JPH10321546A - 熱処理炉 - Google Patents
熱処理炉Info
- Publication number
- JPH10321546A JPH10321546A JP13179097A JP13179097A JPH10321546A JP H10321546 A JPH10321546 A JP H10321546A JP 13179097 A JP13179097 A JP 13179097A JP 13179097 A JP13179097 A JP 13179097A JP H10321546 A JPH10321546 A JP H10321546A
- Authority
- JP
- Japan
- Prior art keywords
- closed chamber
- chamber
- wafer
- circular
- processing chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 title claims abstract description 20
- 238000001816 cooling Methods 0.000 claims abstract description 11
- 229910052736 halogen Inorganic materials 0.000 abstract description 7
- 150000002367 halogens Chemical class 0.000 abstract description 7
- 239000013078 crystal Substances 0.000 abstract description 5
- 230000007547 defect Effects 0.000 abstract description 5
- 239000004065 semiconductor Substances 0.000 abstract description 4
- 239000000758 substrate Substances 0.000 abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 4
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 31
- 239000010453 quartz Substances 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- 229910001873 dinitrogen Inorganic materials 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 238000002791 soaking Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13179097A JPH10321546A (ja) | 1997-05-22 | 1997-05-22 | 熱処理炉 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13179097A JPH10321546A (ja) | 1997-05-22 | 1997-05-22 | 熱処理炉 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10321546A true JPH10321546A (ja) | 1998-12-04 |
| JPH10321546A5 JPH10321546A5 (enExample) | 2005-04-07 |
Family
ID=15066202
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13179097A Pending JPH10321546A (ja) | 1997-05-22 | 1997-05-22 | 熱処理炉 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10321546A (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102643958A (zh) * | 2012-04-26 | 2012-08-22 | 西北工业大学 | 盘形件梯度热处理装置 |
| KR101297981B1 (ko) * | 2011-10-07 | 2013-08-23 | (주) 예스티 | 기판의 열처리 장치 |
| KR101458962B1 (ko) * | 2014-02-18 | 2014-11-07 | 민정은 | 급속 열처리 장치 |
| KR20200058493A (ko) * | 2017-12-15 | 2020-05-27 | 시바우라 메카트로닉스 가부시끼가이샤 | 유기막 형성 장치 |
| WO2025069286A1 (ja) * | 2023-09-27 | 2025-04-03 | 株式会社日立ハイテク | ウエハ処理装置 |
-
1997
- 1997-05-22 JP JP13179097A patent/JPH10321546A/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101297981B1 (ko) * | 2011-10-07 | 2013-08-23 | (주) 예스티 | 기판의 열처리 장치 |
| CN102643958A (zh) * | 2012-04-26 | 2012-08-22 | 西北工业大学 | 盘形件梯度热处理装置 |
| KR101458962B1 (ko) * | 2014-02-18 | 2014-11-07 | 민정은 | 급속 열처리 장치 |
| KR20200058493A (ko) * | 2017-12-15 | 2020-05-27 | 시바우라 메카트로닉스 가부시끼가이샤 | 유기막 형성 장치 |
| US11906246B2 (en) | 2017-12-15 | 2024-02-20 | Shibaura Mechatronics Corporation | Organic film forming apparatus |
| WO2025069286A1 (ja) * | 2023-09-27 | 2025-04-03 | 株式会社日立ハイテク | ウエハ処理装置 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Effective date: 20040521 Free format text: JAPANESE INTERMEDIATE CODE: A523 |
|
| A621 | Written request for application examination |
Effective date: 20040521 Free format text: JAPANESE INTERMEDIATE CODE: A621 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20051115 |
|
| A131 | Notification of reasons for refusal |
Effective date: 20051220 Free format text: JAPANESE INTERMEDIATE CODE: A131 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20060418 |