JPH11168063A - ステージ装置、走査型露光装置及び露光方法 - Google Patents

ステージ装置、走査型露光装置及び露光方法

Info

Publication number
JPH11168063A
JPH11168063A JP10267092A JP26709298A JPH11168063A JP H11168063 A JPH11168063 A JP H11168063A JP 10267092 A JP10267092 A JP 10267092A JP 26709298 A JP26709298 A JP 26709298A JP H11168063 A JPH11168063 A JP H11168063A
Authority
JP
Japan
Prior art keywords
stage
movable body
substrate
exposure apparatus
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP10267092A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11168063A5 (enExample
Inventor
Takechika Nishi
健爾 西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP10267092A priority Critical patent/JPH11168063A/ja
Publication of JPH11168063A publication Critical patent/JPH11168063A/ja
Publication of JPH11168063A5 publication Critical patent/JPH11168063A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP10267092A 1997-09-19 1998-09-21 ステージ装置、走査型露光装置及び露光方法 Withdrawn JPH11168063A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10267092A JPH11168063A (ja) 1997-09-19 1998-09-21 ステージ装置、走査型露光装置及び露光方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP27342097 1997-09-19
JP9-273420 1997-09-19
JP10267092A JPH11168063A (ja) 1997-09-19 1998-09-21 ステージ装置、走査型露光装置及び露光方法

Publications (2)

Publication Number Publication Date
JPH11168063A true JPH11168063A (ja) 1999-06-22
JPH11168063A5 JPH11168063A5 (enExample) 2005-11-10

Family

ID=26547712

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10267092A Withdrawn JPH11168063A (ja) 1997-09-19 1998-09-21 ステージ装置、走査型露光装置及び露光方法

Country Status (1)

Country Link
JP (1) JPH11168063A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006203113A (ja) * 2005-01-24 2006-08-03 Nikon Corp ステージ装置、ステージ制御方法、露光装置及び方法、並びにデバイス製造方法
WO2010068825A3 (en) * 2008-12-12 2010-08-26 Seneca Merger Sub, Inc. Method for improving motion times of a stage
KR101487060B1 (ko) * 2011-07-19 2015-01-28 캐논 가부시끼가이샤 하전 입자 빔 묘화 장치 및 물품 제조 방법
CN112820682A (zh) * 2021-01-08 2021-05-18 杭州长川科技股份有限公司 晶圆输送机构及晶圆测试设备
JP2022165301A (ja) * 2021-04-19 2022-10-31 東京エレクトロン株式会社 基板を搬送する装置、及び基板を搬送する方法
JPWO2023199485A1 (enExample) * 2022-04-14 2023-10-19
CN120085519A (zh) * 2025-05-08 2025-06-03 上海图双精密装备有限公司 扫描单元、扫描方法以及包括扫描单元的光刻设备

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006203113A (ja) * 2005-01-24 2006-08-03 Nikon Corp ステージ装置、ステージ制御方法、露光装置及び方法、並びにデバイス製造方法
WO2010068825A3 (en) * 2008-12-12 2010-08-26 Seneca Merger Sub, Inc. Method for improving motion times of a stage
US8120304B2 (en) 2008-12-12 2012-02-21 Formfactor, Inc. Method for improving motion times of a stage
US8310195B2 (en) 2008-12-12 2012-11-13 Formfactor, Inc. Method for improving motion times of a stage
KR101487060B1 (ko) * 2011-07-19 2015-01-28 캐논 가부시끼가이샤 하전 입자 빔 묘화 장치 및 물품 제조 방법
CN112820682A (zh) * 2021-01-08 2021-05-18 杭州长川科技股份有限公司 晶圆输送机构及晶圆测试设备
JP2022165301A (ja) * 2021-04-19 2022-10-31 東京エレクトロン株式会社 基板を搬送する装置、及び基板を搬送する方法
JPWO2023199485A1 (enExample) * 2022-04-14 2023-10-19
WO2023199485A1 (ja) * 2022-04-14 2023-10-19 Ｊｓｗアクティナシステム株式会社 搬送装置、移載方法、搬送方法、及び半導体装置の製造方法
CN120085519A (zh) * 2025-05-08 2025-06-03 上海图双精密装备有限公司 扫描单元、扫描方法以及包括扫描单元的光刻设备

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