JPH1116868A5 - - Google Patents

Info

Publication number
JPH1116868A5
JPH1116868A5 JP1997171699A JP17169997A JPH1116868A5 JP H1116868 A5 JPH1116868 A5 JP H1116868A5 JP 1997171699 A JP1997171699 A JP 1997171699A JP 17169997 A JP17169997 A JP 17169997A JP H1116868 A5 JPH1116868 A5 JP H1116868A5
Authority
JP
Japan
Prior art keywords
treatment tank
pure water
treated
flow rate
chemical solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997171699A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1116868A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9171699A priority Critical patent/JPH1116868A/ja
Priority claimed from JP9171699A external-priority patent/JPH1116868A/ja
Priority to US09/105,029 priority patent/US6159303A/en
Publication of JPH1116868A publication Critical patent/JPH1116868A/ja
Publication of JPH1116868A5 publication Critical patent/JPH1116868A5/ja
Pending legal-status Critical Current

Links

JP9171699A 1997-06-27 1997-06-27 薬液置換装置及び薬液置換方法 Pending JPH1116868A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP9171699A JPH1116868A (ja) 1997-06-27 1997-06-27 薬液置換装置及び薬液置換方法
US09/105,029 US6159303A (en) 1997-06-27 1998-06-25 Liquid displacement apparatus and liquid displacement method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9171699A JPH1116868A (ja) 1997-06-27 1997-06-27 薬液置換装置及び薬液置換方法

Publications (2)

Publication Number Publication Date
JPH1116868A JPH1116868A (ja) 1999-01-22
JPH1116868A5 true JPH1116868A5 (enExample) 2005-04-28

Family

ID=15928049

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9171699A Pending JPH1116868A (ja) 1997-06-27 1997-06-27 薬液置換装置及び薬液置換方法

Country Status (2)

Country Link
US (1) US6159303A (enExample)
JP (1) JPH1116868A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6360756B1 (en) * 1999-06-03 2002-03-26 Taiwan Semiconductor Manufacturing Company, Ltd Wafer rinse tank for metal etching and method for using
FR2797405B1 (fr) * 1999-08-12 2001-10-26 Coillard Sa Ets Bac de rincage a liquide ultra propre
DE102005015758A1 (de) * 2004-12-08 2006-06-14 Astec Halbleitertechnologie Gmbh Verfahren und Vorrichtung zum Ätzen von in einer Ätzlösung aufgenommenen Substraten
JP6053624B2 (ja) * 2012-06-29 2016-12-27 台湾上村股▲分▼有限公司Ｔａｉｗａｎ Ｕｙｅｍｕｒａ Ｃｏ．， Ｌｔｄ． 微細気泡式処理装置
CN111570380B (zh) * 2020-06-19 2022-07-19 北京北方华创微电子装备有限公司 槽式清洗设备的过泡保护装置及过泡保护方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19517573C2 (de) * 1995-05-12 2000-11-02 Steag Micro Tech Gmbh Verfahren und Vorrichtung zur Naßbehandlung von Substraten in einem Behälter
US5673713A (en) * 1995-12-19 1997-10-07 Lg Semicon Co., Ltd. Apparatus for cleansing semiconductor wafer
KR0179784B1 (ko) * 1995-12-19 1999-04-15 문정환 반도체 웨이퍼 세정장치

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