JPH1117219A - Dh構造半導体発光素子 - Google Patents
Dh構造半導体発光素子Info
- Publication number
- JPH1117219A JPH1117219A JP16773298A JP16773298A JPH1117219A JP H1117219 A JPH1117219 A JP H1117219A JP 16773298 A JP16773298 A JP 16773298A JP 16773298 A JP16773298 A JP 16773298A JP H1117219 A JPH1117219 A JP H1117219A
- Authority
- JP
- Japan
- Prior art keywords
- type
- layer
- light emitting
- emitting device
- semiconductor light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
- H10H20/8242—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP characterised by the dopants
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
- H01S5/3054—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure p-doping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
- H01S5/3086—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure doping of the active layer
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Led Devices (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US87057097A | 1997-06-06 | 1997-06-06 | |
| US870,570 | 1997-06-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH1117219A true JPH1117219A (ja) | 1999-01-22 |
| JPH1117219A5 JPH1117219A5 (enExample) | 2006-11-02 |
Family
ID=25355686
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16773298A Pending JPH1117219A (ja) | 1997-06-06 | 1998-06-01 | Dh構造半導体発光素子 |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0886326A3 (enExample) |
| JP (1) | JPH1117219A (enExample) |
| KR (1) | KR19990006633A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100855340B1 (ko) * | 2007-05-11 | 2008-09-04 | (주)더리즈 | 발광 다이오드 소자의 제조 방법 |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3698402B2 (ja) | 1998-11-30 | 2005-09-21 | シャープ株式会社 | 発光ダイオード |
| AU4557300A (en) | 1999-04-27 | 2000-11-10 | Karandashov, Sergey | Radiation source |
| JP2001274456A (ja) | 2000-01-18 | 2001-10-05 | Sharp Corp | 発光ダイオード |
| US6835957B2 (en) * | 2002-07-30 | 2004-12-28 | Lumileds Lighting U.S., Llc | III-nitride light emitting device with p-type active layer |
| DE102007003282B4 (de) * | 2007-01-23 | 2023-12-21 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Leuchtdiodenchip |
| KR101976455B1 (ko) * | 2012-10-19 | 2019-05-09 | 엘지이노텍 주식회사 | 발광 소자 및 발광 소자 패키지 |
| JP6595801B2 (ja) | 2014-05-30 | 2019-10-23 | エルジー イノテック カンパニー リミテッド | 発光素子 |
| WO2017023535A1 (en) | 2015-07-31 | 2017-02-09 | Sxaymiq Technologies Llc | Light emitting diode with displaced p-type doping |
| DE102017123542A1 (de) * | 2017-10-10 | 2019-04-11 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung eines optoelektronischen Halbleiterchips und optoelektronischer Halbleiterchip |
| GB202315794D0 (en) * | 2023-10-16 | 2023-11-29 | Univ Surrey | A Semiconductor Optical Device |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59208888A (ja) * | 1983-05-13 | 1984-11-27 | Nec Corp | 化合物半導体発光素子 |
| JPS63155683A (ja) * | 1986-12-19 | 1988-06-28 | Fujitsu Ltd | 半導体発光装置 |
| EP0540799A1 (en) * | 1991-11-04 | 1993-05-12 | International Business Machines Corporation | Improved AlGaInP diodes emitting visible light |
| US5376580A (en) * | 1993-03-19 | 1994-12-27 | Hewlett-Packard Company | Wafer bonding of light emitting diode layers |
-
1998
- 1998-01-19 EP EP98100853A patent/EP0886326A3/en not_active Withdrawn
- 1998-06-01 JP JP16773298A patent/JPH1117219A/ja active Pending
- 1998-06-03 KR KR1019980020571A patent/KR19990006633A/ko not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100855340B1 (ko) * | 2007-05-11 | 2008-09-04 | (주)더리즈 | 발광 다이오드 소자의 제조 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0886326A3 (en) | 1999-11-24 |
| KR19990006633A (ko) | 1999-01-25 |
| EP0886326A2 (en) | 1998-12-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050601 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060914 |
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| A131 | Notification of reasons for refusal |
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| A601 | Written request for extension of time |
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| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20080508 |
|
| A02 | Decision of refusal |
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