JPH11237731A - ポジ型電着フオトレジスト組成物及びパターンの製造方法 - Google Patents

ポジ型電着フオトレジスト組成物及びパターンの製造方法

Info

Publication number
JPH11237731A
JPH11237731A JP33506198A JP33506198A JPH11237731A JP H11237731 A JPH11237731 A JP H11237731A JP 33506198 A JP33506198 A JP 33506198A JP 33506198 A JP33506198 A JP 33506198A JP H11237731 A JPH11237731 A JP H11237731A
Authority
JP
Japan
Prior art keywords
polymer
group
compound
parts
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33506198A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11237731A5 (https=
Inventor
Genji Imai
玄児 今井
Hideo Kogure
英雄 木暮
Takeya Hasegawa
剛也 長谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kansai Paint Co Ltd
Original Assignee
Kansai Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kansai Paint Co Ltd filed Critical Kansai Paint Co Ltd
Priority to JP33506198A priority Critical patent/JPH11237731A/ja
Publication of JPH11237731A publication Critical patent/JPH11237731A/ja
Publication of JPH11237731A5 publication Critical patent/JPH11237731A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
JP33506198A 1997-10-07 1998-10-01 ポジ型電着フオトレジスト組成物及びパターンの製造方法 Pending JPH11237731A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33506198A JPH11237731A (ja) 1997-10-07 1998-10-01 ポジ型電着フオトレジスト組成物及びパターンの製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP9-289218 1997-10-07
JP28921897 1997-10-07
JP33506198A JPH11237731A (ja) 1997-10-07 1998-10-01 ポジ型電着フオトレジスト組成物及びパターンの製造方法

Publications (2)

Publication Number Publication Date
JPH11237731A true JPH11237731A (ja) 1999-08-31
JPH11237731A5 JPH11237731A5 (https=) 2005-11-10

Family

ID=26557515

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33506198A Pending JPH11237731A (ja) 1997-10-07 1998-10-01 ポジ型電着フオトレジスト組成物及びパターンの製造方法

Country Status (1)

Country Link
JP (1) JPH11237731A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6670100B1 (en) 1999-05-20 2003-12-30 Kansai Paint Co., Ltd. Positive type actinic ray-curable dry film and pattern-forming method by use of the same
JP2007056131A (ja) * 2005-08-24 2007-03-08 Arakawa Chem Ind Co Ltd 粘着付与樹脂エマルジョン、その製造方法および水性粘接着剤組成物

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6670100B1 (en) 1999-05-20 2003-12-30 Kansai Paint Co., Ltd. Positive type actinic ray-curable dry film and pattern-forming method by use of the same
JP2007056131A (ja) * 2005-08-24 2007-03-08 Arakawa Chem Ind Co Ltd 粘着付与樹脂エマルジョン、その製造方法および水性粘接着剤組成物

Similar Documents

Publication Publication Date Title
KR100729995B1 (ko) 반사방지피복조성물
KR100305960B1 (ko) 감광성조성물및이조성물을사용한패턴형성방법
KR100566041B1 (ko) 가시광감광성조성물및패턴의제조방법
TWI788560B (zh) 鋶鹽、光酸產生劑、能量線硬化性組成物、硬化體、化學增幅型正型光阻組成物、抗蝕劑圖案之製作方法及化學增幅型負型光阻組成物
US5234791A (en) Radiation-curable composition and radiation-sensitive recording material prepared therefrom for use with high-energy radiation
KR100566042B1 (ko) 포지티브형전착포토레지스트조성물및패턴의제조방법
JP4773037B2 (ja) 耐エッチング性反射防止コーティング組成物
JP2824209B2 (ja) 感光性組成物及びパターンの形成方法
KR100287252B1 (ko) 포지티브형전착포토레지스트조성물및이조성물을사용한레지스트패턴형성법
KR100556079B1 (ko) 크레졸-포름알데히드 반응 혼합물로부터 분별된 노볼락 수지 및 이것으로 제조된 포토레지스트 조성물
JP2824188B2 (ja) 感光性組成物及びパターンの製造方法
JPH06295064A (ja) 感光性組成物及びパターンの製造方法
JP2824191B2 (ja) ポジ型電着フォトレジスト組成物及びレジストパターンの製造方法
JP4065064B2 (ja) 可視光感光性組成物及びパターンの製造方法
JPH0643637A (ja) パターンの保持方法
JPH11237731A (ja) ポジ型電着フオトレジスト組成物及びパターンの製造方法
JP2000267285A (ja) 感光性組成物及びパターンの形成方法
JP2916137B2 (ja) 感光性組成物及びパターンの形成方法
JP2824190B2 (ja) ポジ型電着フォトレジスト組成物及びレジストパターンの製造方法
JP3890052B2 (ja) 活性エネルギー線性組成物及びパターン形成方法
JP7657062B2 (ja) 光酸発生剤及びフォトリソグラフィー用樹脂組成物
JPH06313134A (ja) 水性感光性組成物及びパターンの製造方法
JP3971046B2 (ja) ポジ型感光性樹脂組成物及びその用途
JPH0736179A (ja) ネガ型感光性樹脂組成物
TWI920222B (zh) 光酸產生劑及光微影用樹脂組成物

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050928

A621 Written request for application examination

Effective date: 20050928

Free format text: JAPANESE INTERMEDIATE CODE: A621

A977 Report on retrieval

Effective date: 20070525

Free format text: JAPANESE INTERMEDIATE CODE: A971007

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070605

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20071016