JPH11150053A - 露光方法及び装置 - Google Patents

露光方法及び装置

Info

Publication number
JPH11150053A
JPH11150053A JP9316921A JP31692197A JPH11150053A JP H11150053 A JPH11150053 A JP H11150053A JP 9316921 A JP9316921 A JP 9316921A JP 31692197 A JP31692197 A JP 31692197A JP H11150053 A JPH11150053 A JP H11150053A
Authority
JP
Japan
Prior art keywords
exposure
optical system
projection optical
reticle
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP9316921A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11150053A5 (enExample
Inventor
Tetsuo Taniguchi
哲夫 谷口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP9316921A priority Critical patent/JPH11150053A/ja
Priority to AU11734/99A priority patent/AU1173499A/en
Priority to PCT/JP1998/005184 priority patent/WO1999026279A1/ja
Publication of JPH11150053A publication Critical patent/JPH11150053A/ja
Publication of JPH11150053A5 publication Critical patent/JPH11150053A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9316921A 1997-11-18 1997-11-18 露光方法及び装置 Withdrawn JPH11150053A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP9316921A JPH11150053A (ja) 1997-11-18 1997-11-18 露光方法及び装置
AU11734/99A AU1173499A (en) 1997-11-18 1998-11-18 Exposure method and aligner
PCT/JP1998/005184 WO1999026279A1 (fr) 1997-11-18 1998-11-18 Procede d'exposition et graveur a projection

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9316921A JPH11150053A (ja) 1997-11-18 1997-11-18 露光方法及び装置

Publications (2)

Publication Number Publication Date
JPH11150053A true JPH11150053A (ja) 1999-06-02
JPH11150053A5 JPH11150053A5 (enExample) 2005-07-14

Family

ID=18082410

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9316921A Withdrawn JPH11150053A (ja) 1997-11-18 1997-11-18 露光方法及び装置

Country Status (3)

Country Link
JP (1) JPH11150053A (enExample)
AU (1) AU1173499A (enExample)
WO (1) WO1999026279A1 (enExample)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004311639A (ja) * 2003-04-04 2004-11-04 Nikon Corp 露光装置及び露光方法、並びにデバイス製造方法
JP2005243953A (ja) * 2004-02-26 2005-09-08 Canon Inc 露光装置及び方法
JP2007059906A (ja) * 2005-08-23 2007-03-08 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2009117556A (ja) * 2007-11-05 2009-05-28 Canon Inc 露光装置及びデバイス製造方法
JP2012084928A (ja) * 2008-12-24 2012-04-26 Asml Netherlands Bv 最適化方法およびリソグラフィセル
JP2013065857A (ja) * 2011-09-15 2013-04-11 Carl Zeiss Smt Gmbh マイクロリソグラフィ投影露光装置
JP2020197609A (ja) * 2019-05-31 2020-12-10 キヤノン株式会社 露光装置、および物品製造方法
KR20230168129A (ko) 2022-06-03 2023-12-12 캐논 가부시끼가이샤 결정 방법, 노광 방법, 정보 처리 장치, 기억 매체, 노광 장치 및 물품 제조 방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3395280B2 (ja) * 1993-09-21 2003-04-07 株式会社ニコン 投影露光装置及び方法
JP3555233B2 (ja) * 1995-04-13 2004-08-18 株式会社ニコン 投影露光装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004311639A (ja) * 2003-04-04 2004-11-04 Nikon Corp 露光装置及び露光方法、並びにデバイス製造方法
JP2005243953A (ja) * 2004-02-26 2005-09-08 Canon Inc 露光装置及び方法
JP2007059906A (ja) * 2005-08-23 2007-03-08 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2009117556A (ja) * 2007-11-05 2009-05-28 Canon Inc 露光装置及びデバイス製造方法
JP2012084928A (ja) * 2008-12-24 2012-04-26 Asml Netherlands Bv 最適化方法およびリソグラフィセル
US8612045B2 (en) 2008-12-24 2013-12-17 Asml Holding N.V. Optimization method and a lithographic cell
JP2013065857A (ja) * 2011-09-15 2013-04-11 Carl Zeiss Smt Gmbh マイクロリソグラフィ投影露光装置
JP2020197609A (ja) * 2019-05-31 2020-12-10 キヤノン株式会社 露光装置、および物品製造方法
KR20230168129A (ko) 2022-06-03 2023-12-12 캐논 가부시끼가이샤 결정 방법, 노광 방법, 정보 처리 장치, 기억 매체, 노광 장치 및 물품 제조 방법

Also Published As

Publication number Publication date
AU1173499A (en) 1999-06-07
WO1999026279A1 (fr) 1999-05-27

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