JP2000133563A5 - - Google Patents

Download PDF

Info

Publication number
JP2000133563A5
JP2000133563A5 JP1998300523A JP30052398A JP2000133563A5 JP 2000133563 A5 JP2000133563 A5 JP 2000133563A5 JP 1998300523 A JP1998300523 A JP 1998300523A JP 30052398 A JP30052398 A JP 30052398A JP 2000133563 A5 JP2000133563 A5 JP 2000133563A5
Authority
JP
Japan
Prior art keywords
photosensitive substrate
exposure
mask
pattern
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1998300523A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000133563A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP10300523A priority Critical patent/JP2000133563A/ja
Priority claimed from JP10300523A external-priority patent/JP2000133563A/ja
Publication of JP2000133563A publication Critical patent/JP2000133563A/ja
Publication of JP2000133563A5 publication Critical patent/JP2000133563A5/ja
Withdrawn legal-status Critical Current

Links

JP10300523A 1998-10-22 1998-10-22 露光方法及び露光装置 Withdrawn JP2000133563A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10300523A JP2000133563A (ja) 1998-10-22 1998-10-22 露光方法及び露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10300523A JP2000133563A (ja) 1998-10-22 1998-10-22 露光方法及び露光装置

Publications (2)

Publication Number Publication Date
JP2000133563A JP2000133563A (ja) 2000-05-12
JP2000133563A5 true JP2000133563A5 (cg-RX-API-DMAC7.html) 2005-10-27

Family

ID=17885851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10300523A Withdrawn JP2000133563A (ja) 1998-10-22 1998-10-22 露光方法及び露光装置

Country Status (1)

Country Link
JP (1) JP2000133563A (cg-RX-API-DMAC7.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002043214A (ja) 2000-07-26 2002-02-08 Toshiba Corp 走査型露光方法
US6870168B1 (en) * 2003-11-12 2005-03-22 Eastman Kodak Company Varying feature size in resist across the chip without the artifact of “grid-snapping” from the mask writing tool
JP5470707B2 (ja) * 2008-01-17 2014-04-16 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
JP5644290B2 (ja) * 2010-09-08 2014-12-24 凸版印刷株式会社 フォトマスクの製造方法
CN114820430B (zh) * 2022-02-18 2023-10-03 成都飞机工业（集团）有限责任公司 一种多光源协同曝光的3d打印无损检测方法

Similar Documents

Publication Publication Date Title
JP3564735B2 (ja) 走査型露光装置及び露光方法
JPH11162832A5 (cg-RX-API-DMAC7.html)
EP0957384A3 (en) Optical image forming method and device, image forming apparatus and aligner for lithography
JPH06510397A (ja) フィールドの狭い走査器
EP1363166A3 (en) Apparatus and method for writing a lithographic pattern
JP2003151880A (ja) 露光装置及び露光方法、並びにデバイス製造方法
JPH11195602A5 (ja) 露光方法
KR970077116A (ko) 노광 방법 및 노광 장치
JP2000133563A5 (cg-RX-API-DMAC7.html)
KR101626644B1 (ko) 노광 장치, 노광 방법, 디바이스의 제조 방법 및 개구판
JP2005031274A (ja) 画像記録装置及び画像記録方法
JP2002043214A (ja) 走査型露光方法
KR970023646A (ko) 주사형 투영 노광장치 및 방법
JPH09320945A5 (cg-RX-API-DMAC7.html)
JP3056206B1 (ja) ダミーパターン形成方法及び半導体製造方法
US5875712A (en) Methods and arrangement for the production of a stencil by a modified laser printer
JP4092753B2 (ja) 走査型露光装置及び走査露光方法
JPWO2023282211A5 (cg-RX-API-DMAC7.html)
JP2005116779A5 (cg-RX-API-DMAC7.html)
JP3126645B2 (ja) 走査型露光装置、デバイス製造方法およびデバイス
JPH09298155A5 (cg-RX-API-DMAC7.html)
JP2003223008A (ja) 露光装置及び露光方法
KR950020975A (ko) 스캐닝 노출방법
JP2001044111A (ja) 走査型露光装置とその制御方法
JP2000133564A5 (cg-RX-API-DMAC7.html)