JPH11176856A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPH11176856A
JPH11176856A JP9346299A JP34629997A JPH11176856A JP H11176856 A JPH11176856 A JP H11176856A JP 9346299 A JP9346299 A JP 9346299A JP 34629997 A JP34629997 A JP 34629997A JP H11176856 A JPH11176856 A JP H11176856A
Authority
JP
Japan
Prior art keywords
resin
semiconductor chip
island
lead
frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9346299A
Other languages
Japanese (ja)
Other versions
JP3877405B2 (en
Inventor
Haruo Hyodo
治雄 兵藤
Takayuki Tani
孝行 谷
Takao Shibuya
隆生 渋谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP34629997A priority Critical patent/JP3877405B2/en
Publication of JPH11176856A publication Critical patent/JPH11176856A/en
Application granted granted Critical
Publication of JP3877405B2 publication Critical patent/JP3877405B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93Batch processes
    • H01L24/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/013Alloys
    • H01L2924/0132Binary Alloys
    • H01L2924/01322Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • H01L2924/13055Insulated gate bipolar transistor [IGBT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • H01L2924/13091Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Abstract

PROBLEM TO BE SOLVED: To provide the manufacture of a semiconductor device whose effective area rate is improved in the case of mounting. SOLUTION: A lead frame 30 having at least islands 33 and lead terminals 34 is prepared. A matching mark 37 is made in advance to the frame 32 of the lead frame 30. Die-bonding and wire-bonding are applied to each semiconductor chip 39, and the entire semiconductor chips 39 are molded by a resin in common. Resin 41 on the rear side is partially removed to expose a metal surface at a position of an external connection electrode. The matching marks 37 of the frame 32 are used to cut off the resin 41 to surround each semiconductor ship 39 and the individual semiconductor devices are obtained.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は半導体装置に関し、
特に、実装面積を縮小して実装効率を向上できる半導体
装置に関する。
The present invention relates to a semiconductor device,
In particular, the present invention relates to a semiconductor device capable of improving a mounting efficiency by reducing a mounting area.

【0002】[0002]

【従来の技術】IC、ディスクリート素子等の半導体素
子を製造する際には、図9(A)に示すような封止技術
が主に用いられる。即ち、半導体チップ1をアイランド
2上に実装(ダイボンド)し、半導体チップ1の周辺に
配置したリード端子3とトランジスタ素子のベース電
極、エミッタ電極とをそれぞれボンディングワイヤー4
で電気的に接続(ワイヤボンド)し、半導体チップ1を
エポキシ樹脂等の熱硬化型樹脂4によるトランスファー
モールドによって、半導体チップ1とリード端子3の一
部を完全に被覆保護したものである。樹脂5の外部に導
出されたリード端子3はZ字型に折り曲げられて表面実
装用途に適したものとしてある。
2. Description of the Related Art When manufacturing semiconductor elements such as ICs and discrete elements, a sealing technique as shown in FIG. 9A is mainly used. That is, the semiconductor chip 1 is mounted (die-bonded) on the island 2, and the lead terminals 3 arranged around the semiconductor chip 1 and the base electrode and the emitter electrode of the transistor element are respectively bonded to the bonding wires 4.
The semiconductor chip 1 and the lead terminals 3 are completely covered and protected by transfer molding of the semiconductor chip 1 with a thermosetting resin 4 such as an epoxy resin. The lead terminal 3 led out of the resin 5 is bent in a Z-shape and is suitable for surface mounting applications.

【0003】例えばNPN型トランジスタ素子を形成し
た半導体チップ1を封止した場合は、アイランド2をコ
レクタ電極として3端子構造の半導体装置が提供され
る。尚、6は半導体チップ1を固着するための半田など
の接着剤である。上記の半導体装置の製造工程にあって
は、アイランド2とリード端子3は、銅素材または鉄素
材からなるフープ状あるいは短冊状のリードフレームの
状態で供給され、該リードフレームには例えば半導体装
置20個分のアイランド2とリード端子3が形成されて
いる。
For example, when a semiconductor chip 1 on which an NPN transistor element is formed is sealed, a semiconductor device having a three-terminal structure using an island 2 as a collector electrode is provided. Reference numeral 6 denotes an adhesive such as solder for fixing the semiconductor chip 1. In the above-described semiconductor device manufacturing process, the island 2 and the lead terminals 3 are supplied in the form of a hoop-shaped or strip-shaped lead frame made of a copper material or an iron material. Individual islands 2 and lead terminals 3 are formed.

【0004】また、上記の製造工程のトランスファーモ
ールドにあっては、図9(B)を参照して、上金型7及
び下金型8によって個々の半導体装置の外形形状に合致
した空間であるキャビティ9を構成し、該キャビティの
内部にダイボンド及びワイヤボンドを施したリードフレ
ームを設置し、この状態でキャビティ9内に樹脂を注入
することによりトランスファーモールドが行われる。更
に、樹脂封止した後に前記リードフレームからリード部
分他を切断することで半導体装置を個々の素子に分離し
ている。
Further, in the transfer mold in the above-described manufacturing process, referring to FIG. 9 (B), the space is matched with the outer shape of each semiconductor device by the upper mold 7 and the lower mold 8. A cavity 9 is formed, a lead frame on which die bonding and wire bonding are performed is installed inside the cavity, and in this state, resin is injected into the cavity 9 to perform transfer molding. Further, the semiconductor device is separated into individual elements by cutting the lead portions and the like from the lead frame after resin sealing.

【0005】[0005]

【発明が解決しようとする課題】第1の課題:樹脂モー
ルドされた半導体装置は、通常、ガラスエポキシ基板等
のプリント基板に実装され、同じくプリント基板上に実
装された他の素子と電気的に接続することにより、所望
の回路網を構成する。この時、リード端子3が樹脂5の
外部に導出された半導体装置では、リード端子3の先端
から先端までの距離10を実装面積として占有するの
で、実装面積が大きいという欠点がある。
A first problem is that a resin-molded semiconductor device is usually mounted on a printed board such as a glass epoxy board, and is electrically connected to other elements also mounted on the printed board. The connection forms a desired circuit network. At this time, the semiconductor device in which the lead terminals 3 are led out of the resin 5 has a disadvantage that the mounting area is large because the distance 10 from the tip of the lead terminal 3 to the tip is occupied as the mounting area.

【0006】第2の課題:金型内に設置したときのリー
ドフレームとキャビティ9との位置合わせ精度はプラス
・マイナス50μ程度が限界である。このため、アイラ
ンド2の大きさは前記合わせ精度を考慮した大きさに設
計しなければならない。従って、合わせ精度の問題は、
パッケージの外形寸法に対するアイランド2の寸法を小
さくし、これがパッケージの外形寸法に対して収納可能
な半導体チップ1の最大寸法に制限を与えていた。
Second problem: The positioning accuracy between the lead frame and the cavity 9 when installed in a mold is limited to about ± 50 μm. Therefore, the size of the island 2 must be designed in consideration of the alignment accuracy. Therefore, the problem of alignment accuracy is
The size of the island 2 with respect to the external dimensions of the package is reduced, and this limits the maximum size of the semiconductor chip 1 that can be accommodated with respect to the external dimensions of the package.

【0007】[0007]

【課題を解決するための手段】本発明は、半導体チップ
を固着する為の複数個の素子搭載部と、それらの周辺部
に配置され前記複数個の素子搭載部を保持する枠体部
と、該枠体部に形成した複数個の位置合わせマークと、
を少なくとも具備する基板を準備する工程と、前記基板
のアイランド上に前記半導体チップを搭載する工程と、
前記半導体チップを含め、前記複数個の素子搭載部を連
続した樹脂層で被覆する工程と、前記枠体部に形成した
位置合わせマークを基準として、前記樹脂層と前記基板
とをダイシングし、前記素子搭載部に搭載された半導体
チップを個々に分離して個別半導体素子を形成するもの
である。
According to the present invention, there are provided a plurality of element mounting portions for fixing a semiconductor chip, a frame portion disposed around the plurality of element mounting portions and holding the plurality of element mounting portions, A plurality of alignment marks formed on the frame portion;
Preparing a substrate comprising at least, and mounting the semiconductor chip on an island of the substrate,
Including the semiconductor chip, a step of coating the plurality of element mounting portions with a continuous resin layer, and dicing the resin layer and the substrate with reference to alignment marks formed on the frame portion, The semiconductor chips mounted on the element mounting portion are individually separated to form individual semiconductor elements.

【0008】[0008]

【発明の実施の形態】以下に本発明の製造方法を詳細に
説明する。 第1工程:(図1) 先ず、リードフレーム30を準備する。図1(A)はリ
ードフレーム30の平面図であり、図1(B)は図1
(A)のAA断面図である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The production method of the present invention will be described below in detail. First step: (FIG. 1) First, a lead frame 30 is prepared. FIG. 1A is a plan view of the lead frame 30, and FIG.
It is an AA sectional view of (A).

【0009】本発明で用いられるリードフレーム30
は、半導体チップを搭載するための多数の素子搭載部3
1、31A....が行・列方向(又はそれらの一方方
向にのみ)に複数個繰り返しパターンで配置されてお
り、該多数個の素子搭載部31は、それらの周囲を取り
囲む様に配置した枠体部32によって保持されている。
素子搭載部31は、半導体チップを固着するアイランド
33と、外部接続用電極となる複数のリード端子34を
少なくとも具備する。アイランド33は連結バー35に
よって互いに連結され、同じく連結バー35によって枠
体部32に連結されている。リード端子34はアイラン
ド33に連結されている。この時、特定のアイランド3
3に対しては、その隣に隣接するアイランド33Aに連
結保持されたリード端子34が対応して1つの素子搭載
部31を構成する。アイランド33とリード端子34と
の連結部分近傍のリード端子34には、部分的に線幅を
細く加工した凹部36を形成している。この様に素子搭
載部31を行・列方向に複数配置することで、1本の短
冊状のリードフレーム30に例えば100個の素子搭載
部31を配置する。
The lead frame 30 used in the present invention
Are a large number of element mounting portions 3 for mounting a semiconductor chip.
1, 31A. . . . Are arranged in a row and column direction (or only in one of the directions) in a repetitive pattern, and the multiple element mounting portions 31 are held by a frame portion 32 arranged so as to surround the periphery thereof. Have been.
The element mounting portion 31 includes at least an island 33 for fixing a semiconductor chip and a plurality of lead terminals 34 serving as external connection electrodes. The islands 33 are connected to each other by a connection bar 35, and are also connected to the frame 32 by the connection bar 35. The lead terminal 34 is connected to the island 33. At this time, a specific island 3
In the case of No. 3, the lead terminal 34 connected and held to the adjacent island 33A constitutes one element mounting part 31 correspondingly. The lead terminal 34 in the vicinity of the connection portion between the island 33 and the lead terminal 34 is formed with a recess 36 in which the line width is partially reduced. By arranging a plurality of element mounting portions 31 in the row and column directions in this manner, for example, 100 element mounting portions 31 are arranged on one strip-shaped lead frame 30.

【0010】素子搭載部31群を取り囲む枠体部32に
は、複数個の合わせマーク37を形成する。合わせマー
ク37は、貫通孔またはスタンピングによって部分的に
凹ませたもの等、製造工程における自動認識機能が働く
ものであればよい。また、形状も正方形、長方形、矩
形、円形等があげられる。そして、素子搭載部31毎に
1個、または複数個毎に1個等間隔で配置する。
A plurality of alignment marks 37 are formed on the frame 32 surrounding the group of element mounting portions 31. The alignment mark 37 may be any as long as it has an automatic recognition function in the manufacturing process, such as a through-hole or a mark partially recessed by stamping. Further, the shape may be a square, a rectangle, a rectangle, a circle, or the like. Then, one device is provided for each element mounting portion 31 or one device is provided for each device at equal intervals.

【0011】上記のリードフレーム30は、例えば、約
0.2mm厚の銅系の金属材料で形成された帯状あるい
は矩形状のリードフレーム用金属薄板を用意し、このリ
ードフレーム用金属薄板をエッチング加工またはスタン
ピング加工によって図示したパターンに開口することに
より得ることができる。尚、リードフレーム30の板厚
は必要に応じて適宜に設定することができる。
For the lead frame 30, for example, a strip-shaped or rectangular-shaped metal sheet for lead frame made of a copper-based metal material having a thickness of about 0.2 mm is prepared, and this metal sheet for lead frame is etched. Alternatively, it can be obtained by opening the pattern shown in the figure by stamping. The thickness of the lead frame 30 can be appropriately set as needed.

【0012】第2工程:(図2) 次に、リードフレーム30に対してダイボンド工程とワ
イヤボンド工程を行う。図2(B)は図2(A)のAA
線断面図である。各アイランド33、33Aの一主面上
にAgペースト、半田等の導電ペースト38を塗布し、
その導電ペースト38を介して各アイランド33、33
A上に半導体チップ39を固着する。各アイランド表面
に金メッキを行い、そのメッキ上に半導体チップを共晶
接続することも可能である。
Second Step: (FIG. 2) Next, a die bonding step and a wire bonding step are performed on the lead frame 30. FIG. 2B is an AA of FIG.
It is a line sectional view. A conductive paste 38 such as Ag paste or solder is applied on one main surface of each of the islands 33 and 33A,
Each of the islands 33, 33 via the conductive paste 38
A semiconductor chip 39 is fixed on A. Gold plating can be performed on the surface of each island, and a semiconductor chip can be eutectic-connected on the plating.

【0013】更に、半導体チップ39の表面に形成され
たボンディングパッドと、これに対応するリード端子3
4とをワイヤ40でワイヤボンディングする。ワイヤ4
0は例えば直径が20μの金線から成る。ここで、ワイ
ヤ40は各アイランド33上に固着した半導体チップ3
9の表面電極と、その隣に隣接した他のアイランド33
Aから延在するリード端子34とを接続する。半導体チ
ップ39が固着されたアイランド33の裏面は、係る半
導体チップ39の外部接続用の電極として用いることが
できる。アイランド33の裏面を接続用端子の1つとし
て用いる形態は、半導体チップ39として例えばトラン
ジスタ、パワーMOSFET等の、電流経路が垂直方向
になる半導体デバイス素子に適している。
Further, the bonding pads formed on the surface of the semiconductor chip 39 and the corresponding lead terminals 3
4 is wire-bonded with a wire 40. Wire 4
0 is a gold wire having a diameter of, for example, 20 μ. Here, the wires 40 are connected to the semiconductor chips 3 fixed on the respective islands 33.
9 and another island 33 adjacent to it.
A is connected to a lead terminal 34 extending from A. The back surface of the island 33 to which the semiconductor chip 39 is fixed can be used as an electrode for external connection of the semiconductor chip 39. The mode in which the back surface of the island 33 is used as one of the connection terminals is suitable as a semiconductor chip 39 such as a transistor or a power MOSFET, for example, a semiconductor device element having a vertical current path.

【0014】半導体チップ39を固着するために塗布し
た導電性ペースト38は、図2(A)から明らかなよう
に、半導体チップ39が固着されるアイランド33上に
選択的に塗布形成する。リード端子34上に導電性ペー
スト38が付着すると、ワイヤボンディングを行う場合
に、ボンディング装置のキャピラリーの先端部分に導電
性ペーストがつまりボンディング不良が生じ生産性が低
下する恐れがあるためである。この様な問題がない場合
には、導電性ペーストを素子搭載部31全面に塗布して
も良い。
The conductive paste 38 applied for fixing the semiconductor chip 39 is selectively applied on the island 33 to which the semiconductor chip 39 is fixed, as is apparent from FIG. 2A. This is because, when the conductive paste 38 adheres to the lead terminals 34, when performing wire bonding, the conductive paste may be clogged at the tip end of the capillary of the bonding apparatus, which may result in poor bonding and lower productivity. If there is no such problem, a conductive paste may be applied to the entire surface of the element mounting portion 31.

【0015】第3工程:(図3) 次に、全体を樹脂モールドする。図3(B)は図3
(A)のAA線断面図である。リードフレーム30上に
エポキシ樹脂等の熱硬化性の封止用樹脂層41を形成
し、各素子搭載部31、31A..、半導体チップ39
及びワイヤ40を封止保護する。樹脂41は、各半導体
チップ39...を個別にパッケージングするものでは
なく、全ての半導体チップ39を共通に被うように形成
する。また、リードフレーム30の裏面側にも0.05
mm程度の厚みで樹脂41を被着する。これで、アイラ
ンド33とリード端子34は完全に樹脂41内部に埋設
されることになる。
Third step: (FIG. 3) Next, the whole is resin-molded. FIG.
FIG. 3A is a sectional view taken along line AA of FIG. A thermosetting sealing resin layer 41 such as an epoxy resin is formed on the lead frame 30, and each of the element mounting portions 31, 31A. . , Semiconductor chip 39
And the wire 40 is sealed and protected. The resin 41 is used for each semiconductor chip 39. . . Are not individually packaged, but are formed so as to cover all the semiconductor chips 39 in common. Also, 0.05 on the back side of the lead frame 30.
The resin 41 is applied with a thickness of about mm. Thus, the island 33 and the lead terminal 34 are completely embedded in the resin 41.

【0016】この樹脂層41は、射出成形用の上下金型
が形成する空間(キャビティ)内にリードフレーム30
を設置し、該空間内にエポキシ樹脂を充填、成形する事
によって形成する。あるいは、枠体32に高さ数mm、
幅数mmの環状のダムを形成しておき、該ダムで囲まれ
た領域を満たすように液状の樹脂を充填し、これを熱処
理で硬化したものであっても良い。
The resin layer 41 is provided in a space (cavity) formed by upper and lower molds for injection molding.
Is formed, and the space is filled with an epoxy resin and molded. Alternatively, the frame 32 has a height of several mm,
An annular dam having a width of several mm may be formed, a liquid resin may be filled so as to fill a region surrounded by the dam, and the resin may be cured by heat treatment.

【0017】第4工程:(図4) 次に、リードフレーム30の裏面側の樹脂41を部分的
に除去してスリット孔42を形成する。図4(B)は図
4(A)のAA線断面図である。スリット孔41は、後
で外部接続端子を構成する為に形成するものである。約
0.5mmの幅を有し、ダイシング装置のブレードによ
って樹脂42を切削することにより形成した。前記ブレ
ードには様々な板厚のものが準備されており、用いるブ
レードの板厚に応じて、1回であるいは複数回繰り返す
ことで所望の幅に形成する。この時、樹脂41を切削す
ると同時にリード端子34の裏面側も約0.1mm程切
削して、リードフレーム30の金属表面を露出させる。
このスリット孔42は、各リード端子34にくさび状に
形成した「凹部36」の付近に形成する。この時、凹部
36は樹脂41で被覆されて目視できないので、あらか
じめ形成した合わせマーク37を位置基準として用い
る。そして、スリット孔42の内部に露出したリード端
子34の表面に半田メッキ等のメッキ層43を形成す
る。このメッキ層43は、リードフレーム30を電極の
一方とする電解メッキ法により行われる。スリット孔4
2はリード端子34の板厚の全部を切断していないの
で、アイランド33とリード端子34は未だ電気的な導
通が保たれている。更に各アイランド33が連結バー3
5によって共通接続されている。このように露出した金
属表面のすべてが電気的に導通しているので、一回のメ
ッキ工程でメッキ層43を形成することができる。
Fourth Step: (FIG. 4) Next, the slit 41 is formed by partially removing the resin 41 on the back surface of the lead frame 30. FIG. 4B is a cross-sectional view taken along the line AA of FIG. The slit hole 41 is formed to form an external connection terminal later. It had a width of about 0.5 mm and was formed by cutting the resin 42 with a blade of a dicing device. The blade is prepared in various thicknesses, and the blade is formed once or a plurality of times according to the thickness of the blade to be formed into a desired width. At this time, at the same time as the resin 41 is cut, the back surface of the lead terminal 34 is also cut by about 0.1 mm to expose the metal surface of the lead frame 30.
The slit hole 42 is formed in the vicinity of the “recess 36” formed in a wedge shape in each lead terminal 34. At this time, since the concave portion 36 is covered with the resin 41 and cannot be seen, the alignment mark 37 formed in advance is used as a position reference. Then, a plating layer 43 such as solder plating is formed on the surface of the lead terminal 34 exposed inside the slit hole 42. The plating layer 43 is formed by an electrolytic plating method using the lead frame 30 as one of the electrodes. Slit hole 4
In No. 2, since the entire thickness of the lead terminal 34 is not cut, electrical conduction between the island 33 and the lead terminal 34 is still maintained. Furthermore, each island 33 is connected to the connecting bar 3.
5 are commonly connected. Since all of the exposed metal surfaces are electrically conductive, the plating layer 43 can be formed in a single plating step.

【0018】第5工程:(図5) 次に、素子搭載部31毎に樹脂層41を切断して各々の
素子A、素子B、素子C....を分離する。即ち、ア
イランド33とこの上に固着された半導体チップ39に
接続されたリード端子34を囲む領域(同図の切断ライ
ン44)で切断することにより、素子搭載部31毎に分
割した半導体装置を形成する。切断にはダイシング装置
が用いられ、ダイシング装置のブレードによって樹脂層
41とリードフレーム30とを同時に切断する。スリッ
ト孔42が位置する箇所では、少なくともスリット孔4
2の側壁に付着したメッキ層43を残すように形成す
る。この様に残存させたメッキ層43は、半導体装置を
プリント基板上に実装する際に利用される。また、切断
したリード端子34の他方はアイランド33に連続する
突起部33aとして残存し、切断した連結バー35はア
イランド33に連続する突起部33bとして残存する。
切断されたリード端子34及び突起部33a、33bの
切断面は、樹脂層41の切断面と同一平面を形成し、該
同一平面に露出する。ダイシング工程においては裏面側
(スリット孔42を設けた側)にブルーシート(たとえ
ば、商品名:UVシート、リンテック株式会社製)を貼
り付け、前記ダイシングブレードがブルーシートの表面
に到達するような切削深さで切断する。この時に、あら
かじめ形成した合わせマーク37をダイシング装置側で
自動認識し、これを位置基準として用いてダイシングす
る。本実施の形態では、合わせマーク37を長方形の形
状とし、該長方形の長辺を基準位置とした。更に、ダイ
シングブレードの板厚はスリット孔42の幅よりも薄い
(例えば、幅0.1mm)ものを用い、スリット孔42
の中心線に沿って、ダイシングブレードがリード端子3
3の凹部36上を通過するようにダイシングした。これ
で、切断後のリード端子33の先端部が先細りの形状と
なり、樹脂41から容易には抜け落ちない形状に加工で
きる。
Fifth Step: (FIG. 5) Next, the resin layer 41 is cut for each of the element mounting portions 31 so that each of the elements A, B, C. . . . Is separated. That is, a semiconductor device divided for each element mounting portion 31 is formed by cutting the island 33 and the region surrounding the lead terminal 34 connected to the semiconductor chip 39 fixed thereon (the cutting line 44 in the same figure). I do. A dicing device is used for the cutting, and the resin layer 41 and the lead frame 30 are simultaneously cut by a blade of the dicing device. At the position where the slit hole 42 is located, at least the slit hole 4
2 is formed so as to leave the plating layer 43 attached to the side wall. The remaining plating layer 43 is used when mounting the semiconductor device on a printed circuit board. Further, the other one of the cut lead terminals 34 remains as a protrusion 33 a continuous to the island 33, and the cut connection bar 35 remains as a protrusion 33 b continuous to the island 33.
The cut surfaces of the cut lead terminals 34 and the protrusions 33a and 33b form the same plane as the cut surface of the resin layer 41, and are exposed on the same plane. In the dicing step, a blue sheet (for example, trade name: UV sheet, manufactured by Lintec Co., Ltd.) is attached to the back side (the side provided with the slit holes 42), and cutting is performed so that the dicing blade reaches the surface of the blue sheet Cut at depth. At this time, the alignment mark 37 formed in advance is automatically recognized on the dicing apparatus side, and dicing is performed using this as a position reference. In the present embodiment, the alignment mark 37 has a rectangular shape, and the long side of the rectangle is used as a reference position. Further, the thickness of the dicing blade is smaller than the width of the slit hole 42 (for example, 0.1 mm in width).
Along the center line of the lead terminal 3
The dicing was performed so as to pass over the concave portion 36 of No. 3. Thus, the tip of the lead terminal 33 after cutting has a tapered shape, and can be processed into a shape that does not easily fall off the resin 41.

【0019】図6は斯かる製造方法によって形成した完
成後の半導体装置を示す、(A)断面図、(B)裏面
図、(C)側面図である。更に図7は、装置を裏面側か
らみたときの斜視図である。所望の能動素子を形成した
シリコン半導体チップ39が導電性の接着剤によってア
イランド33の一主面上に接着されている。リード端子
34がアイランド33とは離れた位置に複数本設けられ
ている。半導体チップ39の表面部分に形成した電極パ
ッドとリード端子34の表面とがボンディングワイヤ4
0によって電気的に接続される。半導体チップ39とボ
ンディングワイヤ40を含めて、アイランド33とリー
ド端子34が樹脂41でモールドされて、大略直方体の
パッケージ形状を形成する。樹脂41は熱硬化性エポキ
シ樹脂である。アイランド33とリード端子34は、厚
さが約0.2mmの銅系の金属材料から成る。樹脂41
の外形寸法は、縦×横×高さが、約0.7mm×1.0
mm×0.6mmである。直方体のパッケージ外形を形
成する6面のうち、少なくとも側面41a、41b、4
1c、41dは樹脂41を切断した(第5工程参照)切
断面で構成される。該切断面に沿ってリード端子34の
切断面が露出する。アイランド33には切断されたリー
ド端子34の名残である突起部33aと連結部35の名
残である突起部33bを有し、これらの突起部33a、
33bの切断面も露出する。
FIG. 6A is a sectional view, FIG. 6B is a rear view, and FIG. 6C is a side view showing a completed semiconductor device formed by such a manufacturing method. FIG. 7 is a perspective view of the apparatus when viewed from the back side. A silicon semiconductor chip 39 on which a desired active element is formed is bonded on one main surface of the island 33 by a conductive adhesive. A plurality of lead terminals 34 are provided at positions apart from the island 33. The electrode pads formed on the surface of the semiconductor chip 39 and the surfaces of the lead terminals 34 are bonded to the bonding wires 4.
0 is electrically connected. The island 33 and the lead terminals 34, including the semiconductor chip 39 and the bonding wires 40, are molded with the resin 41 to form a substantially rectangular parallelepiped package shape. The resin 41 is a thermosetting epoxy resin. The island 33 and the lead terminal 34 are made of a copper-based metal material having a thickness of about 0.2 mm. Resin 41
The external dimensions of the height x width x height are about 0.7mm x 1.0
mm × 0.6 mm. At least the side surfaces 41a, 41b, 4 out of the six surfaces forming the rectangular parallelepiped package outer shape
1c and 41d are constituted by cut surfaces obtained by cutting the resin 41 (see the fifth step). The cut surface of the lead terminal 34 is exposed along the cut surface. The island 33 has a protruding portion 33a remaining on the cut lead terminal 34 and a protruding portion 33b remaining on the connecting portion 35.
The cut surface of 33b is also exposed.

【0020】図7を参照して、側面41b、41dの裏
面側には第4工程で形成したスリット孔42の名残であ
る段差部45を有し、該段差部45の表面にアイランド
33の突出部33aの裏面側と、リード端子34の裏面
側の一部が露出する。アイランド33とリード端子34
の露出した表面には半田メッキなどの金属メッキ層43
が形成される。リード端子34の露出部分とアイランド
33の露出部との間は、樹脂41で被覆される。
Referring to FIG. 7, on the back side of side surfaces 41b and 41d, there is provided step portion 45, which is a remnant of slit hole 42 formed in the fourth step. The back surface of the portion 33a and a part of the back surface of the lead terminal 34 are exposed. Island 33 and lead terminal 34
A metal plating layer 43 such as solder plating is formed on the exposed surface of
Is formed. The space between the exposed portion of the lead terminal 34 and the exposed portion of the island 33 is covered with the resin 41.

【0021】この装置をプリント基板上に実装した状態
を図8に示す。実装基板24上に形成した素子間接続用
のプリント配線25に対して段差部45に露出したリー
ド端子34とアイランド33の突起部33aを位置合わ
せし、半田26等によって両者を接続する。この時、上
記の第5工程で形成した金属メッキ層43が半田の塗れ
性を良好にする。
FIG. 8 shows a state in which this device is mounted on a printed circuit board. The lead terminal 34 exposed at the step 45 and the projection 33a of the island 33 are aligned with the printed wiring 25 for element connection formed on the mounting substrate 24, and the two are connected by solder 26 or the like. At this time, the metal plating layer 43 formed in the fifth step improves the wettability of the solder.

【0022】以上の方法によって製造された半導体装置
は、以下のメリットを有する。本発明の製造方法によっ
て製造した半導体装置は、金属製リード端子がパッケー
ジから突出しないので、実装面積を半導体装置の大きさ
と同じ程度の大きさにすることができる。従って、半導
体装置の実装面積に対する能動部分(半導体チップ39
のチップサイズを意味する)の比である実装有効面積
を、図9に示したものに比べて大幅に向上できる。これ
により、実装基板上に実装したときのデッドスペースを
小さくすることができ、実装基板の小型化に寄与するこ
とができる。
The semiconductor device manufactured by the above method has the following advantages. In the semiconductor device manufactured by the manufacturing method of the present invention, since the metal lead terminals do not protrude from the package, the mounting area can be made as large as the size of the semiconductor device. Therefore, the active portion (the semiconductor chip 39) with respect to the mounting area of the semiconductor device
(Which means the chip size) can be greatly improved as compared with that shown in FIG. As a result, the dead space when mounted on the mounting board can be reduced, and the size of the mounting board can be reduced.

【0023】分割された半導体装置の各外部接続用電極
の表面にはメッキ層43が形成されているので、実装基
板上に半田固着した際に該半田が切断面の上部まで(ス
リット孔42の側壁に相当する部分)容易に盛り上がっ
て半田フィレットを形成する。従って半田接合力が向上
し熱ストレス等の応力による劣化を防止することができ
る。
Since the plating layer 43 is formed on the surface of each external connection electrode of the divided semiconductor device, when the solder is fixed on the mounting substrate, the solder reaches the upper part of the cut surface (the upper part of the slit hole 42). (Part corresponding to side wall) Easily rises to form a solder fillet. Therefore, the solder bonding force is improved, and deterioration due to stress such as thermal stress can be prevented.

【0024】この装置の外部接続端子は、段差部45に
露出し、段差部45と段差部45との間の領域は樹脂4
1によって被覆されるので露出しない。従って実装基板
24上に実装した際に半田26と半田26との距離を比
較的大きく設計でき、半田ブリッジによる外部接続端子
間の短絡事故を防止できる。分割された半導体装置のリ
ード端子34の終端は、図6(B)に示すように、半導
体装置の終端部分でくさび状に形成されるために、リー
ド端子34が樹脂層41の側面から抜け落ちることを防
止している。尚くさび形状以外にも、コの字型に凹ませ
た形状でも良い。
The external connection terminal of this device is exposed at the step 45, and the area between the steps 45
No exposure because it is covered by 1. Accordingly, the distance between the solders 26 when mounted on the mounting board 24 can be designed to be relatively large, and a short circuit accident between the external connection terminals due to the solder bridge can be prevented. As shown in FIG. 6B, the terminal of the lead terminal 34 of the divided semiconductor device is formed in a wedge shape at the terminal of the semiconductor device, so that the lead terminal 34 falls off the side surface of the resin layer 41. Has been prevented. In addition to the wedge shape, it may be a U-shaped concave shape.

【0025】多数個の素子をまとめてパッケージングす
るので、個々にパッケージングする場合に比べて無駄に
する材料を少なくでき。材料費の低減につながるパッケ
ージの外形をダイシング装置のブレードで切断すること
により構成したので、リードフレーム30のパターンに
対する樹脂41外形の位置あわせ精度を向上できる。即
ち、トランスファーモールド技術によるモールド金型と
リードフレーム30との合わせ精度がプラス・マイナス
50μ程度であるのに対して、ダイシング装置によるダ
イシングブレードとリードフレーム30との合わせ精度
はプラス・マイナス10μ程度に小さくできる。合わせ
精度を小さくできることは、アイランド33の面積を増
大して、搭載可能な半導体チップ39のチップ面積を増
大できることを意味し、これも上記有効実装面積効率を
向上させる。この時、あらかじめリードフレーム30の
外枠32に位置あわせマーク37を形成しておき、該マ
ーク37を使用してダイシングを行うことにより、上記
ダイシング装置の合わせ精度を活用でき、樹脂41外形
とアイランド33などとの間隔を狭めることができるの
である。
Since a large number of elements are packaged together, wasteful materials can be reduced as compared with the case of individually packaging. Since the outer shape of the package, which leads to a reduction in material cost, is formed by cutting the outer shape of the package with a blade of a dicing device, the positioning accuracy of the outer shape of the resin 41 relative to the pattern of the lead frame 30 can be improved. That is, while the alignment accuracy between the molding die and the lead frame 30 by the transfer molding technique is approximately ± 50 μ, the alignment accuracy between the dicing blade and the lead frame 30 by the dicing device is approximately ± 10 μ. Can be smaller. Reducing the alignment precision means that the area of the island 33 can be increased and the chip area of the mountable semiconductor chip 39 can be increased, which also improves the effective mounting area efficiency. At this time, an alignment mark 37 is formed on the outer frame 32 of the lead frame 30 in advance, and dicing is performed using the mark 37, so that the alignment accuracy of the dicing apparatus can be utilized, and the outer shape of the resin 41 and the island 33 can be narrowed.

【0026】尚、上述した実施形態では、3端子用のリ
ードフレームを用いて説明をしたが、リード端子を3本
以上具備するような装置にも適用が可能である。また、
上述した実施形態では、各アイランドに1つの半導体チ
ップ39を固着したが、1つのアイランドに、例えばト
ランジスタを複数個固着すること、及び、トタンジスタ
と縦型パワーMOSFET等の他の素子との複合固着も
可能である。
Although the above embodiment has been described using a lead frame for three terminals, the present invention can be applied to an apparatus having three or more lead terminals. Also,
In the above-described embodiment, one semiconductor chip 39 is fixed to each island. However, for example, a plurality of transistors are fixed to one island, and a composite fixing of a transistor and another element such as a vertical power MOSFET is performed. Is also possible.

【0027】さらに、本実施形態では、半導体チップ3
9にトランジスタを形成したが、例えば、パワーMOS
FET、IGBT、HBT等のデバイスを形成した半導
体チップであっても、本発明に応用できることは説明す
るまでもない。加えて、リード端子の本数を増大するこ
とでBIP、MOS型等の集積回路等にも応用すること
ができる。
Further, in this embodiment, the semiconductor chip 3
9, a power MOS
It goes without saying that the present invention can be applied to the present invention even with a semiconductor chip on which devices such as FETs, IGBTs, and HBTs are formed. In addition, by increasing the number of lead terminals, the present invention can be applied to an integrated circuit such as a BIP or MOS type.

【0028】[0028]

【発明の効果】以上説明したように、本発明によれば、
リード端子34がパッケージから突出しない半導体装置
を得ることができる。従って、半導体装置を実装したと
きのデッドスペースを削減し、高密度実装に適した半導
体装置を得ることができる。外部接続端子と外部接続端
子との間を樹脂層41で被覆した構造にできるので、装
置を実装したときの半田ブリッジ等による端子間短絡の
事故を防止できる。
As described above, according to the present invention,
A semiconductor device in which the lead terminals 34 do not protrude from the package can be obtained. Therefore, a dead space when the semiconductor device is mounted can be reduced, and a semiconductor device suitable for high-density mounting can be obtained. Since the structure between the external connection terminal and the external connection terminal is covered with the resin layer 41, it is possible to prevent a short circuit between terminals due to a solder bridge or the like when the device is mounted.

【0029】パッケージの外形をダイシングブレードに
よる切断面で構成することにより、アイランド33と樹
脂41の端面との寸法精度を向上できる。従って、アイ
ランド33の面積を増大して、収納可能な半導体チップ
39のチップサイズを増大できる。リードフレーム30
のパターン全体を樹脂41で埋設したにもかかわらず、
あらかじめ枠体32に合わせマーク37を形成してお
き、これを位置基準としてダイシングするようにしたの
で、ダイシング装置の合わせ精度を最大限に活用するこ
とができる。
By forming the outer shape of the package with a cut surface by a dicing blade, the dimensional accuracy between the island 33 and the end face of the resin 41 can be improved. Therefore, the area of the island 33 can be increased, and the chip size of the semiconductor chip 39 that can be stored can be increased. Lead frame 30
Despite embedding the entire pattern with resin 41,
Since the alignment mark 37 is formed on the frame 32 in advance and the dicing is performed using the alignment mark 37 as a position reference, the alignment accuracy of the dicing apparatus can be maximized.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の製造方法を説明する為の(A)平面
図、(B)断面図である。
FIG. 1A is a plan view and FIG. 1B is a cross-sectional view for explaining a manufacturing method of the present invention.

【図2】本発明の製造方法を説明する為の(A)平面
図、(B)断面図である。
FIG. 2A is a plan view and FIG. 2B is a cross-sectional view for explaining the manufacturing method of the present invention.

【図3】本発明の製造方法を説明する為の(A)平面
図、(B)断面図である。
3A is a plan view and FIG. 3B is a cross-sectional view for explaining the manufacturing method of the present invention.

【図4】本発明の製造方法を説明する為の(A)平面
図、(B)断面図である。
4A is a plan view and FIG. 4B is a cross-sectional view for explaining the manufacturing method of the present invention.

【図5】本発明の製造方法を説明する為の(A)平面
図、(B)断面図である。
5A is a plan view and FIG. 5B is a cross-sectional view for explaining the manufacturing method of the present invention.

【図6】本発明の半導体装置を説明する為の(A)断面
図、(B)裏面図、(C)側面図である。
6A is a cross-sectional view, FIG. 6B is a rear view, and FIG. 6C is a side view for explaining the semiconductor device of the present invention.

【図7】本発明の半導体装置を裏面側からみた斜視図で
ある。
FIG. 7 is a perspective view of the semiconductor device of the present invention as viewed from the back side.

【図8】本発明の半導体装置を実装したときの状態を説
明する断面図である。
FIG. 8 is a cross-sectional view illustrating a state when the semiconductor device of the present invention is mounted.

【図9】従来の半導体装置を説明する図である。FIG. 9 is a diagram illustrating a conventional semiconductor device.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 半導体チップを固着する為の複数個の素
子搭載部と、それらの周辺部に配置され前記複数個の素
子搭載部を保持する枠体部と、該枠体部に形成した複数
個の位置合わせマークと、を少なくとも具備する基板を
準備する工程と、 前記基板のアイランド上に前記半導体チップを搭載する
工程と、 前記半導体チップを含め、前記複数個の素子搭載部を連
続した樹脂層で被覆する工程と、 前記枠体部に形成した位置合わせマークを基準として、
前記樹脂層と前記基板とをダイシングし、前記素子搭載
部に搭載された半導体チップを個々に分離して半導体素
子を形成することを特徴とする、半導体装置の製造方
法。
1. A plurality of device mounting portions for fixing a semiconductor chip, a frame portion disposed around the device mounting portions and holding the plurality of device mounting portions, and a plurality of frame portions formed on the frame portion. A step of preparing a substrate having at least a plurality of alignment marks; a step of mounting the semiconductor chip on an island of the substrate; and a resin in which the plurality of element mounting portions including the semiconductor chip are continuous. A step of coating with a layer, with reference to an alignment mark formed on the frame portion,
A method of manufacturing a semiconductor device, comprising: dicing the resin layer and the substrate; and separating a semiconductor chip mounted on the element mounting portion to form a semiconductor element.
【請求項2】 前記基板がリードフレームであることを
特徴とする請求項1記載の半導体装置の製造方法。
2. The method according to claim 1, wherein the substrate is a lead frame.
【請求項3】 前記樹脂層を形成する工程がトランスフ
ァーモールドであることを特徴とする請求項1記載の半
導体装置の製造方法。
3. The method according to claim 1, wherein the step of forming the resin layer is transfer molding.
JP34629997A 1997-12-16 1997-12-16 Manufacturing method of semiconductor device Expired - Lifetime JP3877405B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34629997A JP3877405B2 (en) 1997-12-16 1997-12-16 Manufacturing method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34629997A JP3877405B2 (en) 1997-12-16 1997-12-16 Manufacturing method of semiconductor device

Publications (2)

Publication Number Publication Date
JPH11176856A true JPH11176856A (en) 1999-07-02
JP3877405B2 JP3877405B2 (en) 2007-02-07

Family

ID=18382463

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3877405B2 (en)

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Publication number Priority date Publication date Assignee Title
US6350631B1 (en) 1999-05-27 2002-02-26 Matsushita Electric Industrial Co., Ltd. Electronic device, method of manufacturing the same, and apparatus for manufacturing the same
JP2003037236A (en) * 2001-07-26 2003-02-07 Rohm Co Ltd Method for manufacturing semiconductor device, and semiconductor device manufactured by the same
JP2004207275A (en) * 2002-12-20 2004-07-22 Sanyo Electric Co Ltd Circuit device and its manufacturing method
JP2016219520A (en) * 2015-05-18 2016-12-22 Towa株式会社 Semiconductor device and manufacturing method of the same
JP2019029569A (en) * 2017-08-01 2019-02-21 大日本印刷株式会社 Lead frame and manufacturing method of semiconductor device
JP2020088035A (en) * 2018-11-19 2020-06-04 ローム株式会社 Manufacturing method for semiconductor device
JP2022091907A (en) * 2018-03-16 2022-06-21 ローム株式会社 Semiconductor device
JP2022093654A (en) * 2017-08-01 2022-06-23 大日本印刷株式会社 Lead frame and manufacturing method of semiconductor device

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6350631B1 (en) 1999-05-27 2002-02-26 Matsushita Electric Industrial Co., Ltd. Electronic device, method of manufacturing the same, and apparatus for manufacturing the same
US6440774B2 (en) 1999-05-27 2002-08-27 Matsushita Electric Industrial Co., Ltd. Electronic device, method of manufacturing the same, and apparatus for manufacturing the same
JP2003037236A (en) * 2001-07-26 2003-02-07 Rohm Co Ltd Method for manufacturing semiconductor device, and semiconductor device manufactured by the same
JP4672201B2 (en) * 2001-07-26 2011-04-20 ローム株式会社 Manufacturing method of semiconductor device
JP2004207275A (en) * 2002-12-20 2004-07-22 Sanyo Electric Co Ltd Circuit device and its manufacturing method
JP2016219520A (en) * 2015-05-18 2016-12-22 Towa株式会社 Semiconductor device and manufacturing method of the same
JP2019029569A (en) * 2017-08-01 2019-02-21 大日本印刷株式会社 Lead frame and manufacturing method of semiconductor device
JP2022093654A (en) * 2017-08-01 2022-06-23 大日本印刷株式会社 Lead frame and manufacturing method of semiconductor device
JP2022091907A (en) * 2018-03-16 2022-06-21 ローム株式会社 Semiconductor device
JP2020088035A (en) * 2018-11-19 2020-06-04 ローム株式会社 Manufacturing method for semiconductor device

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