JPH1046339A - 基板ハンドリング方法 - Google Patents

基板ハンドリング方法

Info

Publication number
JPH1046339A
JPH1046339A JP8199174A JP19917496A JPH1046339A JP H1046339 A JPH1046339 A JP H1046339A JP 8199174 A JP8199174 A JP 8199174A JP 19917496 A JP19917496 A JP 19917496A JP H1046339 A JPH1046339 A JP H1046339A
Authority
JP
Japan
Prior art keywords
substrate
mask
substrate holder
center
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8199174A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1046339A5 (enExample
Inventor
Yoshiyuki Nakano
喜之 中野
Hatsuhiko Shibazaki
初彦 柴崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP8199174A priority Critical patent/JPH1046339A/ja
Publication of JPH1046339A publication Critical patent/JPH1046339A/ja
Publication of JPH1046339A5 publication Critical patent/JPH1046339A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP8199174A 1996-07-29 1996-07-29 基板ハンドリング方法 Pending JPH1046339A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8199174A JPH1046339A (ja) 1996-07-29 1996-07-29 基板ハンドリング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8199174A JPH1046339A (ja) 1996-07-29 1996-07-29 基板ハンドリング方法

Publications (2)

Publication Number Publication Date
JPH1046339A true JPH1046339A (ja) 1998-02-17
JPH1046339A5 JPH1046339A5 (enExample) 2004-08-12

Family

ID=16403388

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8199174A Pending JPH1046339A (ja) 1996-07-29 1996-07-29 基板ハンドリング方法

Country Status (1)

Country Link
JP (1) JPH1046339A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6413381B1 (en) 2000-04-12 2002-07-02 Steag Hamatech Ag Horizontal sputtering system
US6874515B2 (en) * 2001-04-25 2005-04-05 Tokyo Electron Limited Substrate dual-side processing apparatus
WO2006090749A1 (ja) * 2005-02-23 2006-08-31 Mitsui Engineering & Shipbuilding Co., Ltd. 成膜装置における基板装着方法および成膜方法
WO2021004331A1 (zh) * 2019-07-05 2021-01-14 北京北方华创微电子装备有限公司 掩膜结构和fcva设备

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6413381B1 (en) 2000-04-12 2002-07-02 Steag Hamatech Ag Horizontal sputtering system
WO2001079582A3 (en) * 2000-04-12 2002-07-04 Steag Hamatech Ag Horizontal sputtering system
US6874515B2 (en) * 2001-04-25 2005-04-05 Tokyo Electron Limited Substrate dual-side processing apparatus
WO2006090749A1 (ja) * 2005-02-23 2006-08-31 Mitsui Engineering & Shipbuilding Co., Ltd. 成膜装置における基板装着方法および成膜方法
WO2021004331A1 (zh) * 2019-07-05 2021-01-14 北京北方华创微电子装备有限公司 掩膜结构和fcva设备
US11408064B2 (en) 2019-07-05 2022-08-09 Beijing Naura Microelectronics Equipment Co., Ltd. Mask structure and FCVA apparatus

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