JPH11219936A5 - - Google Patents

Info

Publication number
JPH11219936A5
JPH11219936A5 JP1998019664A JP1966498A JPH11219936A5 JP H11219936 A5 JPH11219936 A5 JP H11219936A5 JP 1998019664 A JP1998019664 A JP 1998019664A JP 1966498 A JP1966498 A JP 1966498A JP H11219936 A5 JPH11219936 A5 JP H11219936A5
Authority
JP
Japan
Prior art keywords
trap
gas
regeneration
exhaust
cooling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998019664A
Other languages
English (en)
Japanese (ja)
Other versions
JP3643474B2 (ja
JPH11219936A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP01966498A priority Critical patent/JP3643474B2/ja
Priority claimed from JP01966498A external-priority patent/JP3643474B2/ja
Priority to US09/239,793 priority patent/US6334928B1/en
Publication of JPH11219936A publication Critical patent/JPH11219936A/ja
Publication of JPH11219936A5 publication Critical patent/JPH11219936A5/ja
Application granted granted Critical
Publication of JP3643474B2 publication Critical patent/JP3643474B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP01966498A 1998-01-30 1998-01-30 半導体処理システム及び半導体処理システムの使用方法 Expired - Fee Related JP3643474B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP01966498A JP3643474B2 (ja) 1998-01-30 1998-01-30 半導体処理システム及び半導体処理システムの使用方法
US09/239,793 US6334928B1 (en) 1998-01-30 1999-01-29 Semiconductor processing system and method of using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP01966498A JP3643474B2 (ja) 1998-01-30 1998-01-30 半導体処理システム及び半導体処理システムの使用方法

Publications (3)

Publication Number Publication Date
JPH11219936A JPH11219936A (ja) 1999-08-10
JPH11219936A5 true JPH11219936A5 (enExample) 2005-03-17
JP3643474B2 JP3643474B2 (ja) 2005-04-27

Family

ID=12005519

Family Applications (1)

Application Number Title Priority Date Filing Date
JP01966498A Expired - Fee Related JP3643474B2 (ja) 1998-01-30 1998-01-30 半導体処理システム及び半導体処理システムの使用方法

Country Status (2)

Country Link
US (1) US6334928B1 (enExample)
JP (1) JP3643474B2 (enExample)

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US7189332B2 (en) 2001-09-17 2007-03-13 Texas Instruments Incorporated Apparatus and method for detecting an endpoint in a vapor phase etch
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US7647886B2 (en) * 2003-10-15 2010-01-19 Micron Technology, Inc. Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers
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US8441361B2 (en) 2010-02-13 2013-05-14 Mcallister Technologies, Llc Methods and apparatuses for detection of properties of fluid conveyance systems
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US20110203776A1 (en) * 2009-02-17 2011-08-25 Mcalister Technologies, Llc Thermal transfer device and associated systems and methods
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JP2012082462A (ja) * 2010-10-08 2012-04-26 Toshiba Corp イオン注入装置および方法
US8671870B2 (en) 2011-08-12 2014-03-18 Mcalister Technologies, Llc Systems and methods for extracting and processing gases from submerged sources
US9522379B2 (en) 2011-08-12 2016-12-20 Mcalister Technologies, Llc Reducing and/or harvesting drag energy from transport vehicles, including for chemical reactors, and associated systems and methods
US8734546B2 (en) 2011-08-12 2014-05-27 Mcalister Technologies, Llc Geothermal energization of a non-combustion chemical reactor and associated systems and methods
US8821602B2 (en) 2011-08-12 2014-09-02 Mcalister Technologies, Llc Systems and methods for providing supplemental aqueous thermal energy
US8911703B2 (en) 2011-08-12 2014-12-16 Mcalister Technologies, Llc Reducing and/or harvesting drag energy from transport vehicles, including for chemical reactors, and associated systems and methods
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US8926719B2 (en) 2013-03-14 2015-01-06 Mcalister Technologies, Llc Method and apparatus for generating hydrogen from metal
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KR102273855B1 (ko) * 2019-03-22 2021-07-07 대전대학교 산학협력단 반도체 공정용 가스 회수 장치
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