JP3762091B2 - 近接場光リソグラフィー方法 - Google Patents

近接場光リソグラフィー方法 Download PDF

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Publication number
JP3762091B2
JP3762091B2 JP04441598A JP4441598A JP3762091B2 JP 3762091 B2 JP3762091 B2 JP 3762091B2 JP 04441598 A JP04441598 A JP 04441598A JP 4441598 A JP4441598 A JP 4441598A JP 3762091 B2 JP3762091 B2 JP 3762091B2
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Japan
Prior art keywords
resist
light
field
micro
optical head
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Expired - Fee Related
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JP04441598A
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English (en)
Japanese (ja)
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JPH11233427A5 (https=
JPH11233427A (ja
Inventor
亮 黒田
康弘 島田
剛生 山崎
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP04441598A priority Critical patent/JP3762091B2/ja
Publication of JPH11233427A publication Critical patent/JPH11233427A/ja
Publication of JPH11233427A5 publication Critical patent/JPH11233427A5/ja
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Publication of JP3762091B2 publication Critical patent/JP3762091B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP04441598A 1998-02-10 1998-02-10 近接場光リソグラフィー方法 Expired - Fee Related JP3762091B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04441598A JP3762091B2 (ja) 1998-02-10 1998-02-10 近接場光リソグラフィー方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04441598A JP3762091B2 (ja) 1998-02-10 1998-02-10 近接場光リソグラフィー方法

Publications (3)

Publication Number Publication Date
JPH11233427A JPH11233427A (ja) 1999-08-27
JPH11233427A5 JPH11233427A5 (https=) 2004-12-02
JP3762091B2 true JP3762091B2 (ja) 2006-03-29

Family

ID=12690878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP04441598A Expired - Fee Related JP3762091B2 (ja) 1998-02-10 1998-02-10 近接場光リソグラフィー方法

Country Status (1)

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JP (1) JP3762091B2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4749682B2 (ja) * 2003-06-04 2011-08-17 富士フイルム株式会社 露光装置
JP4328320B2 (ja) * 2004-09-03 2009-09-09 サンエー技研株式会社 露光用光源
JP2011215285A (ja) * 2010-03-31 2011-10-27 Yamatake Corp 受光光学系
WO2015043450A1 (zh) 2013-09-24 2015-04-02 中国科学院光电技术研究所 超分辨成像光刻
US10684555B2 (en) * 2018-03-22 2020-06-16 Applied Materials, Inc. Spatial light modulator with variable intensity diodes
KR20210128529A (ko) * 2020-04-16 2021-10-27 삼성디스플레이 주식회사 노광 장치 및 이를 이용하는 표시 장치 제조 방법

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Publication number Publication date
JPH11233427A (ja) 1999-08-27

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