぐことができる。しかも、上記シ
ール部材は弾性変形して環状溝内に収納することができ
るため、被加工物を吸着面上に精度良く吸着固定するこ
とができる。さらに、真空引きしていない時には被加工
物をシール部材によって持ち上げ、吸着面との接触面積
を小さくできるため、吸着面がセラミックスのような硬
質材料からなる場合であっても、被加工物を吸着面へ載
置したり、吸着面から離脱する際の摺動によって被加工
物を傷付けることがない。
According to the vacuum suction disk of the present invention, the work piece placed on the suction surface is vacuum-sucked through the suction hole and fixed by suction, so that the sealing member protruding from the suction surface is processed. Air tightly to prevent air leakage, so that a large suction force can be obtained even at the peripheral edge of the workpiece, and foreign substances such as abrasive grains, polishing powder or dust are sucked into the suction holes from outside. Hardly ever
Clogging of the suction hole can be prevented. In addition, since the seal member can be elastically deformed and housed in the annular groove, the workpiece can be accurately suction-fixed on the suction surface. Furthermore, when the workpiece is not evacuated, the workpiece is lifted up by the sealing member and the contact area with the suction surface can be reduced, so that the workpiece is sucked even when the suction surface is made of a hard material such as ceramics. The work piece is not damaged by sliding when placed on the surface or detached from the suction surface.

【0013】[0013]

【発明の実施の形態】以下、本発明の実施形態について
説明する。
Embodiments of the present invention will be described below.

【0014】図1(a)は本発明の真空吸着盤の一例を
示す斜視図、(b)は(a)のX−X線断面図である。
FIG. 1A is a perspective view showing an example of the vacuum suction disk of the present invention, and FIG. 1B is a sectional view taken along line XX of FIG.

【0015】この真空吸着盤1は、中央に円形の凹部5
を有する略円盤状の枠体4と、吸引孔3をなす微小空孔
が連続した三次元網目構造を有する多孔質セラミックス
からなる吸引板2とからなり、該吸引板2は枠体4の凹
部5にガラスや接着剤等にて接合されている。そして、
上記吸引板2の上面と枠体4の凹部5を構成する隔壁6
の頂面とは同一平面上に位置するように構成してあり、
上記吸引板2の上面及び隔壁6の頂面を吸着面9として
ある。なお、上記吸引板2は被加工物Wとの気密性を確
保するために被加工物Wの外形よりも僅かに小さくなる
ように構成してあり、また、枠体4の外周縁にはフラン
ジ部8が設けてあり、該フランジ部8をネジ止めや係合
等の手段によって各種装置に取り付けるようになってい
る。
This vacuum suction disk 1 has a circular recess 5 in the center.
And a suction plate 2 made of porous ceramics having a three-dimensional network structure in which minute holes forming the suction holes 3 are continuous. The suction plate 2 has a concave portion of the frame 4. 5 is joined with glass, an adhesive or the like. And
The upper surface of the suction plate 2 and the partition 6 forming the recess 5 of the frame 4
It is configured to be located on the same plane as the top surface of
The upper surface of the suction plate 2 and the top surface of the partition 6 are used as a suction surface 9. The suction plate 2 is configured to be slightly smaller than the outer shape of the workpiece W in order to secure airtightness with the workpiece W. A portion 8 is provided, and the flange portion 8 is attached to various devices by means such as screwing or engaging.

【0016】また、上記枠体4における隔壁6の内面側
には段部7が設けてあり、枠体4の凹部5に接合された
吸引板2とで環状溝10を構成するようにしてあり、該
環状溝10には弾性体からなる枠状のシール部材11を
前記吸着面9より若干頭出させた状態で配設してある。
詳細には図2(a)に示すように、環状溝10内に弾性
体からなる枠状のシール部材11を吸着面9より頭出さ
せた状態で配置するとともに、隔壁6の段部7には頂面
から伸びるテーパ状の切欠7aを形成してあり、被加工
物Wを吸着固定した時に吸着面9より頭出するシール部
材11の先端が弾性変形して、上記切欠7aに収納され
るようになっている。
A step 7 is provided on the inner surface side of the partition 6 in the frame 4 so that an annular groove 10 is constituted by the suction plate 2 joined to the recess 5 of the frame 4. A frame-shaped sealing member 11 made of an elastic body is disposed in the annular groove 10 so as to slightly protrude from the suction surface 9.
In detail, as shown in FIG. 2A, a frame-shaped sealing member 11 made of an elastic body is disposed in the annular groove 10 so as to protrude from the suction surface 9, and is provided on the step 7 of the partition wall 6. Is formed with a tapered notch 7a extending from the top surface, and when the workpiece W is suction-fixed, the tip of the seal member 11 protruding from the suction surface 9 is elastically deformed and stored in the notch 7a. It has become.

【0017】そして、この真空吸着盤1によりシリコン
ウエハなどの被加工物Wを吸引固定するには、まず、吸
着面9に被加工物Wを載置する。この時、被加工物Wの
周縁は吸着面9より頭出するシール部材11により支持
され、吸着面9との摺動による被加工物Wの傷付きを防
ぐことができる。
In order to suction-fix a workpiece W such as a silicon wafer by the vacuum suction disk 1, the workpiece W is first placed on the suction surface 9. At this time, the peripheral edge of the workpiece W is supported by the sealing member 11 protruding from the suction surface 9, so that the workpiece W can be prevented from being damaged by sliding with the suction surface 9.

【0018】次に、不図示の真空ポンプにより吸引孔3
を介して真空吸引すれば、被加工物W、シール部材1
1、吸着面9で囲まれた空間が負圧となり、被加工物W
は吸着面9に吸引固定されるのであるが、この時、図2
(b)(c)に示すようにシール部材11の先端は弾性
変形して隔壁6の切欠7aに収納され、被加工物Wを吸
着面9の平坦精度に倣わせて精度良く固定することがで
きる。また、上記シール部材11は被加工物Wの面粗度
の影響を受けることなく密着させることができるため、
空気の漏れを防いで被加工物Wの全面を均一な吸引力で
もって吸引固定することができるとともに、外部から異
物が吸引孔3に吸い込まれることを防ぎ、吸引孔3の目
詰まりを防止することができる。
Next, the suction holes 3 are formed by a vacuum pump (not shown).
Workpiece W, seal member 1
1. The space surrounded by the suction surface 9 becomes negative pressure, and the workpiece W
Is fixed to the suction surface 9 by suction.
(B) As shown in (c), the tip of the sealing member 11 is elastically deformed and stored in the notch 7 a of the partition 6, and the workpiece W can be fixed with high accuracy by following the flatness of the suction surface 9. it can. Further, since the seal member 11 can be closely attached without being affected by the surface roughness of the workpiece W,
The entire surface of the workpiece W can be suction-fixed with uniform suction force by preventing air leakage, and foreign substances are prevented from being sucked into the suction holes 3 from the outside, and clogging of the suction holes 3 is prevented. be able to.

【0019】その為、この真空吸着盤1を、研削、研磨
あるいは切削等の加工に用いれば、砥粒や研磨粉あるい
はゴミ等の異物を含んだ研磨液が吸引孔3に吸い込まれ
ることがないため、吸引孔3の目詰まりがなく、その結
果、洗浄作業が殆ど不要な長寿命の真空吸着盤1とする
ことができる。
Therefore, if the vacuum suction disk 1 is used for processing such as grinding, polishing or cutting, the polishing liquid containing abrasives, polishing powder or foreign matter such as dust will not be sucked into the suction holes 3. Therefore, the suction holes 3 are not clogged, and as a result, a long-life vacuum suction disk 1 requiring almost no cleaning operation can be obtained.

【0020】また、真空引きしていない状態では、シー
ル部材11の先端に弾性変形による復元力が働き、被加
工物Wを持ち上げることができるため、吸着面9との接
触面積を小さくすることができる。その為、真空吸引機
能を備えた搬送アームにて被加工物Wを吸着面9へ載置
したり吸着面9より離脱させる際に、吸着面9との摺動
に伴う被加工物Wの傷付きを防ぐこともできる。
Further, in a state where the sealing member 11 is not evacuated, a restoring force is exerted on the tip of the seal member 11 by elastic deformation, and the workpiece W can be lifted, so that the contact area with the suction surface 9 can be reduced. it can. Therefore, when the workpiece W is placed on the suction surface 9 or separated from the suction surface 9 by the transfer arm having the vacuum suction function, the damage of the workpiece W caused by the sliding with the suction surface 9 is caused. It can also prevent sticking.

【0021】ところで、上記シール部材11としては、
シリコーンゴムや天然ゴムなどゴム材あるいはウレタン
樹脂やエポキシ樹脂などの樹脂材等の弾性体を用いるこ
とができ、硬さがJIS Aにおいて15〜30、引張
り強さが10〜30kg/cm2 、伸び率が200〜4
00%の範囲にあるものが良い。特にシリコーンゴムは
耐薬品性や耐候性をも兼ね備えていることから、研磨加
工や研削加工など酸性やアルカリ性の薬液に曝されるシ
ール部材11として好適である。
By the way, as the sealing member 11,
An elastic body such as a rubber material such as silicone rubber or natural rubber or a resin material such as urethane resin or epoxy resin can be used. The hardness is 15 to 30 in JIS A, the tensile strength is 10 to 30 kg / cm 2 , and the elongation is Rate is 200-4
Those in the range of 00% are good. Particularly, since silicone rubber has both chemical resistance and weather resistance, it is suitable as the seal member 11 exposed to an acidic or alkaline chemical such as polishing or grinding.

【0022】また、吸着面9より頭出させるシール部材
11の頭出量tは、シール部材11の材質にもよるが、
0.1〜0.5mm程度が良好で、特に0.1〜0.2
mmの範囲が好適である。
The amount t of protrusion of the seal member 11 to be protruded from the suction surface 9 depends on the material of the seal member 11.
0.1 to 0.5 mm is good, especially 0.1 to 0.2 mm
A range of mm is preferred.

【0023】シール部材11の頭出量tが0.1mm未
満では、被加工物Wとの密着力が小さいために気密性が
不十分であり、外部より空気が漏れたり、異物を吸い込
んでしまうからであり、逆にシール部材11の頭出量t
が0.5mmより大きいと、吸引固定時にシール部材1
1の先端を環状溝10内に完全に収納することができ
ず、被吸着物Wの周縁を持ち上げてしまうために被吸着
物Wを精度良く吸引固定することができないからであ
る。
If the protrusion amount t of the seal member 11 is less than 0.1 mm, the airtightness is insufficient due to a small adhesive force with the workpiece W, so that air leaks from the outside or foreign substances are sucked. And conversely, the protrusion amount t of the sealing member 11
Is larger than 0.5 mm, the seal
This is because the tip of the object 1 cannot be completely housed in the annular groove 10 and the peripheral edge of the object W is lifted, so that the object W cannot be accurately suction-fixed.

【0024】ところで、上記シール部材11を形成する
方法としては、枠状をしたシール部材11の成型品を環
状溝10に接着するか、あるいは環状溝10にシール部
材11のペーストを充填、硬化させることにより枠状を
したシール部材11を形成すれば良い。
As a method of forming the seal member 11, a molded product of the frame-shaped seal member 11 is bonded to the annular groove 10, or the annular groove 10 is filled with a paste of the seal member 11 and cured. Thus, the frame-shaped seal member 11 may be formed.

【0025】一方、吸引板2を構成する多孔質セラミッ
クスとしては、平均空孔径が10〜50μmでかつ空孔
率が30〜50%の範囲にあるものが良い。
On the other hand, the porous ceramic constituting the suction plate 2 preferably has an average pore diameter of 10 to 50 μm and a porosity of 30 to 50%.

【0026】これは平均空孔径が10μm未満であった
り、空孔率が30%未満であると、多孔質セラミックス
内を流れる空気の通気抵抗が大きくなり過ぎるために、
真空ポンプの吸引力を大きくしても十分な吸引力が得ら
れないからである。
If the average pore diameter is less than 10 μm or the porosity is less than 30%, the airflow resistance of the air flowing through the porous ceramics becomes too large.
This is because a sufficient suction force cannot be obtained even if the suction force of the vacuum pump is increased.

【0027】また、平均空孔径が50μmより大きかっ
たり、空孔率が50%より大きくなると、吸引板2の上
面が凹凸面となるために被加工物Wを精度良く固定でき
なくなるからである。なお、好ましくは平均空孔径が1
5〜25μmでかつ空孔率が35〜45%の範囲にある
ものが良い。
If the average pore diameter is larger than 50 μm or the porosity is larger than 50%, the workpiece W cannot be fixed with high accuracy because the upper surface of the suction plate 2 becomes uneven. Preferably, the average pore diameter is 1
Those having a diameter of 5 to 25 μm and a porosity in the range of 35 to 45% are preferred.

【0028】このような吸引板2を構成するセラミック
スとしては、アルミナセラミックス、炭化珪素質セラミ
ックス、アルミナ−炭化チタン系セラミックス、アルミ
ナ−ジルコニア系セラミックスを用いることができる。
これらのセラミックスは多孔質体であるもののビッカー
ス硬度が900kg/mm2 以上、曲げ強度が15kg
/mm2 以上と、十分な機械的特性を有するとともに、
高精度に加工することができ、さらには酸性やアルカリ
性等の薬液に対して優れた耐薬品性を有することから、
真空吸着盤1を構成する材質として好適に用いることが
できる。ただし、吸引板2を構成するセラミックスとし
ては前述したセラミックス材料だけに限定するものでは
なく、ビッカース硬度900kg/mm2 以上、曲げ強
度15kg/mm2 以上を有するセラミックスであれば
構わない。
As ceramics constituting such a suction plate 2, alumina ceramics, silicon carbide ceramics, alumina-titanium carbide ceramics, and alumina-zirconia ceramics can be used.
These ceramics are porous, but have a Vickers hardness of 900 kg / mm 2 or more and a bending strength of 15 kg.
/ Mm 2 or more, with sufficient mechanical properties,
Since it can be processed with high precision and has excellent chemical resistance to chemicals such as acidic and alkaline,
It can be suitably used as a material constituting the vacuum suction disk 1. However, the ceramic constituting the suction plate 2 is not limited to the above-mentioned ceramic material, but may be any ceramic having a Vickers hardness of 900 kg / mm 2 or more and a bending strength of 15 kg / mm 2 or more.

【0029】また、枠体4を構成する材質としては、ス
テンレス等の金属や前記吸引板2を構成する緻密質のア
ルミナセラミックス、炭化珪素質セラミックス、アルミ
ナ−炭化チタン系セラミックス、アルミナ−ジルコニア
系セラミックス等を用いることができる。特に、枠体4
を吸引板2と同種の緻密なセラミックスにより形成する
ことで、両者の熱膨張係数を近似させることができるた
め、ガラス接着時において精度良く製作することができ
る。
The frame 4 may be made of a metal such as stainless steel, a dense alumina ceramic, a silicon carbide ceramic, an alumina-titanium carbide ceramic, an alumina-zirconia ceramic which constitutes the suction plate 2. Etc. can be used. In particular, frame 4
Is formed of the same kind of dense ceramics as the suction plate 2, the thermal expansion coefficients of both can be approximated, so that they can be manufactured with high precision at the time of glass bonding.

【0030】また、吸着面9はその面状態が加工後の被
加工物Wの精度に影響を与えることからできるだけ平坦
化する必要があり、少なくとも平坦度1μm以下、好ま
しくは平坦度0.3μm以下とすることが良い。
The surface of the suction surface 9 must be flattened as much as possible because the surface condition affects the accuracy of the workpiece W after processing, and the flatness must be at least 1 μm or less, preferably 0.3 μm or less. Is good.

【0031】次に、本発明の真空吸着盤1の他の例を説
明する。
Next, another example of the vacuum suction disk 1 of the present invention will be described.

【0032】図3(a)(b)は吸引板12が、多数の
貫通微少孔を吸引孔13として穿設した緻密質セラミッ
クスからなる以外は図1(a)(b)と同様の構造をし
たもので、図3(a)(b)に示す真空吸着盤1におい
ても図1(a)(b)の真空吸着盤1と同様の効果を奏
することができる。
FIGS. 3 (a) and 3 (b) show a structure similar to that of FIGS. 1 (a) and 1 (b) except that the suction plate 12 is made of a dense ceramic in which a large number of small through holes are formed as suction holes 13. Thus, the vacuum suction disk 1 shown in FIGS. 3A and 3B can provide the same effect as the vacuum suction disk 1 shown in FIGS. 1A and 1B.

【0033】なお、吸引孔13の穴径が0.05mm未
満となると空気抵抗が大きくなり過ぎ、真空ポンプによ
る吸引力を大きくしても十分な吸引力が得られず、また
これ以上小さな微小孔を硬質のセラミックスに穿設する
ことは難しく、逆に吸引孔13の穴径が0.3mmより
大きくなると、被加工物Wがシリコンウエハのように薄
肉基板である場合、吸引孔13に位置する部分が窪んで
平坦度が低下し、被加工物Wの加工精度に悪影響を与え
る恐れがある。
If the hole diameter of the suction hole 13 is less than 0.05 mm, the air resistance becomes too large, and even if the suction force by the vacuum pump is increased, a sufficient suction force cannot be obtained. It is difficult to form a hole in a hard ceramic. Conversely, if the hole diameter of the suction hole 13 is larger than 0.3 mm, the workpiece W is located in the suction hole 13 when the workpiece W is a thin substrate such as a silicon wafer. There is a possibility that the flatness is reduced due to the depression of the portion, and the processing accuracy of the workpiece W is adversely affected.

【0034】その為、吸引孔13が貫通微小孔からなる
タイプの真空吸着盤1において、吸引孔13の穴径は、
0.05〜0.3mmの範囲で穿設することが良い。
For this reason, in the vacuum suction disk 1 of the type in which the suction holes 13 are composed of small through holes, the diameter of the suction holes 13 is
It is preferable to pierce in the range of 0.05 to 0.3 mm.

【0035】以上、本発明の実施形態では2種類の真空
吸着盤1について示したが、本発明はこれらの構造だけ
に限定されるものではなく、吸着面に被加工物の外形よ
り僅かに小さな環状溝10を凹設するとともに、該環状
溝10に弾性体からなる枠状のシール部材11を上記吸
着面9より頭ささせた状態で配設してあり、被加工物W
の吸着固定時には被加工物Wの平坦精度を悪化させるこ
となく、空気の漏れや異物の吸い込みを防ぎ、吸引孔の
目詰まりを生じさせることが殆どない構造であれば良
い。
As described above, in the embodiment of the present invention, two types of vacuum suction disks 1 have been described. However, the present invention is not limited to these structures, and the suction surface is slightly smaller than the outer shape of the workpiece. An annular groove 10 is recessed, and a frame-like sealing member 11 made of an elastic material is disposed in the annular groove 10 so as to be headed from the suction surface 9.
At the time of the suction fixing, any structure may be used as long as it does not deteriorate the flatness of the workpiece W, prevents air leakage and suction of foreign matter, and hardly causes clogging of the suction hole.

【0036】また、吸引板2の形状としては円形だけに
限らず、被加工物Wの外形状に合わせて楕円、あるいは
三角形や四角形などさまざまな形状とすることができ
る。
The shape of the suction plate 2 is not limited to a circle, but may be various shapes such as an ellipse, a triangle, or a square according to the outer shape of the workpiece W.

【0037】さらに、環状溝10とシール部材11にお
いても図2では枠体4の隔壁6に段部7を設け、枠体4
の凹部5に接合された吸引板2とで環状溝10を構成
し、該環状溝10内にシール部材11を配設した構造を
示したが、例えば、図4(a)に示すように、シール部
材11の厚みを薄くして段部7との間に隙間Sを設け、
シール部材11の先端が弾性変形した時には上記隙間S
に収納するようにしたものや図4(b)に示すように段
部7をテーパ状とし、シール部材11を吸引板2の側面
に貼り付け、シール部材11の先端が弾性変形した時に
は隔壁6のテーパ部に収納されるようにしたものであっ
ても構わない。
Further, in the annular groove 10 and the sealing member 11, a step 7 is provided in the partition 6 of the frame 4 in FIG.
An annular groove 10 is constituted by the suction plate 2 joined to the concave portion 5 of FIG. 1 and a seal member 11 is disposed in the annular groove 10. For example, as shown in FIG. The thickness of the seal member 11 is reduced to provide a gap S between the seal member 11 and the stepped portion 7,
When the tip of the seal member 11 is elastically deformed, the gap S
As shown in FIG. 4B, the stepped portion 7 is tapered, and the seal member 11 is attached to the side surface of the suction plate 2, and when the tip of the seal member 11 is elastically deformed, the partition wall 6 is formed. May be accommodated in the tapered portion.

【0038】また、環状溝10を形成する段部7は、図
4(c)(d)に示すように吸引板2の外周面に形成
し、かつ吸引板2の外周面に沿ってシール部材11を立
設させても良く、さらには図4(e)に示すように枠体
4の隔壁6と吸引板2にかかる環状溝10を形成し、吸
引板2の外周面に沿ってシール部材11を立設させたも
のであっても構わない。
The step 7 forming the annular groove 10 is formed on the outer peripheral surface of the suction plate 2 as shown in FIGS. 4C and 4D, and the sealing member is formed along the outer peripheral surface of the suction plate 2. 4 (e), an annular groove 10 formed on the partition 6 of the frame 4 and the suction plate 2 is formed, and a sealing member is formed along the outer peripheral surface of the suction plate 2 as shown in FIG. 11 may be erected.

【0039】(実施例)本発明品として図1の真空吸着
盤1を、従来品として図6の真空吸着盤31をそれぞれ
用意し、被加工物Wとして6インチのシリコンウエハに
ポリッング加工を施す作業を繰り返した時の耐久性につ
いて調べる実験を行った。
(Embodiment) The vacuum suction disk 1 of FIG. 1 is prepared as a product of the present invention, and the vacuum suction disk 31 of FIG. 6 is prepared as a conventional product, and a 6-inch silicon wafer as a workpiece W is polished. An experiment was conducted to examine the durability when the work was repeated.

【0040】本実験では、いずれの真空吸着盤1,31
も吸引板2,32の寸法を外径が約148mm、厚みが
15mmの円盤状とし、アルミナ純度が99.5%、平
均空孔径が14μm、空孔率が35%のアルミナセラミ
ックスにより形成するとともに、吸着面9,36の平坦
度を0.5μmとした。
In this experiment, all the vacuum suction disks 1 and 31
Each of the suction plates 2 and 32 is made of an alumina ceramic having an outer diameter of about 148 mm, a thickness of 15 mm, a disc shape, an alumina purity of 99.5%, an average pore diameter of 14 μm, and a porosity of 35%. The flatness of the suction surfaces 9, 36 was 0.5 μm.

【0041】また、本発明の真空吸着盤1においては、
シール部材11にシリコーンゴムを使用し、シール部材
11の頭出量tを0.1mmとした。
In the vacuum suction cup 1 of the present invention,
Silicone rubber was used for the seal member 11, and the protrusion amount t of the seal member 11 was 0.1 mm.

【0042】そして、本発明品と従来品の真空吸着盤
1,31により6インチのシリコンウエハを吸引固定
し、粒径が0.5μm程度のSiO2 砥粒を含む研磨液
を供給しながらポリッシング加工を1日200枚につい
て処理する作業を繰り返した時に加工後のシリコンウエ
ハの平坦度が0.1μm以上となるまでの稼働日数を比
較したところ、従来品は10日間程度で吸着力の低下に
よる平坦度の劣化が見られた。そこで、吸着面36を電
子顕微鏡で観察したところ、吸引孔33が完全に目詰ま
りを起こしていた。
Then, a 6-inch silicon wafer is suction-fixed by the vacuum suction disks 1 and 31 of the present invention and the conventional product, and is polished while supplying a polishing liquid containing SiO 2 abrasive grains having a particle diameter of about 0.5 μm. Comparison of the number of operating days until the flatness of the processed silicon wafer becomes 0.1 μm or more when the processing of processing 200 wafers per day was repeated was performed. Deterioration of flatness was observed. Then, when the adsorption surface 36 was observed with an electron microscope, the suction holes 33 were completely clogged.

【0043】これに対し、本発明品はシール部材11に
より砥粒や研磨粉等の異物の吸い込みが殆どないため、
3か月後でも吸引力の低下は見られず、さらに作業を続
けることが可能であった。
On the other hand, in the product of the present invention, foreign matters such as abrasive grains and abrasive powder are hardly sucked by the seal member 11,
Even after three months, the suction power did not decrease, and the work could be continued.

【0044】[0044]

【発明の効果】以上のように、本発明の真空吸着盤によ
れば、被加工物を吸引固定するための吸引孔を備えた吸
着面に、上記被加工物の外形より小さくかつその外形に
沿った環状溝を凹設するとともに、該環状溝に弾性体か
らなる枠状のシール部材を前記吸着面より頭出させた状
態で配設して真空吸着盤を構成したことから、上記吸着
面に被加工物を載置して吸引孔より真空吸引すれば、上
記吸着面より頭出するシール部材の先端を弾性変形させ
て環状溝内に収納することができるため、被加工物を吸
着面の平坦精度に精度良く吸着固定することができる。
しかも、上記シール部材は被加工物の面粗度の影響を受
けることなく密着させることができるため、空気の漏れ
を防いで被加工物の全面を均一な吸引力でもって吸着固
定することができるとともに、外部から異物が吸引孔に
吸い込まれることを防ぎ、吸引孔の目詰まりを防止する
ことができる。
As described above, according to the vacuum suction disk of the present invention, the suction surface provided with the suction hole for sucking and fixing the workpiece is smaller than the outer shape of the workpiece and has an outer shape smaller than that of the workpiece. The vacuum suction plate is formed by arranging an annular groove along the groove and arranging a frame-shaped sealing member made of an elastic body in the annular groove so as to protrude from the suction surface. If the workpiece is placed on the suction hole and vacuum suction is performed through the suction hole, the tip of the sealing member that protrudes from the suction surface can be elastically deformed and stored in the annular groove. Can be fixed by suction with high flatness accuracy.
In addition, since the seal member can be closely attached without being affected by the surface roughness of the workpiece, air leakage can be prevented and the entire surface of the workpiece can be suction-fixed with a uniform suction force. At the same time, it is possible to prevent foreign matter from being sucked into the suction hole from the outside, and to prevent clogging of the suction hole.

【0045】その為 本発明の真空吸着盤を研磨、研
削、切削等の加工に用いれば、これらの作業を繰り返し
たとしても吸引孔に砥粒や摩耗粉あるいはゴミ等が堆積
することがないため吸引孔の目詰まりを防ぐことができ
ることから、メンテナンス回数を大幅に低減できるう
え、長寿命の真空吸着盤とすることができ、長期間にわ
たって被加工物を高精度に加工することが可能となる。
Therefore, if the vacuum suction disk of the present invention is used for polishing, grinding, cutting, or the like, no abrasive particles, wear powder, dust, or the like will be deposited on the suction holes even if these operations are repeated. Since the clogging of the suction holes can be prevented, the number of maintenance operations can be greatly reduced, and a long-life vacuum suction disk can be formed, so that the workpiece can be processed with high precision over a long period of time. .

【0046】しかも、真空引きしていない時には、被加
工物の周縁ををシール部材によって支持することができ
るため、吸着面との接触面積を小さくでき、吸着面がセ
ラミックスのような硬質材料からなる場合であっても、
被加工物を吸着面へ載置したり吸着面から離脱させる際
の摺動によって被加工物を傷付けることがない。
In addition, when the vacuum is not applied, the periphery of the workpiece can be supported by the sealing member, so that the contact area with the suction surface can be reduced, and the suction surface is made of a hard material such as ceramics. Even if
The workpiece is not damaged by sliding when the workpiece is placed on the suction surface or detached from the suction surface.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)は本発明の真空吸着盤の一例を示す斜視
図、(b)は(a)のX−X線断面図である。
FIG. 1A is a perspective view showing an example of a vacuum suction disk of the present invention, and FIG. 1B is a sectional view taken along line XX of FIG.

【図2】(a)は図1(b)の主要なA部を示す拡大図
であり、(b),(c)は被加工物を吸引固定する際の
シール部材の動きを説明するための状態図である。
2A is an enlarged view showing a main part A in FIG. 1B, and FIGS. 2B and 2C are views for explaining the movement of a seal member when a workpiece is suction-fixed; FIG.

【図3】(a)は本発明の真空吸着盤の他の例を示す斜
視図、(b)は(a)のY−Y線断面図である。
FIG. 3A is a perspective view showing another example of the vacuum suction disk of the present invention, and FIG. 3B is a sectional view taken along line YY of FIG.

【図4】(a)〜(e)はさまざまな形状の環状溝とシ
ール部材を示す図である。
4 (a) to 4 (e) are views showing annular grooves and seal members of various shapes.

【図5】従来の真空吸着盤を示す斜視図、(b)は
(a)のP−P線断面図である。
FIG. 5 is a perspective view showing a conventional vacuum suction disk, and FIG. 5B is a cross-sectional view taken along the line PP of FIG.

【図6】従来の真空吸着盤を示す斜視図、(b)は
(a)のQ−Q線断面図である。
FIG. 6 is a perspective view showing a conventional vacuum suction disk, and (b) is a cross-sectional view taken along line QQ of (a).

【符号の説明】[Explanation of symbols]

1,21,31 ・・・真空吸着盤 2,12,22,32・・・吸引板 3,13,23,33・・・吸引孔 4,24,34 ・・・枠体 5,25,35 ・・・枠体の凹部 6 ・・・隔壁 7 ・・・切欠 8 ・・・フランジ部 9 ・・・吸着面 10 ・・・環状溝 11 ・・・シール部材 W ・・・被加工物 1,21,31 Vacuum suction plate 2,12,22,32 Suction plate 3,13,23,33 Suction hole 4,24,34 Frame 5,25,35・ ・ ・ Recess 6 of the frame 6 ・ ・ ・ Partition 7 ・ ・ ・ Notch 8 ・ ・ ・ Flange 9 ・ ・ ・ Suction surface 10 ・ ・ ・ Circular groove 11 ・ ・ ・ Seal member W ・ ・ ・ Workpiece

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】被加工物を吸引固定するための吸引孔を備
えた吸着面に、上記被加工物の外形より小さくかつその
外形に沿った環状溝を凹設するとともに、該環状溝に弾
性体からなる枠状のシール部材を前記吸着面より頭出さ
れた状態で配設したことを特徴とする真空吸着盤。
An annular groove smaller than the outer shape of the workpiece and formed along the outer shape of the workpiece is recessed in a suction surface provided with a suction hole for sucking and fixing the workpiece. A vacuum suction disk, wherein a frame-shaped sealing member made of a body is disposed so as to protrude from the suction surface.
JP10118946A 1998-04-28 1998-04-28 Vacuum suction pad Pending JPH11309638A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10118946A JPH11309638A (en) 1998-04-28 1998-04-28 Vacuum suction pad

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10118946A JPH11309638A (en) 1998-04-28 1998-04-28 Vacuum suction pad

Publications (1)

Publication Number Publication Date
JPH11309638A true JPH11309638A (en) 1999-11-09

Family

ID=14749172

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10118946A Pending JPH11309638A (en) 1998-04-28 1998-04-28 Vacuum suction pad

Country Status (1)

Country Link
JP (1) JPH11309638A (en)

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JP2017123400A (en) * 2016-01-07 2017-07-13 株式会社ディスコ Chuck table
CN109236840A (en) * 2018-11-06 2019-01-18 深圳市诺峰光电设备有限公司 A kind of detachable suction film head of magnetic
WO2019181652A1 (en) * 2018-03-23 2019-09-26 株式会社ナノテム Porous pad, vacuum chuck device, and plane forming method for porous pad
CN110315815A (en) * 2018-03-29 2019-10-11 中国砂轮企业股份有限公司 Porous ceramic plate, preparation method and its application
JP2020078832A (en) * 2018-11-12 2020-05-28 株式会社ディスコ Porous chuck table and manufacturing method of porous chuck table

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JP2016072350A (en) * 2014-09-29 2016-05-09 京セラ株式会社 Member for adsorption
CN105299023A (en) * 2015-12-10 2016-02-03 北京中电科电子装备有限公司 Vacuum ceramic suction disc
CN105299023B (en) * 2015-12-10 2017-09-29 北京中电科电子装备有限公司 A kind of vacuum ceramic sucker
JP2017123400A (en) * 2016-01-07 2017-07-13 株式会社ディスコ Chuck table
WO2019181652A1 (en) * 2018-03-23 2019-09-26 株式会社ナノテム Porous pad, vacuum chuck device, and plane forming method for porous pad
JPWO2019181652A1 (en) * 2018-03-23 2021-02-18 株式会社ナノテム Porous pad, vacuum chuck device and method for forming a plane of the porous pad
CN110315815A (en) * 2018-03-29 2019-10-11 中国砂轮企业股份有限公司 Porous ceramic plate, preparation method and its application
CN110315815B (en) * 2018-03-29 2021-09-28 中国砂轮企业股份有限公司 Porous ceramic plate, preparation method and application thereof
CN109236840A (en) * 2018-11-06 2019-01-18 深圳市诺峰光电设备有限公司 A kind of detachable suction film head of magnetic
JP2020078832A (en) * 2018-11-12 2020-05-28 株式会社ディスコ Porous chuck table and manufacturing method of porous chuck table

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