JPH11135471A - Substrate cleaning device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate cleaning device capable of cleaning efficiently substrates with a small quantity of electrolytic ion water. SOLUTION: A substrate conveying face is formed by a conveying roller 5 arranged aslant for a horizontal direction within a face perpendicular to a conveying direction of a substrate B, and a substrate B is conveyed in an inclined position within a primary washing bath 21 along this substrate conveying face. Further, a liquid outlet member 6 is disposed on an upstream side of this substrate conveying face and electrolytic ion water L is supplied in a curtain-like (a band-like) manner from this liquid outlet member 6 to an end edge on an upstream side of the substrate B, and it flows downward from an upstream side to a downstream side on an inclined face of the substrate B, and at a flowing time, a surface of the substrate B is cleaned. For this reason, the electrolytic ion water L supplied to the substrate B all flows on a main face of the substrate B, and moreover the electrolytic ion water is discharged from an electrolytic ion water outlet port to the substrate B, and a contact degree with an air is more considerably reduced than a case of supplying in a shower-like manner and the deterioration of the electrolytic ion water L is suppressed.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of supplying electrolytic ionic water or ozone water to a plate-like substrate such as a glass substrate for a liquid crystal display device, a semiconductor substrate, a printed substrate and a substrate for a plasma display. And a substrate cleaning apparatus for performing a cleaning process.

[0002]

2. Description of the Related Art Conventionally, as cleaning water for cleaning a substrate, electrolytic ion water containing a large amount of hydrogen ions or hydroxide ions due to dissociation of water or ozone water in which ozone is dissolved has been used. For example, as a substrate cleaning apparatus using electrolytic ion water as cleaning water, an overflow-type substrate cleaning apparatus has been conventionally known.

This overflow type substrate cleaning apparatus includes a processing tank for storing electrolytic ionized water, and an overflow tank provided on an outer periphery of an upper portion of the processing tank, and is configured so that the substrate can be immersed in the processing tank. . A cleaning water supply port is provided at the bottom of the processing tank. Cleaning water (electrolytic ionized water) is supplied to the processing tank from the cleaning water circulation system through the cleaning water supply port, and the cleaning water is supplied to the substrate in the processing tank. Has been spouted. Further, by intermittently supplying the cleaning water to the processing tank, the cleaning water overflows to the overflow tank via the overflow surface of the upper opening of the processing tank, and the overflowing cleaning water is again reused by the cleaning water circulation system. It is supplied to the processing tank. Therefore, when the substrate that has been subjected to the chemical treatment in the previous step is immersed in the processing tank in the overflow state as described above, the substrate is cleaned by electrolytic ion water.

[0004]

As described above, conventionally, in order to wash a substrate that has been treated with a chemical solution with electrolytic ionic water, the substrate is placed in the processing tank while overflowing the electrolytic ionic water in the processing tank. Immersed. For this reason, a large amount of electrolytic ion water is required for the water washing treatment, and the treatment time is long.

As one method for solving this problem, instead of circulating the electrolytic ion water in the processing tank as described above, for example, a spray nozzle is disposed above the processing tank, and the electrolytic ion water is supplied from the spray nozzle. A so-called shower cleaning method in which water is discharged in a shower shape to clean the substrate in the processing bath is considered. However, if the substrate is cleaned by this shower cleaning method, a sufficient cleaning effect cannot be obtained. This is because the cleaning effect of the electrolytic ionic water on the substrate is closely related to the amount of hydrogen ions or hydroxide ions contained in the electrolytic ionic water. Although it will deteriorate significantly, in the shower cleaning method as described above, electrolytic ion water is discharged in a shower shape,
This is because the degree of contact between the electrolytic ionic water and the air is high, and contaminants (fine particles, organic substances, etc.) and ions in the air react with the electrolytic ionic water and greatly reduce the amount of ions in the electrolytic ionic water. .

As described above, in the past, in order to wash a substrate with electrolytic ionic water, an overflow method had to be employed, a large amount of electrolytic ionic water was required for cleaning the substrate, It was one of the main factors raising costs.

[0007] Also, when using ozone water, in the shower cleaning method, the amount of dissolved ozone is reduced by contact with air, and the cleaning effect is reduced, causing the same problem as in the case of electrolytic ionic water. Was.

The present invention has been made to solve the above problems, and has as its object to provide a substrate cleaning apparatus capable of satisfactorily cleaning a substrate with a small amount of electrolytic ion water or ozone water. And

[0009]

According to the first aspect of the present invention,
A substrate cleaning apparatus for supplying electrolytic ionic water to a substrate and performing a cleaning process on the substrate, wherein the substrate transport surface is inclined with respect to a horizontal direction in a plane orthogonal to a predetermined transport direction to achieve the above object. A transport means for transporting the substrate along, and a liquid supply port is disposed on the upper side of the substrate transport surface, and electrolytic ionic water is ejected from the liquid supply port toward the substrate transported by the transport means in a strip shape. Means for supplying electrolytic ion water to the main surface of the substrate.

According to the present invention, the electrolytic ionic water is supplied from the electrolytic ionic water supply means to the substrate being transported in the inclined posture from the upper side of the substrate transport surface in a band shape, and the substrate is cleaned while being cleaned. Along the lower stream. Therefore, all of the electrolytic ionic water supplied to the substrate flows on the main surface of the substrate, and the substrate is efficiently cleaned with a smaller amount of electrolytic ionic water. Moreover, the electrolytic ionic water is discharged in a strip shape from the liquid discharge port toward the substrate, and the degree of contact with air is greatly reduced as compared with the case where the electrolytic ionic water is supplied in the form of a shower. I have.

According to a second aspect of the present invention, there is provided a substrate cleaning apparatus for performing a cleaning process on a substrate by supplying ozone water to the substrate. A transfer unit that transfers the substrate along a substrate transfer surface that is inclined with respect to the horizontal direction, and a liquid supply port is disposed on the upper side of the substrate transfer surface, and the substrate is transferred from the liquid supply port by the transfer unit. And ozone water supply means for supplying ozone water to the main surface of the substrate by discharging ozone water in a belt shape toward the substrate.

In the present invention, ozone water is supplied from the ozone water supply means to the substrate being transported in an inclined posture from the upper side of the substrate transport surface in a belt shape, and the main surface of the substrate is cleaned along the inclination while being cleaned. Flows to the lower side. For this reason, all the ozone water supplied to the substrate flows on the main surface of the substrate, and the substrate is efficiently cleaned with a smaller amount of ozone water. In addition, the ozone water is discharged in a strip shape from the liquid discharge port toward the substrate, and the degree of contact with air is greatly reduced as compared with a case where the ozone water is supplied in a shower shape, so that the deterioration of the ozone water is suppressed.

Further, the electrolytic ionized water supply means or the ozone water supply means has a liquid discharge member having a slit-shaped discharge port having a predetermined length in the transport direction (claim 3). The ion water is discharged in a strip shape from the discharge port of the liquid discharge member to the substrate.

[0014]

FIG. 1 is a view showing a substrate processing apparatus to which an embodiment of a substrate cleaning apparatus according to the present invention is applied. This is a device for cleaning the substrate B, which has been treated with a chemical solution by supplying a predetermined chemical solution to the surface (surface), with electrolytic ionic water and then drying.
In this substrate processing apparatus 1, first and second water washing units 2, 3 as one embodiment of a substrate cleaning apparatus according to the present invention.
And the drying unit 4 are sequentially arranged in series from the upstream side (the left hand side in the figure).

The first rinsing section 2, the second rinsing section 3 and the drying section 4 are respectively provided with a box-shaped first rinsing tank 21, a second rinsing tank 31 and a drying tank 41. . Further, the upstream and downstream walls of each of the tanks 21, 31, and 41 are provided with horizontally opposed substrate passage openings 11 which are opposed to each other.
1 to be carried in and out.

As a transfer means for transferring the substrate B in each of the tanks 21, 31, 41, a roller conveyor is applied. In this roller conveyor, transport rollers 5 having a support shaft inclined with respect to the horizontal direction in a plane perpendicular to the transport direction of the substrate B (the right-hand direction in FIG. 1) are arranged side by side at substantially equal pitch in the transport direction. Thus, a substrate transfer surface is formed, and the substrates are rotated synchronously in the same direction by driving of a drive unit (not shown). Therefore, each of the tanks 21 and 31 of the substrate B,
The transport path in 41 is inclined in the width direction as a whole with respect to the transport direction, and the substrate B is transported in an inclined posture along the substrate transport surface of the inclined transport path while the tanks 21 and 3 are transported.
Predetermined processing is performed in 1, 41. In the present embodiment, the inclination angle α (FIG. 3) of the substrate B with respect to the horizontal plane is set to approximately 5 °.

After the substrate B has been changed from the preceding step (chemical solution processing step) to an inclined position via an unillustrated upstream handover means, the substrate B is disposed immediately upstream of the primary washing section 2. It is transferred to the roller 5 and is then introduced into the substrate processing apparatus 1 by the drive of the transport roller 5, where it is transported by the transport roller 5 in the transport direction (the right-hand direction in FIG. 1) while the first rinsing unit 2 Liquid discharging member (processing liquid supply means)
Cleaning treatment by the supply of electrolytic ionic water from 6 is performed,
Subsequently, a second washing process is performed in the second washing tank 31 by supplying electrolytic ionic water from the liquid discharge member (processing liquid supply means) 6 and the electrolytic ionic water supply nozzle 32, and the like.
After the drying process is performed in the last drying tank 41 by the gas injection supply from the air knife 42, the drying tank 41 is returned to the original horizontal position via downstream handover means (not shown) disposed immediately downstream of the drying tank 41. And is derived for the next process. The liquid discharge member 6 has a slit-shaped discharge port having a predetermined length in the substrate transport direction.

In the present embodiment, the substrate cleaning apparatus 10 according to the present invention is applied to a part of the first rinsing section 2 and a part of the second rinsing section 3. Hereinafter, the substrate cleaning apparatus 10 according to the present invention will be described as applied to the first water washing section 2. FIG. 2 is a partially cutaway perspective view showing an embodiment of the primary washing tank 21 of the primary washing section 2. As shown in the figure, in the primary washing tank 21, five transport rollers 5 are provided between the upstream and downstream substrate passage openings 11 at the same height level in the transport direction (right-hand direction). The first washing tank 2 is moved from the substrate passage opening 11 on the upstream side by the synchronous rotation of the respective transport rollers 5 in the same direction by a driving means (not shown).
The substrate B introduced into 1 is transported in the first washing tank 21 toward the substrate passage port 11 on the downstream side.

The transport roller 5 has a roller shaft 51 bridged between its side walls in the primary washing tank 21 so as to be rotatable around its own axis, and a roller shaft 51 on both left and right sides of the roller shaft 51.
A pair of left and right side rollers 52 provided so as to be able to rotate together with
And a central roller 53 provided at the center of the roller shaft 51.
And a so-called partially supported roller formed from the above. By applying such a partially supported roller, it is possible to control the bending, reduce the contact area of the back surface of the substrate B with the transport roller 5, and supply the electrolytic ion water and gas to the back surface of the substrate B satisfactorily. In addition, it is possible to minimize the contamination due to the contact between the transport roller 5 and the back surface of the substrate B in the cleaning step and the drying step.

Each of the left and right side rollers 52 has a flange 52a integral with the side roller 52 on the outer side thereof, and is mounted on each of the rollers 52 and 53 by the flange 52a. In addition, the lateral displacement of the substrate B conveyed is prevented, and in particular, the lower-side flange portion 52a prevents the substrate B from sliding down along the inclined surface of the transport path. Further, an O-ring 54 as a cushioning material made of a flexible material such as rubber is externally fitted to each of the rollers 52 and 53, so that the substrate B can be reliably transported by the anti-slip action of the O-ring 54. I have to.

In the primary washing tank 21, a support frame 25 extending in the transport direction is provided on the inner wall on the upper side of the transport roller 5 at a substantially central portion in the transport direction. 25
The liquid discharge member 6 is fixed so that the slit-shaped discharge port facing downward is arranged along the transport direction.
The length dimension of the liquid discharge member 6 in the front-rear direction is set to approximately 1/3 of the length dimension (dimension extending in the transport direction) of the substrate B. Then, as shown in FIG. 2, the substrate cleaning area A by the discharge of the electrolytic ionic water L from the liquid discharge member 6 is provided on a portion of the substrate B from the portion facing the liquid discharge member 6 to the lower side edge. Is formed.

On the other hand, an electrolytic ionic water storage tank 22 for storing electrolytic ionic water L to be supplied to the liquid discharging member 6 is provided near the primary washing tank 21. An electrolytic ion water pipe 22 a is provided between the electrolytic ion water storage tank 22 and the liquid discharge member 6, and a space between the bottom of the primary washing tank 21 and the upper part of the electrolytic ion water storage tank 22. Is provided with an electrolytic ionic water return conduit 22b. These electrolytic ionic water conduit 22a and electrolytic ionic water return conduit 22b
Thus, a circulation pipe for circulating the electrolytic ion water L in the electrolytic ion water storage tank 22 through the liquid discharge member 6 is formed.

An electrolytic ionic water pump 23 is provided in an electrolytic ionic water pipe 22 a immediately downstream of the electrolytic ionic water storage tank 22, and an electrolytic ionic water pump 23 is provided immediately downstream of the electrolytic ionic water pump 23. A generating device 24 is provided. The electrolytic ionic water generating device 24 includes an electrode (not shown) and the like, and newly electrolyzes the introduced electrolytic ionic water L to generate new electrolytic ionic water. Here, among the electrolyzed electrolytic ionic waters, those containing a large amount of hydroxide ions are used, but new electrolytic ionic water containing a large amount of hydrogen ions is generated by the electrolytic ionic water generator 24 according to the object to be cleaned. Then, this may be used as washing water.

By driving the electrolytic ionic water pump 23, the electrolytic ionic water L in the electrolytic ionic water storage tank 22 first contains a large amount of hydroxide ions in the electrolytic ionic water generator 24 through the electrolytic ionic water conduit 22a. New electrolytic ionized water is formed, and then the liquid is discharged from the liquid discharging member 6 to the transport roller 5.
The liquid is discharged in a strip shape toward the upper edge of the surface of the substrate B having the upper inclined posture, and the surface of the substrate B is subjected to cleaning processing while flowing down along the inclination of the substrate B. It falls from the edge to the bottom of the primary washing tank 21, is returned to the electrolytic ion water storage tank 22 via the electrolytic ion water return pipe 22b, and is thereafter circulated. If necessary, a filter for removing foreign matter may be inserted downstream of the electrolytic ion water pump 23.

FIG. 3 is a partially cutaway perspective view showing one embodiment of the liquid discharging member 6. First, the liquid ejection member 6 is formed to include a long rectangular parallelepiped member main body 61 extending in the front-rear direction and a tapered nozzle portion 62 extending from a lower portion of the member main body 61. The member main body 61 has an electrolytic ionized water supply pipe 63 extending in the front-rear direction therein, and has a connection cylinder 64 in which a male screw is screwed at the top. The joint 22 c provided at the downstream end of the electrolytic ion water pipe 22 a is screwed to the connection tube 64, so that the electrolytic ion water pipe 22 a is connected to the liquid discharge member 6.

The nozzle portion 62 is provided with a slit-shaped electrolytic ion water discharge port 65 extending in the front-rear direction and communicating with the electrolytic ion water supply conduit 63. The member main body 61 is passed through the electrolytic ion water conduit 22a. The electrolytic ionic water L supplied to the electrolytic ionic water supply pipe 63 is supplied onto the substrate B from the electrolytic ionic water discharge port 65.

FIGS. 4A and 4B are explanatory views for explaining the operation of the present invention. FIG. 4A shows a state immediately after the front end of the substrate B in the transport direction has entered the substrate cleaning area A, and FIG. (C) shows a state in which the central part in the front-rear direction is located in the substrate cleaning area A, and (c) shows a state in which the substrate B is led out of the substrate cleaning area A.

First, as shown in FIG. 4A, the sheet is introduced into the first washing tank 21 through the substrate passage port 11 on the upstream side (the left hand side in FIG. 4) by the driving of the transport roller 5. The substrate B, which has entered the substrate cleaning area A, is driven by the electrolytic ionic water pump 23 (FIGS. 1 and 2) on the upper side of the front end in the transport direction, through the electrolytic ionic water conduit 22a to discharge the electrolytic ionic water from the liquid discharging member 6. The electrolytic ion water L discharged from the outlet 65 is supplied, and the electrolytic ion water L flows down from the upper side to the lower side on the front end side surface of the substrate B, whereby the substrate B is cleaned. The treated electrolytic ion water L falls to the bottom of the first washing tank 21 through the lower edge of the substrate B.
Since the electrolytic ionic water L flows down along the inclination of the substrate B, the electrolytic ionic water L travels along the surface of the substrate B and
The inconvenience of leaking out of the primary washing tank 21 from the rear edge of the first washing tank 21 is avoided.

Next, as shown in FIG. 4B, the central portion of the substrate B is moved to the substrate cleaning area A by driving the transport roller 5.
, The electrolytic ionic water L discharged from the liquid discharge member 6 is supplied to the upper edge of the central portion of the substrate B, whereby the central portion of the substrate B is cleaned, and the electrolytic solution after the treatment is removed. Ionized water L passes through the lower edge of
Next, it falls to the bottom of the washing tank 21. Then, the electrolytic ionic water L vigorously flows down along the inclination of the substrate B, and does not flow downstream as a liquid flow. Therefore, the surface of the substrate B passing through the liquid discharge member 6 on the downstream side becomes electrolytic ionic water. The water L remains in a very thin film state.

Further, as shown in FIG. 4C, when the substrate B is completely removed from the substrate cleaning area A by the driving of the transport roller 5, the surface of the substrate B already has the electrolytic ionized water L. Is completed, and the surface of the substrate B is in an out-of-liquid state in which only an extremely thin film of electrolytic ionic water L is present. Therefore, the second washing unit 3 (FIG. In the water washing treatment in 1), the amount of the electrolytic ion water L mixed into the electrolytic ion water can be minimized, and the generation of particles due to the electrolytic ion water L due to the partial drying of the surface of the substrate B can be prevented. It is possible to suppress it reliably.

The substrate cleaning apparatus 10 according to this embodiment
As described in detail above, the substrate B is transported in the first washing tank 21 in an inclined posture by the transport roller 5 that is inclined with respect to the horizontal direction in a plane orthogonal to the transport direction of the substrate B. In this case, since the electrolytic ionic water L supplied from the liquid discharging member 6 is supplied in a curtain shape (band shape) to the upper edge of the substrate B, the electrolytic ionic water L supplied to the substrate B is Then, the inclined surface of the substrate B flows down from the upper side to the lower side, and at this time, the surface of the substrate B is cleaned. Therefore, all the electrolytic ionic water L supplied to the substrate B flows on the main surface of the substrate B, and the electrolytic ionic water L
Is discharged in a strip shape from the electrolytic ion water discharge port 65 toward the substrate B, the degree of contact with air is greatly reduced as compared with the case of supplying in a shower form, and the deterioration of the electrolytic ion water L (the electrolytic ion water Decrease in the amount of hydroxide ions). As a result, the substrate can be efficiently cleaned with a smaller amount of electrolytic ion water, and the running cost of the substrate cleaning can be reduced.

According to the substrate cleaning apparatus 10, the electrolytic ionic water L flows along the slope, that is, the substrate cleaning area A
Therefore, the substrate B is transported in a state where a large amount of the electrolytic ion water L does not transfer to the upstream side and the downstream side of the substrate cleaning area A on the substrate B. Therefore, unlike the related art, the draining process of the electrolytic ionic water L is performed without providing a draining unit such as an air knife at the boundary between the first washing tank 21 and the second washing tank 31. In addition, it is possible to reduce the equipment cost, and since the extremely thin thin film layer of the electrolytic ion water L is formed on the surface of the substrate B on the downstream side of the substrate cleaning area A, Since it is not necessary to blow air or the like until the process shifts to 31, the surface of the substrate B is partially dried, which does not cause inconvenience such as generation of particles. The effect is great.

In the above description, the substrate cleaning apparatus 10 according to the present invention has been described as being applied to the primary rinsing section 2. However, a part of the secondary rinsing section 3 is also used for the primary rinsing section. The configuration is the same as that of the unit 2, and the same effect is obtained.

The present invention is not limited to the above embodiment, but includes the following contents.

(1) In the above embodiment, the inclination angle of the substrate B conveyed in the inclined posture by the conveyance roller 5 in the substrate processing apparatus 1 is set to approximately 5 °. The inclination angle is not limited to being set to approximately 5 °, but may be set to 1 ° to 40 °.
Further, more preferably, the inclination of the treatment liquid at an angle of 3 to 40 ° or more improves the flowability of the treatment liquid.

(2) In the above embodiment, only the surface of the substrate B is treated by the electrolytic ionic water L discharged from the liquid discharging member 6.
The present invention is not limited to treating only the front surface of the substrate B, but a liquid discharging member for discharging electrolytic ionic water L is provided on the upper surface of the rear surface of the substrate B being transported. , The back surface of the substrate B may be processed. By doing so, the electrolytic ionized water L discharged to the upper side of the back surface of the substrate B flows down along the inclination of the substrate B, so that the back surface of the substrate B is cleaned without any trouble.

(3) If an ozone water generator for dissolving ozone in pure water is used instead of the electrolytic ion water generator 24, washing using ozone water can be performed. Also in this case, similarly to the case of the above-described embodiment using electrolytic ionized water, the degree of contact between ozone water and air can be significantly reduced to suppress deterioration of ozone water, and as a result, less ozone water can be used. High cleaning effect can be obtained.

[0038]

According to the first aspect of the invention, since the electrolytic ionic water is supplied from the electrolytic ionic water supply means to the substrate being transported in the inclined posture from the upper side of the substrate transport surface, All of the supplied electrolytic ionic water flows on the main surface of the substrate. In addition, when supplying the electrolytic ionic water to the substrate, the electrolytic ionic water is discharged in a band shape from the liquid supply port toward the substrate, so that the degree of contact with air is greater than when supplying in the form of a shower. And the deterioration of electrolytic ionic water can be suppressed. Therefore, the substrate can be efficiently cleaned with a smaller amount of electrolytic ion water.

According to the second aspect of the invention, the ozone water is supplied from the ozone water supply means to the substrate being transported in an inclined position from the upper side of the substrate transfer surface. All of the water flows over the main surface of the substrate. In addition, when supplying ozone water to the substrate, ozone water is discharged in a band shape from the liquid supply port toward the substrate, so the degree of contact with air is greatly reduced compared to the case where ozone water is supplied in the form of a shower. Thus, deterioration of the ozone water can be suppressed. Therefore, the substrate can be efficiently cleaned with a smaller amount of ozone water.

According to the third aspect of the present invention, a liquid discharge member having a slit-shaped discharge port having a predetermined length in the transport direction is employed as the electrolytic ionic water supply means (or ozone water supply means). Therefore, the electrolytic ionized water (or ozone water) is discharged from the liquid discharge member to the substrate in a band shape, and the main surface of the substrate is uniformly exposed to the electrolytic ionized water flow (or ozone water flow), and the substrate cleaning with less variation is performed. Processing can be performed.

[Brief description of the drawings]

FIG. 1 is a view showing a substrate processing apparatus to which an embodiment of a substrate cleaning apparatus according to the present invention is applied.

FIG. 2 is a partially cutaway perspective view showing an embodiment of a first washing tank.

FIG. 3 is a partially cutaway perspective view showing one embodiment of a liquid discharge member.

FIG. 4 is an explanatory diagram for explaining an operation of the present invention;
(A) is the state immediately after the front end of the substrate in the transport direction has entered the substrate processing area, (b) is the state where the center of the substrate in the front-rear direction is located in the substrate processing area, and (c) is the substrate processing area. Each state derived from is shown.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 10 Substrate washing | cleaning apparatus 11 Substrate passage port 2 Primary washing | cleaning part (substrate washing | cleaning apparatus) 21 Primary washing tank 22 Electrolyzed ionic water storage tank 22a Electrolyzed ionic water pipe 22b Electrolyzed ionic water return pipe 23 Electrolyzed ion Water pump 24 Electrolyzed ionic water generator 3 Secondary washing unit (substrate washing device) 31 Secondary washing tank 32 Pure water supply nozzle 5 Transport roller 51 Roller shaft 52 Side roller 52a Flange 53 Central roller 54 O-ring 6 Liquid discharge member (electrolytic ion water supply means) 61 Member main body 62 Nozzle section 63 Electrolyte ion water supply conduit 64 Connection tube 65 Electrolytic ion water discharge port A Substrate cleaning area B Substrate

Claims (3)

[Claims] 1. A substrate cleaning apparatus for supplying electrolytic ionic water to a substrate to perform a cleaning process on the substrate, wherein the substrate is disposed along a substrate transport surface inclined with respect to a horizontal direction in a plane orthogonal to a predetermined transport direction. Transport means for transporting the substrate, a liquid supply port is disposed on the upper side of the substrate transport surface, and electrolytic ionic water is discharged in a strip shape from the liquid supply port toward the substrate transported by the transport means, thereby forming a main part of the substrate. A substrate cleaning apparatus, comprising: electrolytic ionic water supply means for supplying electrolytic ionic water to a surface. 2. A substrate cleaning apparatus for supplying ozone water to a substrate to perform a cleaning process on the substrate, wherein the substrate is cleaned along a substrate transport surface inclined with respect to a horizontal direction in a plane orthogonal to a predetermined transport direction. A transporting means for transporting, a liquid supply port is arranged on the upper side of the substrate transporting surface, and ozone water is discharged in a belt shape from the liquid supply port toward the substrate transported by the transporting means on the main surface of the substrate. A substrate cleaning apparatus comprising: ozone water supply means for supplying ozone water. 3. The liquid supply device according to claim 1, wherein the electrolytic ionic water supply unit or the ozone water supply unit includes a liquid discharge member having a slit-shaped discharge port having a predetermined length in the transport direction. A substrate cleaning apparatus as described in the above.