KR970702585A
(ko )
1997-05-13
산소장벽이 마련된 하부전극을 가지는 강유전성의 메모리 소자를 포함하는 반도체 디바이스(semiconductor device comprising a ferroelectric memory element with a lower electrode provided with an oxygen barrier)
EP2261988A3
(en )
2011-02-16
High voltage switching devices and process for forming same
DE50009436D1
(de )
2005-03-10
SiC-Halbleitervorrichtung mit einem Schottky-Kontakt und Verfahren zu deren Herstellung
EP1517380A3
(en )
2009-03-18
Gallium nitride compound semiconductor device and method of manufacturing the same
EP1271624A3
(en )
2007-09-05
Capacitor, semiconductor memory device, and method for manufacturing the same
TW201532299A
(zh )
2015-08-16
具有差異化p型及n型區域架構之太陽能電池射極區的製造
JPH11298040A5
(cg-RX-API-DMAC7.html )
2005-08-11
JP2007294961A5
(cg-RX-API-DMAC7.html )
2010-06-03
JPH10233529A5
(cg-RX-API-DMAC7.html )
2005-01-06
JP2001185507A
(ja )
2001-07-06
半導体装置及びその製造方法
TW200727495A
(en )
2007-07-16
Semiconductor device multilayer structure, fabrication method for the same, semiconductor device having the same, and semiconductor device fabrication method
TWI256088B
(en )
2006-06-01
Method of forming different silicide portions on different silicon-containing regions in a semiconductor device
US6586328B1
(en )
2003-07-01
Method to metallize ohmic electrodes to P-type group III nitrides
EP0137980A2
(en )
1985-04-24
Method for making electrical connections to a semiconductor substrate
JP2003158196A5
(cg-RX-API-DMAC7.html )
2005-07-14
JPH10284437A
(ja )
1998-10-23
半導体装置の金属配線層形成方法
TW428289B
(en )
2001-04-01
Semiconductor device having an improved lead connection structure and manufacturing method thereof
KR970030333A
(ko )
1997-06-26
반도체소자의 도전 배선 콘택 제조방법
EP0987752A3
(en )
2003-10-22
Improved-reliability damascene interconnects and process of manufacture
JPH0492471A
(ja )
1992-03-25
半導体装置
JPS61290775A
(ja )
1986-12-20
半導体装置
JPS5556669A
(en )
1980-04-25
Semiconductor device and its manufacture
KR950024265A
(ko )
1995-08-21
반도체 장치의 금속 콘택부 구조 및 형성방법
TW326098B
(en )
1998-02-01
Process of manufacturing semiconductor device with a metallic silicide layer of low resistance
JPH1064817A5
(cg-RX-API-DMAC7.html )
2004-08-19