JP2005074551A - Vacuum suction device - Google Patents

Vacuum suction device Download PDF

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JP2005074551A
JP2005074551A JP2003306706A JP2003306706A JP2005074551A JP 2005074551 A JP2005074551 A JP 2005074551A JP 2003306706 A JP2003306706 A JP 2003306706A JP 2003306706 A JP2003306706 A JP 2003306706A JP 2005074551 A JP2005074551 A JP 2005074551A
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vacuum suction
vacuum
sample
protrusions
protrusion
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JP3817613B2 (en
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Atsunobu Une
篤暢 宇根
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Japan Steel Works Ltd
Technical Research and Development Institute of Japan Defence Agency
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Japan Steel Works Ltd
Technical Research and Development Institute of Japan Defence Agency
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a vacuum suction apparatus having a vacuum suction part comprising a large number of micro protrusions of extremely low height, positively sucking a sample in spite of supporting only with protrusions, correcting the sample into a plane without being influenced by dust or the like, prevented from chipping off all the protrusions and hardly causing the breakage of the protrusions. <P>SOLUTION: In this vacuum suction device, the vacuum suction part 1 communicating with a vacuum exhaust hole 3 is formed of a porous ceramics material having a maximum pore diameter not larger than 1/2 of the diameter of the protrusions, and the upper face is provided with the large number of micro protrusions 2. The height of the protrusions 2 is set to the extremely low height of about several μm to form a micro clearance 12 between the vacuum suction part 1 and the sample 10, and the pores existing in the outer peripheral part of the vacuum suction part are sealed with a fine material up to a region 21 slightly inward from the outer diameter of the sample. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、LSI製造装置における、パターン転写装置、描画装置、各種プロセス製造装置、検査測長装置、および研削、研磨、切断などの加工装置の試料保持装置と試料搬送装置に用いられる真空吸着装置に関し、特にその真空吸着器に関するものである。   The present invention relates to a pattern transfer device, a drawing device, various process manufacturing devices, an inspection length measuring device, and a vacuum suction device used for a sample holding device and a sample transport device of a processing device such as grinding, polishing, and cutting in an LSI manufacturing device. In particular, the vacuum adsorber.

従来、加工に用いられている一般的な真空吸着装置は、図9(a),(b)に示すようなポーラス型真空吸着器14を備えている。装置は、数10〜40%の気孔率を有する多孔質セラミックスからなる真空吸着部1と、その外側に配設された平面状のランド部11をもつ緻密なセラミックスからなる基部5と、真空排気を行う真空排気孔3と、真空吸着部1の下面に設けられ、中心から放射状に延びた真空排気溝4、および外周側に環状に配置された真空排気溝4’から構成される。前記真空排気溝4、4’は真空排気孔3に接続され、さらにその先は真空ポンプ(図示せず)に連結される。真空吸着部1とランド部11は、同一平面上に高精度に仕上げ加工されている。   Conventionally, a general vacuum suction device used for processing includes a porous vacuum suction device 14 as shown in FIGS. 9 (a) and 9 (b). The apparatus includes a vacuum adsorbing portion 1 made of porous ceramics having a porosity of several tens to 40%, a base portion 5 made of dense ceramics having a planar land portion 11 disposed outside thereof, and vacuum exhaust. Evacuation holes 3 for performing the above, vacuum evacuation grooves 4 provided on the lower surface of the vacuum suction portion 1 and extending radially from the center, and evacuation grooves 4 ′ arranged annularly on the outer peripheral side. The evacuation grooves 4 and 4 'are connected to the evacuation hole 3 and further connected to a vacuum pump (not shown). The vacuum suction portion 1 and the land portion 11 are finished with high precision on the same plane.

この真空吸着装置の上面に、シリコンウエハなどの試料10を載置した後、真空ポンプを作動させると、真空排気溝4、4’を通って、真空排気孔3から矢印で示すように空気が排出され、真空吸着部1と試料10の間は真空となり、大気圧によって試料10は真空吸着部1上に押さえつけられる。したがって、試料10は真空吸着部1の高精度な平面に倣い、試料の反りや曲がりが矯正される。   When a vacuum pump is operated after placing a sample 10 such as a silicon wafer on the upper surface of the vacuum suction device, air passes through the vacuum exhaust grooves 4 and 4 ′ as shown by arrows from the vacuum exhaust holes 3. The vacuum suction unit 1 and the sample 10 are evacuated, and the sample 10 is pressed onto the vacuum suction unit 1 by the atmospheric pressure. Therefore, the sample 10 follows the high-precision plane of the vacuum suction unit 1 and the warping and bending of the sample are corrected.

一方、LSI製造において用いられる、下記特許文献1又は2に記載の真空吸着装置は、図10(a),(b)又は図11(a),(b)に示すような真空吸着器14を備えている。   On the other hand, the vacuum suction apparatus described in the following Patent Document 1 or 2 used in LSI manufacturing has a vacuum suction device 14 as shown in FIGS. 10 (a) and 10 (b) or FIGS. 11 (a) and 11 (b). I have.

この従来の真空吸着器14の上面には、多数の微小な突起2を一体に有する前述した多孔質セラミックスからなる真空吸着部1と、環状の突部によって形成され真空吸着部1を取り囲むランド部11が設けられている。また、上記真空吸着部1の下面には中心から放射状に延びる真空排気溝4と、外周側に環状に配置された真空排気溝4’が設けられ、中心部で真空排気孔3に接続される。   On the upper surface of the conventional vacuum suction device 14, the vacuum suction portion 1 made of the aforementioned porous ceramics integrally having a large number of minute protrusions 2, and a land portion that is formed by an annular projection and surrounds the vacuum suction portion 1. 11 is provided. Further, a vacuum exhaust groove 4 extending radially from the center and a vacuum exhaust groove 4 ′ arranged annularly on the outer peripheral side are provided on the lower surface of the vacuum suction portion 1 and connected to the vacuum exhaust hole 3 at the center. .

このような真空吸着器14において、真空吸着器14の上面にシリコンウエハ等の試料10を載置した後、真空ポンプ(図示せず)を作動させて試料10の下部の空気を真空排気孔3から排気すると、真空吸着部1が負圧となり、突起2の間の微小隙間12は真空となるので、試料10は突起2およびランド部11(図11(a),(b)では図示せず)上に吸着される。ランド部11の上面は突起2の上面と同一平面を形成し、試料10の裏面外周縁部が密接されることで、真空吸着部1を真空封止する。試料10は、真空吸着されることで突起2およびランド部11の上面に倣い、反りや曲がりが矯正される。
特開平10−128633号公報 特公昭62−45696号公報
In such a vacuum suction device 14, after a sample 10 such as a silicon wafer is placed on the upper surface of the vacuum suction device 14, a vacuum pump (not shown) is operated so that the air below the sample 10 is evacuated to the vacuum exhaust hole 3. Since the vacuum suction part 1 becomes a negative pressure and the minute gap 12 between the protrusions 2 becomes a vacuum when the air is exhausted from, the sample 10 is not shown in the protrusions 2 and the land parts 11 (FIGS. 11A and 11B). ) Adsorbed on top. The upper surface of the land portion 11 forms the same plane as the upper surface of the protrusion 2, and the vacuum outer periphery portion of the sample 10 is in close contact with each other, whereby the vacuum suction portion 1 is vacuum-sealed. When the sample 10 is vacuum-sucked, the sample 10 follows the protrusion 2 and the upper surface of the land portion 11, and the warpage and the bending are corrected.
JP-A-10-128633 Japanese Examined Patent Publication No. 62-45696

上記した図9(a),(b)に示す従来のポーラス型真空吸着器14は、上述したように数10〜40%の気孔率のため試料10の裏面との接触率が大きく、したがって、真空吸着部1上にダストが付着する確率が高く、付着した場合には除去しにくく、試料の平坦度を劣化させるという欠点があった。   The conventional porous vacuum adsorber 14 shown in FIGS. 9A and 9B has a high contact rate with the back surface of the sample 10 due to the porosity of several tens to 40% as described above. There is a high probability of dust adhering to the vacuum suction part 1, and it is difficult to remove the dust when adhering, and the flatness of the sample is deteriorated.

一方、上記した図10(a),(b)又は図11(a),(b)に示す、真空吸着部1に突起2を一体に形成した真空吸着装置の真空吸着器14にあっては、真空排気によって試料10を真空吸着部1の突起2とランド部11(図11(a),(b)では図示せず)の上面に吸着することにより、試料10の反りや変形を矯正し平面にすることができる。また、突起2により真空吸着部1と試料10との接触面積を極めて小さくすることができるので、ダスト等による平面度の低下はほとんど生じない。しかし、完全な真空封止を狙ってランド部11を設けているため、このランド部11上にダスト等が付着する可能性が高く、ポーラス型チャックと同様に試料10の外周部を高精度な平面に矯正できないという問題があった。   On the other hand, in the vacuum suction device 14 of the vacuum suction device shown in FIG. 10 (a), (b) or FIG. 11 (a), (b), in which the protrusion 2 is integrally formed on the vacuum suction portion 1, The sample 10 is adsorbed on the upper surface of the protrusion 2 and the land 11 (not shown in FIGS. 11 (a) and 11 (b)) of the vacuum suction unit 1 by evacuation, thereby correcting the warp and deformation of the sample 10. Can be flat. Further, since the contact area between the vacuum suction portion 1 and the sample 10 can be made extremely small by the protrusions 2, the flatness due to dust or the like hardly occurs. However, since the land portion 11 is provided for the purpose of complete vacuum sealing, there is a high possibility that dust or the like will adhere to the land portion 11, and the outer peripheral portion of the sample 10 is highly accurate like the porous chuck. There was a problem that it could not be corrected to a flat surface.

また、図11(a),(b)に示すように、突起2も真空吸着部1と同様の多孔質材料からなるため、その上面に形成された突起表面にも数10μmから数100μmの気孔を持つことになり、突起径より気孔径が大きい場合には突起が形成できない、あるいは形成できても欠け部が多くなり、小さな外力により折損するなどの欠点を有していた。また、突起2と外周部に設けられたランド部11では面積分布が異なるため、加工により突起2はランド部11と比較して低く加工され、平面度を劣化させるという問題を有していた。   Further, as shown in FIGS. 11A and 11B, since the protrusion 2 is also made of the same porous material as that of the vacuum suction portion 1, the surface of the protrusion formed on the upper surface thereof has pores of several tens μm to several hundreds μm. Therefore, when the pore diameter is larger than the protrusion diameter, the protrusion cannot be formed, or even if it can be formed, the number of chipped portions increases, and there is a disadvantage that it is broken by a small external force. Further, since the area distribution is different between the protrusion 2 and the land portion 11 provided on the outer peripheral portion, the protrusion 2 is processed to be lower than the land portion 11 by processing, and the flatness is deteriorated.

本発明は上記した従来の問題点に鑑みてなされたもので、その目的とするところは、突起のみによる支承であるにも拘らず試料を確実に吸着し、ダスト等の影響を受けないで試料を高い平面に矯正することができ、突起全てが欠けることはなく、突起の折損なども生じにくく、微小な多数の極めて高さの低い突起からなる真空吸着部をもつ真空吸着器を提供することにある。   The present invention has been made in view of the above-described conventional problems, and the object of the present invention is to reliably adsorb a sample despite being supported only by protrusions, and to avoid the influence of dust and the like. To provide a vacuum suction device having a vacuum suction part made up of a large number of very low-profile projections, in which all projections are not missing, and the projections are not easily broken. It is in.

上記目的を達成するため、本発明は、図1(a),(b)及び図2の第1の実施の形態に示すように、上面が同一平面上にある多数の突起2のみによって試料10を支承し、内部に真空ポンプに接続される真空排気孔3を設けた真空吸着器14を備えた真空吸着装置において、真空排気孔3に連通する真空吸着部1を、突起径の1/2以下の最大気孔径を有する多孔質セラミックス材料で作り、その上面に多数の微小突起2を設けるとともに、この突起2の高さを数μm程度の極めて低い高さに設定することにより前記真空吸着部1と前記試料10との間に微小隙間12を形成し、前記真空吸着部の外周部に存在する気孔を、試料外径よりわずかに内側(望ましくは0.5mm〜1mm程度)の領域21まで、緻密な材料で封止したことを特徴としている。   In order to achieve the above object, the present invention provides a sample 10 that includes only a large number of protrusions 2 whose upper surfaces are on the same plane as shown in the first embodiment of FIGS. 1 (a), 1 (b) and FIG. In the vacuum suction apparatus having the vacuum suction device 14 provided with the vacuum exhaust hole 3 connected to the vacuum pump inside, the vacuum suction portion 1 communicating with the vacuum exhaust hole 3 is set to 1/2 of the projection diameter. The vacuum suction portion is made of a porous ceramic material having the following maximum pore diameter, provided with a large number of fine protrusions 2 on the upper surface thereof, and the height of the protrusions 2 is set to a very low height of about several μm. 1 and the sample 10, a minute gap 12 is formed, and the pores existing in the outer peripheral portion of the vacuum suction portion are slightly inside the sample outer diameter (preferably about 0.5 mm to 1 mm) to the region 21. Specially sealed with a dense material It is set to.

図3(a),(b)及び図4の第2の実施の形態に示すように、上面が同一平面上にある多数の突起2のみによって試料10を支承し、内部に真空ポンプに接続される真空排気孔3を設けた真空吸着器14を備えた真空吸着装置において、真空排気孔3に連通する真空吸着部1を、突起径の1/2以下の最大気孔径を有する多孔質セラミックス材料で作り、その上面に高さが突起径の1/2以下の多数の突起を設けるとともに、この真空吸着部を取り囲む環状のシール部24を設け、このシール部24をより加工し易いガラス、金属、無機又は有機材料などの緻密な材料で形成し、且つ、前記突起より数μm程度低く設定することによって、前記突起と試料との間にきわめて微少な隙間を形成し、さらに前記真空吸着部の外周部に存在する気孔を試料外径よりわずかに内側(望ましくは0.5mm〜1mm程度)の領域21まで、緻密な材料で封止したことを特徴としている。   As shown in the second embodiment of FIGS. 3 (a), 3 (b) and 4, the sample 10 is supported only by a large number of protrusions 2 whose upper surfaces are on the same plane and connected to a vacuum pump inside. In the vacuum suction apparatus provided with the vacuum suction device 14 provided with the vacuum exhaust hole 3, the vacuum suction part 1 communicating with the vacuum exhaust hole 3 is made of a porous ceramic material having a maximum pore diameter of 1/2 or less of the projection diameter. Glass, metal that is easier to work with, and is provided with an annular seal part 24 surrounding the vacuum suction part. In addition, by forming a dense material such as an inorganic or organic material and setting it to be about several μm lower than the protrusion, a very small gap is formed between the protrusion and the sample. Existing in the outer periphery Up area 21 slightly inside the specimen-diameter (preferably about 0.5 mm to 1 mm), it is characterized in that sealed with the dense material.

図5(a),(b)の第3の実施の形態に示すように、上面が同一平面上にある多数の突起2のみによって試料10を支承し、内部に真空ポンプに接続される真空排気孔3を設けた真空吸着器14を備えた真空吸着装置において、真空排気孔3に連通する真空吸着部1を多孔質材料で作り、その上面に、真空吸着部1より緻密な材料からなる多数の微小突起2を固着して設けるとともに、この突起2の高さを数μm程度の極めて低い高さに設定することにより前記真空吸着部1と前記試料10との間に微小隙間12を形成し、前記真空吸着部の外周部に存在する気孔を、試料外径よりわずかに内側(望ましくは0.5mm〜1mm程度)の領域21まで、緻密な材料で封止したことを特徴としている。   As shown in the third embodiment of FIGS. 5A and 5B, the sample 10 is supported only by a large number of protrusions 2 whose upper surfaces are on the same plane, and the vacuum exhaust is connected to a vacuum pump inside. In a vacuum suction apparatus including a vacuum suction device 14 provided with holes 3, the vacuum suction portion 1 communicating with the vacuum exhaust hole 3 is made of a porous material, and a large number of materials made of a material denser than the vacuum suction portion 1 are formed on the upper surface thereof. The minute protrusions 2 are fixedly provided, and the height of the protrusions 2 is set to a very low height of about several μm, thereby forming a minute gap 12 between the vacuum suction portion 1 and the sample 10. The pores existing in the outer peripheral portion of the vacuum suction portion are sealed with a dense material up to a region 21 slightly inside (desirably about 0.5 mm to 1 mm) from the outer diameter of the sample.

上記真空吸着部1は、数10〜40%程度の気孔率を有する多孔質セラミックス材料からなる。また、上記突起2は、高さが数μm程度(望ましくは1μm〜5μm程度)であって、直径が数10〜数100μm程度(望ましくは10μm〜200μm程度)のガラス又は金属及び無機又は有機材料のような緻密な構造の他種材料により形成させることができる。又は、上記突起2は、上記と同様の形状の上記真空吸着部1と同質の多孔質セラミックス材料であって、最大気孔径が突起径の1/2以下で気孔率が数10〜40%程度の、上記真空吸着部1よりも気孔径が小さい多孔質セラミックス材料により形成させることができる。また、上記気孔の封止材はガラス又は金属及び無機又は有機材料のような緻密な構造の他種材料により形成させることができる。   The vacuum suction part 1 is made of a porous ceramic material having a porosity of about several tens to 40%. The protrusion 2 has a height of about several μm (desirably about 1 μm to 5 μm) and a diameter of about several tens to several hundreds of μm (desirably about 10 μm to 200 μm), glass, metal, inorganic or organic material. It can be formed of other materials with a dense structure such as Alternatively, the protrusion 2 is a porous ceramic material of the same shape as the vacuum suction portion 1 having the same shape as described above, and the maximum pore diameter is ½ or less of the protrusion diameter and the porosity is about several tens to 40%. It can be formed of a porous ceramic material having a pore diameter smaller than that of the vacuum suction portion 1. The pore sealing material can be formed of other materials having a dense structure such as glass or metal and inorganic or organic materials.

さらに、上記目的を達成するため、本発明は、図6(a),(b)の第4の実施の形態に示すように、上面が同一平面上にある多数の微小突起102aのみによって試料10を支承し、内部に真空ポンプ7に接続される真空排気孔3を設けた真空吸着器14を備えた真空吸着装置において、
真空排気孔3に連通する真空吸着部1を多孔質材料で作り、その上面に、真空吸着部1より気孔径の小さい多孔質材料からなり、薄板状の基体102bの上面に多数の微小突起102aが一体に形成された突起板102を層状に設け、この突起102aの高さを数μm程度の極めて低い高さに設定することにより前記真空吸着部1と前記試料10との間に微小隙間12を形成し、前記真空吸着部の外周部に存在する気孔を、試料外径よりわずかに内側(望ましくは0.5mm〜1mm程度)の領域21まで、緻密な材料で封止したことを特徴としている。
Furthermore, in order to achieve the above-described object, the present invention provides a sample 10 by using only a large number of microprotrusions 102a whose upper surfaces are on the same plane as shown in the fourth embodiment in FIGS. 6 (a) and 6 (b). In a vacuum suction device provided with a vacuum suction device 14 provided with a vacuum exhaust hole 3 connected to the vacuum pump 7 inside,
The vacuum suction portion 1 communicating with the vacuum exhaust hole 3 is made of a porous material, and the upper surface thereof is made of a porous material having a pore diameter smaller than that of the vacuum suction portion 1, and a large number of minute protrusions 102a are formed on the upper surface of the thin plate-like substrate 102b. Are formed in layers, and the height of the protrusion 102a is set to a very low height of about several μm, whereby a minute gap 12 is provided between the vacuum suction portion 1 and the sample 10. And the pores existing in the outer peripheral portion of the vacuum suction portion are sealed with a dense material up to a region 21 slightly inside (preferably about 0.5 mm to 1 mm) from the outer diameter of the sample. Yes.

上記真空吸着部1は、数10〜40%程度の気孔率を有する多孔質セラミックス材料からなり、上記突起板102は、上記真空吸着部1よりも気孔径の小さい組成構造を有する多孔質セラミックス材料、すなわち突起径の1/2以下の最大気孔径で数10〜40%程度の気孔率を有する多孔質セラミックス材料から、前記真空吸着部の外周部に存在する気孔を封止する緻密な材料は、ガラス又は金属及び無機又は有機材料のような選ばれた材料からなることを特徴としている。   The vacuum suction portion 1 is made of a porous ceramic material having a porosity of about several tens to 40%, and the protruding plate 102 is a porous ceramic material having a composition structure having a pore size smaller than that of the vacuum suction portion 1. That is, a dense material that seals pores existing in the outer peripheral portion of the vacuum suction portion from a porous ceramic material having a porosity of about several tens to 40% with a maximum pore diameter of 1/2 or less of the projection diameter is It is characterized by being made of selected materials such as glass or metal and inorganic or organic materials.

さらに、本発明は、図7(a),(b)、図8(a),(b)の第5、6の実施の形態に示すように、上面が同一平面上にある多数の微小突起2のみによって試料10を支承し、内部に真空ポンプ7に接続される真空排気孔3を設けた真空吸着器14を備えた真空吸着装置において、
上記真空吸着部1の中心付近に、真空吸着部1に吸着する試料10を持ち上げるリフト機構を通す穴15、もしくは周辺部に切り欠き16を設け、その穴もしくは切り欠きの周辺23(望ましくは、穴もしくは切り欠き外周端からから0.5mm〜1mm程度)、及び前記真空吸着部の外周部21(望ましくは試料外径から0.5mm〜1mm程度)に存在する気孔は、ガラス、金属、無機又は有機材料などの緻密な材料で封止したことを特徴としている。
Furthermore, as shown in the fifth and sixth embodiments of FIGS. 7 (a), 7 (b), 8 (a), and 8 (b), the present invention provides a large number of microprojections whose upper surfaces are on the same plane. In a vacuum adsorption apparatus provided with a vacuum adsorber 14 that supports a sample 10 only by 2 and has a vacuum exhaust hole 3 connected to a vacuum pump 7 inside.
In the vicinity of the center of the vacuum suction part 1, a hole 15 through which a lift mechanism for lifting the sample 10 adsorbed to the vacuum suction part 1 is passed, or a notch 16 is provided in the peripheral part, and the periphery 23 of the hole or notch (preferably, The pores present in the outer periphery 21 of the vacuum suction part (preferably about 0.5 mm to 1 mm from the outer diameter of the sample) from the outer peripheral edge of the hole or notch are glass, metal, inorganic Alternatively, it is sealed with a dense material such as an organic material.

上記本発明においては、最大気孔径が突起径の1/2以下の多孔質セラミックス材料からなる真空吸着部1上に、突起2を設けることによって、もしくは多孔質材料からなる真空吸着部1上に、同種もしくは異種の、真空吸着部1より緻密なもしくは気孔径の小さい多孔質材料からなる突起2(102a)を固着して設けることによって、試料10裏面との接触面積を極めて小さくし、ダストの影響を少なくすることが可能となるので、試料10全面を容易に高精度の平面に矯正することができる。さらに、図に示すように前記真空吸着部1の外周部に存在する気孔19を、試料外径よりわずかに内側の領域21まで、緻密な材料で封止することによって、試料の外終端がわずかに面取りをされて丸くなっていても、封止された気孔19から空気がリークすることはなく、前記真空吸着部1となる封止していない気孔20をもつ領域22は高い真空度を保持することができる。 In the present invention, the protrusion 2 is provided on the vacuum suction portion 1 made of a porous ceramic material having a maximum pore diameter of ½ or less of the protrusion diameter, or on the vacuum suction portion 1 made of a porous material. By providing the protrusions 2 (102a) made of a porous material, which is the same type or different type, which is denser than the vacuum adsorbing portion 1 or has a smaller pore diameter, the contact area with the back surface of the sample 10 is extremely reduced, Since the influence can be reduced, the entire surface of the sample 10 can be easily corrected to a highly accurate plane. Further, as shown in FIG. 2 , by sealing the pores 19 existing in the outer peripheral portion of the vacuum suction portion 1 to a region 21 slightly inside the outer diameter of the sample with a dense material, the outer end of the sample can be reduced. Even if it is slightly chamfered and rounded, air does not leak from the sealed pores 19, and the region 22 having the unsealed pores 20 serving as the vacuum suction portion 1 has a high degree of vacuum. Can be held.

また、薄い試料を真空吸着するためには、突起ピッチが小さく、一定間隔であることが必要であるが、上記従来のように突起径より大きい気孔を有する多孔質材料上に一体に形成された突起では、気孔部の突起が全体もしくは1/2以上欠けることもあり、一定間隔で試料を支持することができなくなるため平面度が劣化する。本発明では、最大気孔径が突起径の1/2以下の多孔質セラミックス材料からなる真空吸着部1上に突起を形成する、もしくは真空吸着部1より緻密な若しくは気孔径の小さい多孔質材料からなる突起2(102a)を、真空吸着部1の多孔質材料上に固着させるようにして形成するので、気孔部にも突起2(102a)を形成することが可能になり、一定間隔の高さの揃った突起を形成することができる。   Further, in order to vacuum-suck a thin sample, it is necessary that the projection pitch is small and constant, but it is integrally formed on a porous material having pores larger than the projection diameter as in the conventional case. In the protrusions, the protrusions in the pores may be missing as a whole or a half or more, and the flatness deteriorates because the sample cannot be supported at regular intervals. In the present invention, protrusions are formed on the vacuum suction portion 1 made of a porous ceramic material whose maximum pore diameter is 1/2 or less of the protrusion diameter, or from a porous material that is denser or smaller in pore diameter than the vacuum suction portion 1. Since the protrusion 2 (102a) is formed so as to be fixed on the porous material of the vacuum suction portion 1, the protrusion 2 (102a) can be formed also in the pore portion, and the height of the interval is constant. Can be formed.

さらに、突起の材料も選択できるので、サンドブラスト加工に替えて、リソグラフィ技術を利用して、例えば数10μm径以下の突起を高さ数μm以下にするなど極めて小さく且つ低く形成することも可能になる。したがって、突起の間隔を小さくしてもウエハとの接触面積を増大することなく、且つ試料10と真空吸着部1との間の微小隙間を極めて小さくできる。また、前記真空吸着部1の外周部に存在する気孔を、試料外径よりわずかに内側の領域まで、緻密な材料で封止するので、気孔からの真空リークはなくなる。以上により真空リークを極限まで抑制することが可能になり、真空をシールするランド部が不要となる。   Furthermore, since the material of the projection can be selected, it is possible to form the projection with a diameter of several tens of μm or less, for example, a few tens of μm or less by using a lithography technique instead of sandblasting, and forming it extremely small and low. . Therefore, even if the interval between the protrusions is reduced, the contact area with the wafer is not increased, and the minute gap between the sample 10 and the vacuum suction portion 1 can be extremely reduced. In addition, since the pores existing in the outer peripheral portion of the vacuum suction portion 1 are sealed with a dense material up to a region slightly inside the outer diameter of the sample, there is no vacuum leak from the pores. As described above, it is possible to suppress the vacuum leak to the limit, and the land portion for sealing the vacuum becomes unnecessary.

また、図7や図8に示したように、ウエハを持ち上げるためのリフト機構を通す穴15や切り欠き16の周辺に存在する気孔を封止するだけの工程を付加するだけでよく、これらを取り囲む真空をシールするランド部を形成することなく造り上げることができるので、試料10を支承する部分を突起のみとすることができ、突起表面加工時に、工具との接触面積分布がどの部分でも等しくなるので、吸着部全面における平面度を向上することが容易になる。   Further, as shown in FIGS. 7 and 8, it is only necessary to add a process for sealing pores existing around the hole 15 and the notch 16 through which the lift mechanism for lifting the wafer is passed. Since it is possible to build up without forming a land portion that seals the surrounding vacuum, the portion for supporting the sample 10 can be only a protrusion, and the contact area distribution with the tool is equal in any portion when processing the protrusion surface. Therefore, it becomes easy to improve the flatness of the entire adsorption portion.

以上述べたように、本発明に係わる真空吸着装置においては、突起の上面と資料の裏面との接触面積が極めて小さいので、ゴミの影響を少なくすることが可能となり、試料全面を容易に高精度の平面に矯正することができる。また、突起の高さを極めて低く、かつ多孔質材料の気孔部上にも形成できるので、突起の強さを数倍も向上でき、耐久性を上げることができると同時に、極めてピッチの小さい一定間隔で並んだ突起の形成により200μmより薄い試料を変形することなく吸着することも可能になる。   As described above, in the vacuum suction apparatus according to the present invention, since the contact area between the upper surface of the protrusion and the back surface of the material is extremely small, the influence of dust can be reduced, and the entire surface of the sample can be easily and accurately Can be corrected to a flat surface. In addition, since the height of the protrusions can be extremely low and can be formed on the pores of the porous material, the strength of the protrusions can be improved several times and the durability can be increased, and at the same time, the constant pitch is extremely small. By forming protrusions arranged at intervals, it becomes possible to adsorb a sample thinner than 200 μm without deformation.

(第1の実施の形態)
図1(a),(b)は、本発明に係わる真空吸着装置の第1の実施の形態を示す平面図と正断面図である。図2は、同要部の拡大断面図である。
図に示すように、緻密なセラミックスからなる装置の基部5の上部に、数10〜40%の気孔率を有し、最大気孔径が突起径の1/2より小さい多孔質セラミックスからなる真空吸着部1がガラス剤などにより溶着される。さらに真空吸着部1の上面に、多数の円形断面をもつピン状の微小突起2が設けられ、微小突起2は真空吸着時に試料10にたわみを生じないように試料10の厚さに応じたピッチにて離散配置され、かつ接触面積を減らすためにできる限り小さく造られている。また、真空吸着部1の外周部に存在する気孔を、試料外径よりわずかに内側(望ましくは0.5mm〜1mm程度)の領域21まで、緻密な材料で封止している。
本実施例では、突起2は最大気孔径が突起径の1/2以下の多孔質セラミックス材料からなる真空吸着部1上に造られているので、最大気孔径が突起径より大きい多孔質材料からなる突起と比較して折損し難く、突起に一部欠けを発生することはあるが全体が欠けることはない。したがって、一定間隔で配置された突起を造ることができ、薄い厚さの試料10を変形なく吸着することが可能になる。
(First embodiment)
1A and 1B are a plan view and a front sectional view showing a first embodiment of a vacuum suction apparatus according to the present invention. FIG. 2 is an enlarged cross-sectional view of the main part.
As shown in the figure, vacuum adsorption made of porous ceramics having a porosity of several tens to 40% and a maximum pore diameter smaller than 1/2 of the protrusion diameter on the upper part of the base 5 of the apparatus made of dense ceramics. Part 1 is welded with a glass agent or the like. Further, a plurality of pin-shaped microprojections 2 having a circular cross section are provided on the upper surface of the vacuum suction portion 1, and the microprojections 2 have a pitch according to the thickness of the sample 10 so that the sample 10 does not bend during vacuum suction. And are made as small as possible in order to reduce the contact area. Further, pores existing in the outer peripheral portion of the vacuum suction portion 1 are sealed with a dense material up to a region 21 slightly inside (desirably about 0.5 mm to 1 mm) from the outer diameter of the sample.
In the present embodiment, the protrusion 2 is formed on the vacuum suction portion 1 made of a porous ceramic material having a maximum pore diameter of ½ or less of the protrusion diameter. Therefore, the protrusion 2 is made of a porous material having a maximum pore diameter larger than the protrusion diameter. It is hard to break as compared with the protrusion, and the protrusion may be partially chipped, but the whole is not chipped. Therefore, it is possible to make protrusions arranged at regular intervals, and it is possible to adsorb the thin sample 10 without deformation.

(第2の実施の形態)
図3(a),(b)は、本発明に係わる真空吸着装置の第2の実施の形態を示す平面図と正断面図である。図4は、同要部の拡大断面図である。
図に示すように、緻密なセラミックスからなる装置の基部5の上部に、数10〜40%の気孔率を有し、最大気孔径が突起径の1/2より小さい多孔質セラミックスからなる真空吸着部1が形成される。さらに真空吸着部1の上面に、多数の円形断面をもつピン状の微小突起2が設けられ、微小突起2は真空吸着時に試料10にたわみを生じないように試料10の厚さに応じたピッチにて離散配置され、かつ接触面積を減らすためにできる限り小さく造られている。この真空吸着部1を取り囲む環状のシール部24を設け、このシール部24をより加工し易いガラス、金属、無機又は有機材料などの緻密な材料で形成し、且つ、前記突起より数μm程度低く設定することによって、前記突起と試料との間にきわめて微少な隙間を形成し、さらに真空吸着部1の外周部に存在する気孔を試料外径よりわずかに内側(望ましくは0.5mm〜1mm程度)の領域21まで、緻密な材料で封止している。
本実施例では、突起2は最大気孔径が突起径の1/2以下の多孔質セラミックス材料からなる真空吸着部1上に造られ、且つ、高さも突起径の1/2以下と低いので、最大気孔径が突起径より大きく、高さも突起径より大きい多孔質材料からなる突起と比較して折損し難く、突起に一部欠けを発生することはあるが全体が欠けることはない。したがって、一定間隔で配置された突起を造ることができ、薄い厚さの試料10を変形なく吸着することが可能になる。
(Second Embodiment)
FIGS. 3A and 3B are a plan view and a front sectional view showing a second embodiment of the vacuum suction device according to the present invention. FIG. 4 is an enlarged cross-sectional view of the main part.
As shown in the figure, vacuum adsorption made of porous ceramics having a porosity of several tens to 40% and a maximum pore diameter smaller than 1/2 of the protrusion diameter on the upper part of the base 5 of the apparatus made of dense ceramics. Part 1 is formed. Further, a plurality of pin-shaped microprojections 2 having a circular cross section are provided on the upper surface of the vacuum suction portion 1, and the microprojections 2 have a pitch according to the thickness of the sample 10 so that the sample 10 does not bend during vacuum suction. And are made as small as possible in order to reduce the contact area. An annular seal portion 24 surrounding the vacuum suction portion 1 is provided. The seal portion 24 is formed of a dense material such as glass, metal, inorganic, or organic material that is easier to process, and is approximately several μm lower than the protrusion. By setting, a very small gap is formed between the protrusion and the sample, and the pores existing in the outer peripheral portion of the vacuum suction portion 1 are slightly inside the sample outer diameter (preferably about 0.5 mm to 1 mm). The region 21) is sealed with a dense material.
In this embodiment, the protrusion 2 is made on the vacuum suction portion 1 made of a porous ceramic material having a maximum pore diameter of 1/2 or less of the protrusion diameter, and the height is as low as 1/2 or less of the protrusion diameter. Compared with a projection made of a porous material having a maximum pore diameter larger than the projection diameter and a height larger than the projection diameter, the projection is hardly broken, and the projection may be partially chipped, but the whole is not chipped. Therefore, it is possible to make protrusions arranged at regular intervals, and it is possible to adsorb the thin sample 10 without deformation.

(第3の実施の形態)
図5(a),(b)は、本発明に係わる真空吸着装置の第3の実施の形態を示す平面図と正断面図である。
図に示すように、緻密なセラミックスからなる装置の基部5の上部に、数10〜40%の気孔率を有する多孔質セラミックスからなる真空吸着部1がガラス剤などにより溶着される。さらに真空吸着部1の上面に、多数の円形断面をもつ異種もしくは同種の真空吸着部1より緻密な若しくは気孔径に小さい多孔質材料からなるピン状の微小突起2が固着して設けられ、微小突起2は真空吸着時に試料10にたわみを生じないように試料10の厚さに応じたピッチにて離散配置され、かつ接触面積を減らすためにできる限り小さく造られている。真空吸着部1の外周部に存在する気孔を、試料外径よりわずかに内側(望ましくは0.5mm〜1mm程度)の領域21まで、緻密な材料で封止している。
(Third embodiment)
FIGS. 5A and 5B are a plan view and a front sectional view showing a third embodiment of the vacuum suction device according to the present invention.
As shown in the drawing, a vacuum adsorbing portion 1 made of porous ceramics having a porosity of several tens to 40% is welded to a top portion of a base portion 5 of a device made of dense ceramics with a glass agent or the like. Furthermore, pin-like microprojections 2 made of a porous material that is denser or smaller in pore diameter than the different or similar vacuum suction portions 1 having a large number of circular cross sections are fixedly provided on the upper surface of the vacuum suction portion 1. The protrusions 2 are discretely arranged at a pitch corresponding to the thickness of the sample 10 so as not to bend during the vacuum suction, and are made as small as possible in order to reduce the contact area. The pores existing in the outer peripheral portion of the vacuum suction portion 1 are sealed with a dense material up to the region 21 slightly inside (desirably about 0.5 mm to 1 mm) from the sample outer diameter.

上記突起2を真空吸着部1に固着させる方法としては、スピンコーティング法、CVDスパッタ法、ディップ法等の公知の方法により薄膜を形成後、リソグラフ技術やサンドブラスト法等により突起を製作するプロセスを用いることができる。   As a method for fixing the protrusion 2 to the vacuum suction portion 1, a process is used in which a thin film is formed by a known method such as a spin coating method, a CVD sputtering method, or a dip method, and then the protrusion is manufactured by a lithographic technique or a sand blast method. be able to.

基部5の上面の真空吸着部1と接する部分には、真空排気溝4、4’が設けられている。真空排気溝4は中心から放射状に、真空排気溝4’は真空吸着部1の外周部に環状に配置され、それらは互いに連通している。真空排気溝4は真空排気孔3に連通し、真空排気孔3は真空ポンプ7に連結されている。   Vacuum exhaust grooves 4, 4 ′ are provided in a portion of the upper surface of the base 5 that is in contact with the vacuum suction portion 1. The evacuation grooves 4 are arranged radially from the center, and the evacuation grooves 4 ′ are annularly arranged on the outer peripheral portion of the vacuum suction portion 1, and they communicate with each other. The vacuum exhaust groove 4 communicates with the vacuum exhaust hole 3, and the vacuum exhaust hole 3 is connected to a vacuum pump 7.

上記真空吸着器14においては、真空排気孔3から空気を排出することにより、図に示す矢印のように空気が流れ、試料10と真空吸着部1間の微小隙間12の空気が排出される。突起2は極めて低く造られ、且つ、この領域21で示されるポーラス上にある気孔は封止されているので、ランド部が無くても試料外周から空気の流入は抑制され、微小隙間12の圧力が下がり、試料10は大気圧により微小突起2の上面に押さえつけられ、試料10が平面に矯正される。 In the vacuum adsorber 14, by discharging air from the vacuum exhaust hole 3, the air flows as indicated by the arrows shown in FIG. 5 , and the air in the minute gap 12 between the sample 10 and the vacuum adsorption unit 1 is discharged. . Since the protrusion 2 is made extremely low and the pores on the porous region 21 are sealed, the inflow of air from the outer periphery of the sample is suppressed even without the land portion, and the pressure of the minute gap 12 is reduced. The sample 10 is pressed against the upper surface of the microprojection 2 by atmospheric pressure, and the sample 10 is corrected to a flat surface.

このような真空吸着装置においては、多孔質セラミックスからなる真空吸着部1の上面に、微小突起2を固着して設けているので、微小突起2の上面と試料10の裏面との接触面積は極めて小さく、微小突起2の上面と試料10の裏面との接触率を、従来のポーラス型真空吸着器に比較し10分の1以下に減少させることができる。   In such a vacuum suction device, since the minute protrusions 2 are fixedly provided on the upper surface of the vacuum suction portion 1 made of porous ceramics, the contact area between the upper surface of the minute protrusions 2 and the back surface of the sample 10 is extremely high. The contact ratio between the top surface of the microprojection 2 and the back surface of the sample 10 is small, and can be reduced to 1/10 or less as compared with a conventional porous vacuum suction device.

したがって、ゴミの影響を少なくすることが可能となり、試料10の全面を容易に高精度の平面に矯正することができる。また、微小突起2の間に存在する空気は真空吸着部1の多孔質材料の気孔を通って真空排気溝4、4’に流れ込むので、微小突起2の高さを大きくしなくても真空度分布を均一にすることができる。前記突起2の高さはゴミを落とすことができる高さで十分であり、1μmから5μm程度、すなわちピン径に対し20分の1以下と小さくすることができる。したがって、微小突起2の高さは断面の直径に比べて数10分から100分の一近くまで小さく形成することができるので、微小突起2は破損しにくく、かつ微小突起2の間の溝が浅いので、ゴミなどが付着したとしても容易に洗浄除去することができる。   Therefore, the influence of dust can be reduced, and the entire surface of the sample 10 can be easily corrected to a highly accurate plane. Further, the air existing between the microprotrusions 2 flows into the vacuum exhaust grooves 4 and 4 ′ through the pores of the porous material of the vacuum suction portion 1, so that the degree of vacuum can be reduced without increasing the height of the microprotrusions 2. The distribution can be made uniform. The height of the projection 2 is sufficient to drop dust, and can be as small as about 1 μm to 5 μm, that is, less than 1/20 of the pin diameter. Accordingly, since the height of the microprojections 2 can be reduced from several tens of minutes to nearly one hundredth of the cross-sectional diameter, the microprojections 2 are not easily damaged and the grooves between the microprojections 2 are shallow. Therefore, even if dust adheres, it can be easily removed by washing.

また、微小突起2の高さを小さくすれば微小突起2の直径をさらに小さくすることができるので、試料10の裏面と微小突起2の上面との接触率を一層小さくすることができ、ゴミの影響を極限まで抑制することができる。さらに、微小突起2のピッチを小さくすることによって薄い試料10を変形させることなく真空吸着することも可能になる。   Further, if the height of the microprojections 2 is reduced, the diameter of the microprojections 2 can be further reduced, so that the contact ratio between the back surface of the sample 10 and the top surface of the microprojections 2 can be further reduced, and dust The influence can be suppressed to the limit. Further, by reducing the pitch of the minute protrusions 2, it is possible to vacuum-suck the thin sample 10 without deforming it.

突起2は、真空吸着部1より緻密な異種もしくは同種の材料で造られているので、多孔質材料からなる突起と比較して折損し難く、また、真空吸着部1上に気孔があった場合にも突起を造ることが可能になり、多孔質材料からなる真空吸着部1の上面に一定間隔で配置された突起を造ることができる。   Since the protrusion 2 is made of a material different from or the same kind of material that is denser than the vacuum suction portion 1, it is harder to break than a protrusion made of a porous material, and there are pores on the vacuum suction portion 1. It is also possible to make protrusions, and it is possible to make protrusions arranged at regular intervals on the upper surface of the vacuum suction portion 1 made of a porous material.

真空排気孔3には、接続ホース6を介して真空ポンプ7および清浄空気を供給することができる清浄空気供給装置8に連結され、接続ホース6に切替弁9が設けられている。   The vacuum exhaust hole 3 is connected to a vacuum pump 7 and a clean air supply device 8 capable of supplying clean air via a connection hose 6, and a switching valve 9 is provided on the connection hose 6.

上記真空吸着装置においては、試料10すなわち半導体ウエハを真空吸着部1に載置し、切替弁9を切り替えて真空ポンプ8と真空排気孔3とを導通すると、真空排気溝4、4’を通って真空排気孔3から矢印で示すように空気が排出され、突起2と試料10の裏面間にある空気は多孔質の穴を通って排出される。このことによって、試料10と真空吸着部1との間の圧力が下がり、試料10は大気圧により微小突起2の上面に押さえつけられ、試料10が平面に矯正される。つぎに、切替弁9を切り替えて真空ポンプ7と真空排気孔3との導通を切り、清浄空気供給装置8と真空排気孔3とを導通し、真空排気孔3に清浄空気を送ると、清浄空気が真空吸着部1の上面から吹き出すから、試料10は空気圧により容易に離脱する。そして、次の試料10が載置されるまで、清浄空気を流し続ける。この状態で、試料10が真空吸着部1の上面に載置されたとき、切替弁9を切り替えて真空ポンプ7と真空排気孔3とを導通すると、試料10は真空吸着される。   In the vacuum suction apparatus, when the sample 10, that is, the semiconductor wafer is placed on the vacuum suction portion 1 and the switching valve 9 is switched to connect the vacuum pump 8 and the vacuum exhaust hole 3, the sample passes through the vacuum exhaust grooves 4 and 4 ′. Then, air is discharged from the vacuum exhaust hole 3 as indicated by an arrow, and the air between the protrusion 2 and the back surface of the sample 10 is discharged through the porous hole. As a result, the pressure between the sample 10 and the vacuum suction portion 1 decreases, the sample 10 is pressed against the upper surface of the microprojection 2 by atmospheric pressure, and the sample 10 is corrected to a flat surface. Next, when the switching valve 9 is switched to disconnect the vacuum pump 7 from the vacuum exhaust hole 3, the clean air supply device 8 is connected to the vacuum exhaust hole 3, and clean air is sent to the vacuum exhaust hole 3, Since air blows out from the upper surface of the vacuum suction part 1, the sample 10 is easily detached by air pressure. And it continues flowing clean air until the next sample 10 is mounted. In this state, when the sample 10 is placed on the upper surface of the vacuum suction unit 1, when the switching valve 9 is switched to connect the vacuum pump 7 and the vacuum exhaust hole 3, the sample 10 is vacuum-sucked.

なお、上述実施の形態においては、突起としてピン状の微小突起2を設けたが、突起として特開平7−302832号公報の図3に示されるような多数の同心円上に配置された環状突起を設けてもよい。また、上述実施の形態においては、断面が円形の微小突起2を設けたが、断面が矩形等の微小突起を設けてもよい。また、上述実施の形態においては、円形の真空吸着部1を設けたが、矩形、楕円等の真空吸着部を設けてもよい。また、上述実施の形態においては、多孔質材料からなる真空吸着部として多孔質セラミックスからなる真空吸着部1を用いたが、多孔質からなる真空吸着部として他の多孔質材料からなる真空吸着部を用いてもよい。   In the above-described embodiment, the pin-shaped microprojections 2 are provided as projections. However, as projections, annular projections arranged on a large number of concentric circles as shown in FIG. 3 of JP-A-7-302832 are provided. It may be provided. In the above-described embodiment, the microprojections 2 having a circular cross section are provided. However, microprojections having a rectangular cross section may be provided. In the above-described embodiment, the circular vacuum suction portion 1 is provided. However, a vacuum suction portion such as a rectangle or an ellipse may be provided. In the above embodiment, the vacuum suction portion 1 made of porous ceramics is used as the vacuum suction portion made of a porous material. However, the vacuum suction portion made of another porous material is used as the vacuum suction portion made of a porous material. May be used.

(第4の実施の形態)
図6(a),(b)は、本発明に係わる真空吸着装置の第4の実施の形態を示す平面図と正断面図である。
第4の実施の形態では、上記と同様の真空吸着部1の上面に、真空吸着部1より気孔径の小さい多孔質材料からなり、薄板状の基体102bの上面に多数の微小突起102aが一体に形成された突起板102を層状に設けている。真空吸着部1と突起板102とは、ガラス剤による部分溶着、あるいは嵌合などにより固定されている。もしくは、泥奨鋳込法などによって成形されている。また、真空吸着部1の外周部に存在する気孔を、試料外径よりわずかに内側(望ましくは0.5mm〜1mm程度)の領域21まで、緻密な材料で封止している。
(Fourth embodiment)
6A and 6B are a plan view and a front sectional view showing a fourth embodiment of the vacuum suction device according to the present invention.
In the fourth embodiment, the upper surface of the vacuum suction portion 1 is made of a porous material having a pore diameter smaller than that of the vacuum suction portion 1, and a large number of microprojections 102a are integrally formed on the upper surface of the thin plate-like substrate 102b. The projecting plates 102 formed in the above are provided in layers. The vacuum suction portion 1 and the protruding plate 102 are fixed by partial welding with a glass agent or fitting. Alternatively, it is formed by a mud casting method. Further, pores existing in the outer peripheral portion of the vacuum suction portion 1 are sealed with a dense material up to a region 21 slightly inside (desirably about 0.5 mm to 1 mm) from the outer diameter of the sample.

上記突起板102は、上記真空吸着部1よりも気孔径の小さい組成構造を有する多孔質セラミックス材料、すなわち突起径の1/2以下の最大気孔径で数10〜40%程度の気孔率を有する多孔質セラミックス材料により形成されている。また、突起102aの高さは、1μmから5μm程度の極めて低い高さに設定されている。また、基体102bの高さは、空気の流量抵抗を抑制するために数100μm〜数mm以下とされている。   The protruding plate 102 has a porous ceramic material having a composition structure with a pore size smaller than that of the vacuum suction portion 1, that is, a porosity of about several tens to 40% with a maximum pore diameter of 1/2 or less of the protruding diameter. It is made of a porous ceramic material. The height of the protrusion 102a is set to an extremely low height of about 1 μm to 5 μm. Further, the height of the base body 102b is set to several hundred μm to several mm or less in order to suppress the flow resistance of air.

上記第4の実施の形態の説明において、上記第1の実施の形態と対応する箇所の図面には、同一の符号を付して、その詳細な説明は省略した。   In the description of the fourth embodiment, the same reference numerals are given to the drawings corresponding to the first embodiment, and the detailed description thereof is omitted.

(第5の実施の形態)
図7(a),(b)は、本発明に係わる真空吸着装置の第5の実施の形態を示す平面図とAOA'断面図である。
第5の実施の形態では、上記真空吸着部1の中心部に試料10を持ち上げるリフト機構を通す穴15が3個設けられている。この穴15を通して試料10は上部に持ち上げられ、側面から挿入された受け渡し用の搬送アームにより試料10は搬出される。従来のセラミックス製の真空ピンチャックでは突起の高さが数100μmと大きかったため、この穴10の周りに真空をシールするランド部を設けて真空漏れを防いでいたが、本発明では穴10の側内面17(AOA'断面に太線で示す)部及び穴の周辺近郊に存在する気孔をガラス剤や高分子樹脂などにより封止するだけでよく、ランド部を新たに設ける必要はない。
(Fifth embodiment)
7A and 7B are a plan view and a cross-sectional view of AOA ′ showing a fifth embodiment of the vacuum suction device according to the present invention.
In the fifth embodiment, three holes 15 through which a lift mechanism for lifting the sample 10 passes are provided in the center of the vacuum suction unit 1. The sample 10 is lifted up through the hole 15, and the sample 10 is carried out by a transfer transfer arm inserted from the side surface. In the conventional ceramic vacuum pin chuck, the height of the protrusion is as large as several hundreds μm. Therefore, a land portion that seals the vacuum is provided around the hole 10 to prevent vacuum leakage. It is only necessary to seal the inner surface 17 (indicated by a thick line in the AOA ′ cross section) and the pores in the vicinity of the hole with a glass agent or a polymer resin, and it is not necessary to newly provide a land portion.

(第6の実施の形態)
図8(a),(b)は、本発明に係わる真空吸着装置の第6の実施の形態を示す平面図とAOA'断面図である。
第6の実施の形態では、上記真空吸着部1の周辺に試料10を持ち上げるリフト機構を通す切り欠き16が3カ所設けられている。この切り欠き16に下方から上方に向かってリフト機構が上昇して、試料10は上に持ち上げられ、側面から挿入された受け渡し用の搬送アームにより搬出される。従来のセラミックス製の真空ピンチャックでは突起の高さが数100μmと大きかったため、この切り欠き16の周りに真空をシールするランド部を設けて真空漏れを防いでいたが、本発明では切り欠き16の側内面18(AOA'断面に斜めのハッチングで示す)部と切り欠きの周辺近傍に存在する気孔をガラス剤や高分子樹脂などにより封止するだけでよく、ランド部を新たに設ける必要はない。
(Sixth embodiment)
FIGS. 8A and 8B are a plan view and a cross-sectional view of AOA ′ showing a sixth embodiment of the vacuum suction apparatus according to the present invention.
In the sixth embodiment, three cutouts 16 for passing a lift mechanism for lifting the sample 10 are provided around the vacuum suction unit 1. A lift mechanism rises from the lower side to the upper side of the notch 16 so that the sample 10 is lifted upward and carried out by a delivery transfer arm inserted from the side surface. In the conventional ceramic vacuum pin chuck, since the height of the protrusion is as large as several hundred μm, a land portion for sealing a vacuum is provided around the notch 16 to prevent vacuum leakage. However, in the present invention, the notch 16 It is only necessary to seal the pores existing in the vicinity of the side inner surface 18 (indicated by oblique hatching in the AOA 'cross section) and the notch with a glass agent or a polymer resin, and it is necessary to newly provide a land portion. Absent.

(a),(b)は本発明の第1の実施の形態に係る真空吸着装置を構成する真空吸着器の一実施例を示す平面図および正断面図である。(A), (b) is the top view and front sectional view which show one Example of the vacuum suction device which comprises the vacuum suction apparatus which concerns on the 1st Embodiment of this invention. 同要部の拡大断面図である。It is an expanded sectional view of the principal part. (a),(b)は本発明の第2の実施の形態に係る真空吸着装置を構成する真空吸着器の一実施例を示す平面図および正断面図である。(A), (b) is the top view and front sectional view which show one Example of the vacuum suction device which comprises the vacuum suction apparatus which concerns on the 2nd Embodiment of this invention. 同要部の拡大断面図である。It is an expanded sectional view of the principal part. (a),(b)は本発明の第3の実施の形態に係る真空吸着装置を構成する真空吸着器の一実施例を示す平面図および正断面図である。(A), (b) is the top view and front sectional view which show one Example of the vacuum suction device which comprises the vacuum suction apparatus which concerns on the 3rd Embodiment of this invention. (a),(b)は本発明の第4の実施の形態に係る真空吸着装置を構成する真空吸着器の一実施例を示す平面図および正断面図である。(A), (b) is the top view and front sectional view which show one Example of the vacuum suction device which comprises the vacuum suction apparatus which concerns on the 4th Embodiment of this invention. (a),(b)は本発明の第5の実施の形態に係る真空吸着装置を構成する真空吸着器の一実施例を示す平面図およびAOA'断面図である。(A), (b) is the top view and AOA 'sectional drawing which show one Example of the vacuum suction device which comprises the vacuum suction apparatus which concerns on the 5th Embodiment of this invention. (a),(b)は本発明の第6の実施の形態に係る真空吸着装置を構成する真空吸着器の一実施例を示す平面図およびAOA'断面図である。(A), (b) is the top view and AOA 'sectional drawing which show one Example of the vacuum suction device which comprises the vacuum suction apparatus which concerns on the 6th Embodiment of this invention. (a),(b)は従来のポーラス型真空吸着器の正面図および正断面図である。(A), (b) is the front view and front sectional drawing of the conventional porous type vacuum suction device. (a),(b)は従来の多孔質突起をもつポーラス型真空吸着器の正面図および正断面図である。(A), (b) is the front view and front sectional view of a conventional porous vacuum adsorber having porous protrusions. (a),(b)は従来の多孔質突起をもつポーラス型真空吸着器の拡大正面図および拡大正断面図である。(A), (b) is an enlarged front view and an enlarged front sectional view of a conventional porous vacuum adsorber having porous protrusions.

符号の説明Explanation of symbols

1…真空吸着部、2…突起、3…真空排気孔、4,4’…真空排気溝、5…基部、6…接続ホース、7…真空ポンプ、8…清浄空気供給装置、9…切替弁、10…試料、11…ランド部、12…微小隙間、14…真空吸着器、15…リフト機構を通す穴、16…リフト機構を通す切り欠き、17…リフト機構を通す穴側面、18…リフト機構を通す切り欠き側面、19…封止した気孔、20…気孔、21…試料外径よりわずかに内側まで封止した領域、22…真空吸着部となる封止されていない領域、23…穴や切り欠き周辺の気孔を封止した領域、24…シール部、102…突起板、102a…突起、102b…基体。 DESCRIPTION OF SYMBOLS 1 ... Vacuum adsorption part, 2 ... Protrusion, 3 ... Vacuum exhaust hole, 4, 4 '... Vacuum exhaust groove, 5 ... Base, 6 ... Connection hose, 7 ... Vacuum pump, 8 ... Clean air supply apparatus, 9 ... Switching valve DESCRIPTION OF SYMBOLS 10 ... Sample, 11 ... Land part, 12 ... Micro gap, 14 ... Vacuum suction device, 15 ... Hole through lift mechanism, 16 ... Notch through lift mechanism, 17 ... Side surface of hole through lift mechanism, 18 ... Lift Cut-out side through which the mechanism passes, 19 ... sealed pores, 20 ... pores, 21 ... region sealed to the inner side slightly from the sample outer diameter, 22 ... non-sealed region to be a vacuum suction part, 23 ... hole A region where the pores around the notch are sealed, 24: a seal portion, 102: a protruding plate, 102a: a protrusion, 102b: a base body.

Claims (7)

上面が同一平面上にある多数の突起のみによって試料を支承し、内部に真空ポンプに接続される真空排気孔を設けた真空吸着器を備えた真空吸着装置において、
真空排気孔に連通する真空吸着部を、突起径の1/2以下の最大気孔径を有する多孔質セラミックス材料で作り、その上面に多数の突起を設けるとともに、この突起の高さを数μm程度の極めて低い高さに設定することにより前記真空吸着部と前記試料との間に微小隙間を形成し、前記真空吸着部の外周部に存在する気孔を、試料外径よりわずかに内側の領域まで、ガラス、金属、無機又は有機材料などの緻密な材料で封止したことを特徴とする真空吸着装置。
In a vacuum adsorption apparatus equipped with a vacuum adsorber that supports a sample only by a large number of protrusions whose upper surfaces are on the same plane and is provided with a vacuum exhaust hole connected to a vacuum pump inside.
The vacuum suction part communicating with the evacuation hole is made of a porous ceramic material having a maximum pore diameter of 1/2 or less of the protrusion diameter, and a number of protrusions are provided on the upper surface, and the height of the protrusion is about several μm. Is set to a very low height to form a minute gap between the vacuum suction portion and the sample, and the pores existing in the outer peripheral portion of the vacuum suction portion to a region slightly inside the sample outer diameter. A vacuum suction apparatus characterized by being sealed with a dense material such as glass, metal, inorganic or organic material.
上面が同一平面上にある多数の突起のみによって試料を支承し、内部に真空ポンプに接続される真空排気孔を設けた真空吸着器を備えた真空吸着装置において、
真空排気孔に連通する真空吸着部を、突起径の1/2以下の最大気孔径を有する多孔質セラミックス材料で作り、その上面に高さが突起径の1/2以下の多数の突起を設けるとともに、この真空吸着部を取り囲む環状のシール部を設け、このシール部をより加工し易いガラス、金属、無機又は有機材料などの緻密な材料で形成し、且つ、前記突起より数μm程度低く設定することによって、前記突起と試料との間にきわめて微少な隙間を形成し、さらに前記真空吸着部の外周部に存在する気孔を試料外径よりわずかに内側の領域まで封止したことを特徴とする真空吸着装置。
In a vacuum adsorption apparatus equipped with a vacuum adsorber that supports a sample only by a large number of protrusions whose upper surfaces are on the same plane and is provided with a vacuum exhaust hole connected to a vacuum pump inside.
The vacuum suction part communicating with the vacuum exhaust hole is made of a porous ceramic material having a maximum pore diameter of 1/2 or less of the protrusion diameter, and a number of protrusions having a height of 1/2 or less of the protrusion diameter are provided on the upper surface. In addition, an annular seal portion surrounding the vacuum suction portion is provided, and the seal portion is formed of a dense material such as glass, metal, inorganic or organic material that is easier to process, and is set to be about several μm lower than the protrusion. By forming a very small gap between the protrusion and the sample, and further, the pores existing in the outer peripheral portion of the vacuum suction portion are sealed to a region slightly inside the sample outer diameter. Vacuum suction device.
上面が同一平面上にある多数の突起のみによって試料を支承し、内部に真空ポンプに接続される真空排気孔を設けた真空吸着器を備えた真空吸着装置において、
真空排気孔に連通する真空吸着部を多孔質材料で作り、その上面に、真空吸着部より緻密な材料からなる多数の突起を固着して設けるとともに、この突起の高さを数μm程度の極めて低い高さに設定することにより前記真空吸着部と前記試料との間に微小隙間を形成し、前記真空吸着部の外周部に存在する気孔を、試料外径よりわずかに内側の領域まで封止したことを特徴とする真空吸着装置。
In a vacuum adsorption apparatus equipped with a vacuum adsorber that supports a sample only by a large number of protrusions whose upper surfaces are on the same plane and is provided with a vacuum exhaust hole connected to a vacuum pump inside.
The vacuum suction portion communicating with the vacuum exhaust hole is made of a porous material, and a large number of projections made of a material denser than the vacuum suction portion are fixedly provided on the upper surface thereof, and the height of the projection is about several μm. By setting a low height, a minute gap is formed between the vacuum suction part and the sample, and pores existing in the outer peripheral part of the vacuum suction part are sealed to a region slightly inside the sample outer diameter. A vacuum suction device characterized by that.
前記真空吸着部は、多孔質セラミックス材料からなり、前記突起と気孔の封止材は、ガラス、金属、無機又は有機材料などの緻密な材料からなることを特徴とする請求項2に記載の真空吸着装置。 3. The vacuum according to claim 2, wherein the vacuum suction part is made of a porous ceramic material, and the sealing material for the protrusions and pores is made of a dense material such as glass, metal, inorganic, or organic material. Adsorption device. 上面が同一平面上にある多数の突起のみによって試料を支承し、内部に真空ポンプに接続される真空排気孔を設けた真空吸着器を備えた真空吸着装置において、
真空排気孔に連通する真空吸着部を多孔質材料で作り、その上面に、真空吸着部より気孔径の小さい多孔質材料からなり、薄板状の基体の上面に多数の突起が一体に形成された突起板を層状に設け、この突起の高さを数μm程度の極めて低い高さに設定することにより前記真空吸着部と前記試料との間に微小隙間を形成し、前記真空吸着部の外周部に存在する気孔を、試料外径よりわずかに内側の領域まで封止したことを特徴とする真空吸着装置。
In a vacuum adsorption apparatus equipped with a vacuum adsorber that supports a sample only by a large number of protrusions whose upper surfaces are on the same plane and is provided with a vacuum exhaust hole connected to a vacuum pump inside.
The vacuum suction part communicating with the vacuum exhaust hole is made of a porous material, and the upper surface is made of a porous material having a pore diameter smaller than that of the vacuum suction part, and a large number of protrusions are integrally formed on the upper surface of the thin plate-like substrate. Protruding plates are provided in layers, and by setting the height of the protrusions to a very low height of about several μm, a minute gap is formed between the vacuum suction portion and the sample, and the outer peripheral portion of the vacuum suction portion The vacuum suction device is characterized in that pores existing in the sample are sealed to a region slightly inside the sample outer diameter.
前記真空吸着部は、多孔質セラミックス材料からなり、前記突起板は、突起径の1/2以下の最大気孔径を有する多孔質セラミックス材料から、気孔の封止材はガラス、金属、無機又は有機材料などの緻密な材料からなることを特徴とする請求項5に記載の真空吸着装置。 The vacuum adsorbing portion is made of a porous ceramic material, the protruding plate is made of a porous ceramic material having a maximum pore diameter of 1/2 or less of the protruding diameter, and the pore sealing material is glass, metal, inorganic or organic. The vacuum suction device according to claim 5, wherein the vacuum suction device is made of a dense material such as a material. 前期真空吸着部の中心付近に、真空吸着部に吸着する試料を持ち上げる機構を通す穴、もしくは周辺部に切り欠きを設け、その穴もしくは切り欠きの周辺の気孔は、ガラス、金属、無機又は有機材料などの緻密な材料で封止したことを特徴とする請求項1〜5に記載の真空吸着装置。 In the vicinity of the center of the previous vacuum suction part, a hole through which the mechanism for lifting the sample adsorbed on the vacuum suction part is passed, or a notch in the peripheral part is provided, and the pores around the hole or notch are made of glass, metal, inorganic or organic The vacuum suction device according to claim 1, which is sealed with a dense material such as a material.
JP2003306706A 2003-08-29 2003-08-29 Vacuum adsorption device Expired - Lifetime JP3817613B2 (en)

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JP2008028169A (en) * 2006-07-21 2008-02-07 Taiheiyo Cement Corp Vacuum suction device
JP2008115875A (en) * 2006-10-31 2008-05-22 Ckd Corp Non-contact supporting device
JP2008211098A (en) * 2007-02-27 2008-09-11 Taiheiyo Cement Corp Vacuum suction apparatus, manufacturing method thereof and method of sucking object to be sucked
JP2008227125A (en) * 2007-03-13 2008-09-25 Kyocera Corp Vacuum suction device and suction method using the same
KR200454269Y1 (en) 2008-05-30 2011-06-24 김종권 Bottom Vacuum Mold for Manufacturing Semiconductor Package
JP2012119378A (en) * 2010-11-29 2012-06-21 Kyocera Corp Mounting member and manufacturing method thereof
CN111069947A (en) * 2019-12-04 2020-04-28 中国工程物理研究院机械制造工艺研究所 Universal split vacuum reducing suction tool
CN115070615A (en) * 2022-06-29 2022-09-20 中国航发动力股份有限公司 Vacuum chuck device and auxiliary processing method thereof

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008028169A (en) * 2006-07-21 2008-02-07 Taiheiyo Cement Corp Vacuum suction device
JP4704971B2 (en) * 2006-07-21 2011-06-22 太平洋セメント株式会社 Vacuum adsorption device
JP2008115875A (en) * 2006-10-31 2008-05-22 Ckd Corp Non-contact supporting device
JP4757773B2 (en) * 2006-10-31 2011-08-24 シーケーディ株式会社 Non-contact support device
JP2008211098A (en) * 2007-02-27 2008-09-11 Taiheiyo Cement Corp Vacuum suction apparatus, manufacturing method thereof and method of sucking object to be sucked
JP4666656B2 (en) * 2007-02-27 2011-04-06 太平洋セメント株式会社 Vacuum adsorption apparatus, method for producing the same, and method for adsorbing an object to be adsorbed
JP2008227125A (en) * 2007-03-13 2008-09-25 Kyocera Corp Vacuum suction device and suction method using the same
JP4703590B2 (en) * 2007-03-13 2011-06-15 京セラ株式会社 Vacuum adsorption apparatus and adsorption method using the same
KR200454269Y1 (en) 2008-05-30 2011-06-24 김종권 Bottom Vacuum Mold for Manufacturing Semiconductor Package
JP2012119378A (en) * 2010-11-29 2012-06-21 Kyocera Corp Mounting member and manufacturing method thereof
CN111069947A (en) * 2019-12-04 2020-04-28 中国工程物理研究院机械制造工艺研究所 Universal split vacuum reducing suction tool
CN115070615A (en) * 2022-06-29 2022-09-20 中国航发动力股份有限公司 Vacuum chuck device and auxiliary processing method thereof

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