JPH1062809A5 - - Google Patents

Info

Publication number
JPH1062809A5
JPH1062809A5 JP1996213414A JP21341496A JPH1062809A5 JP H1062809 A5 JPH1062809 A5 JP H1062809A5 JP 1996213414 A JP1996213414 A JP 1996213414A JP 21341496 A JP21341496 A JP 21341496A JP H1062809 A5 JPH1062809 A5 JP H1062809A5
Authority
JP
Japan
Prior art keywords
substrate
projection
pattern
exposure method
scanning direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996213414A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1062809A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8213414A priority Critical patent/JPH1062809A/ja
Priority claimed from JP8213414A external-priority patent/JPH1062809A/ja
Priority to KR1019970015622A priority patent/KR100468234B1/ko
Priority to US08/848,394 priority patent/US6204912B1/en
Publication of JPH1062809A publication Critical patent/JPH1062809A/ja
Publication of JPH1062809A5 publication Critical patent/JPH1062809A5/ja
Pending legal-status Critical Current

Links

JP8213414A 1996-05-08 1996-08-13 投影露光方法 Pending JPH1062809A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8213414A JPH1062809A (ja) 1996-08-13 1996-08-13 投影露光方法
KR1019970015622A KR100468234B1 (ko) 1996-05-08 1997-04-25 노광방법,노광장치및디스크
US08/848,394 US6204912B1 (en) 1996-05-08 1997-05-08 Exposure method, exposure apparatus, and mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8213414A JPH1062809A (ja) 1996-08-13 1996-08-13 投影露光方法

Publications (2)

Publication Number Publication Date
JPH1062809A JPH1062809A (ja) 1998-03-06
JPH1062809A5 true JPH1062809A5 (cg-RX-API-DMAC7.html) 2004-08-19

Family

ID=16638842

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8213414A Pending JPH1062809A (ja) 1996-05-08 1996-08-13 投影露光方法

Country Status (1)

Country Link
JP (1) JPH1062809A (cg-RX-API-DMAC7.html)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW447009B (en) 1999-02-12 2001-07-21 Nippon Kogaku Kk Scanning exposure method and scanning type exposure device
KR101006435B1 (ko) * 2003-09-01 2011-01-06 삼성전자주식회사 노광 마스크, 이를 포함하는 노광 장치 및 이를 이용한표시 장치용 표시판의 제조 방법
US7704850B2 (en) * 2006-09-08 2010-04-27 Asml Netherlands B.V. Semiconductor device for measuring an overlay error, method for measuring an overlay error, lithographic apparatus and device manufacturing method
KR102547257B1 (ko) 2017-07-25 2023-06-23 도판 인사츠 가부시키가이샤 노광 장치 및 노광 방법
JP7204507B2 (ja) * 2019-02-05 2023-01-16 キオクシア株式会社 露光方法および露光装置
JP6734573B2 (ja) * 2019-03-22 2020-08-05 株式会社ニコン 露光装置、並びにディスプレイ及びデバイスの製造方法
JP2019117403A (ja) * 2019-03-22 2019-07-18 株式会社ニコン 露光装置、並びにディスプレイ及びデバイスの製造方法

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