JPH11233427A5 - - Google Patents

Info

Publication number
JPH11233427A5
JPH11233427A5 JP1998044415A JP4441598A JPH11233427A5 JP H11233427 A5 JPH11233427 A5 JP H11233427A5 JP 1998044415 A JP1998044415 A JP 1998044415A JP 4441598 A JP4441598 A JP 4441598A JP H11233427 A5 JPH11233427 A5 JP H11233427A5
Authority
JP
Japan
Prior art keywords
field optical
workpiece
optical lithography
aperture
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998044415A
Other languages
English (en)
Japanese (ja)
Other versions
JP3762091B2 (ja
JPH11233427A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP04441598A priority Critical patent/JP3762091B2/ja
Priority claimed from JP04441598A external-priority patent/JP3762091B2/ja
Publication of JPH11233427A publication Critical patent/JPH11233427A/ja
Publication of JPH11233427A5 publication Critical patent/JPH11233427A5/ja
Application granted granted Critical
Publication of JP3762091B2 publication Critical patent/JP3762091B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP04441598A 1998-02-10 1998-02-10 近接場光リソグラフィー方法 Expired - Fee Related JP3762091B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04441598A JP3762091B2 (ja) 1998-02-10 1998-02-10 近接場光リソグラフィー方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04441598A JP3762091B2 (ja) 1998-02-10 1998-02-10 近接場光リソグラフィー方法

Publications (3)

Publication Number Publication Date
JPH11233427A JPH11233427A (ja) 1999-08-27
JPH11233427A5 true JPH11233427A5 (https=) 2004-12-02
JP3762091B2 JP3762091B2 (ja) 2006-03-29

Family

ID=12690878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP04441598A Expired - Fee Related JP3762091B2 (ja) 1998-02-10 1998-02-10 近接場光リソグラフィー方法

Country Status (1)

Country Link
JP (1) JP3762091B2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4749682B2 (ja) * 2003-06-04 2011-08-17 富士フイルム株式会社 露光装置
JP4328320B2 (ja) * 2004-09-03 2009-09-09 サンエー技研株式会社 露光用光源
JP2011215285A (ja) * 2010-03-31 2011-10-27 Yamatake Corp 受光光学系
WO2015043450A1 (zh) 2013-09-24 2015-04-02 中国科学院光电技术研究所 超分辨成像光刻
US10684555B2 (en) * 2018-03-22 2020-06-16 Applied Materials, Inc. Spatial light modulator with variable intensity diodes
KR20210128529A (ko) * 2020-04-16 2021-10-27 삼성디스플레이 주식회사 노광 장치 및 이를 이용하는 표시 장치 제조 방법

Similar Documents

Publication Publication Date Title
TW445189B (en) Laser processing apparatus and method
JP2023164910A5 (https=)
JPH11504264A (ja) ステップアンドリピート露光の方法および装置
CN110405336A (zh) 激光轴确认用夹具单元以及夹具
JPH11233427A5 (https=)
KR102644949B1 (ko) 레이저 가공 장치, 레이저 가공 방법 및 성막 마스크 제조 방법
EP1770443A3 (en) Laser processing apparatus, exposure apparatus and exposure method
US20060126477A1 (en) Pulse modulation laser writing system
US20090316127A1 (en) Substrate, and method and apparatus for producing the same
JP2006114650A5 (https=)
JP2005085991A5 (https=)
JPH01237123A (ja) 光学的造形法における光束の走査法
JP3211079B2 (ja) 周辺露光装置およびその方法
JP4641779B2 (ja) 露光装置
CN210199507U (zh) 曲面曝光装置
JP2005144484A5 (https=)
JP2003011219A (ja) 樹脂製導光板のレーザー加工方法及び加工装置
JPH11338162A5 (https=)
JP2004114112A (ja) 透明曲面への刻印方法およびその刻印装置
JPH0639575A (ja) レーザ加工装置
JPH0997761A (ja) ウエハの周辺部露光装置
JP3280800B2 (ja) 電子写真装置
JP3211357B2 (ja) レーザー照射装置
TWI354187B (https=)
JP2003251475A (ja) レーザ加工方法