JPH10321546A5 - - Google Patents

Info

Publication number
JPH10321546A5
JPH10321546A5 JP1997131790A JP13179097A JPH10321546A5 JP H10321546 A5 JPH10321546 A5 JP H10321546A5 JP 1997131790 A JP1997131790 A JP 1997131790A JP 13179097 A JP13179097 A JP 13179097A JP H10321546 A5 JPH10321546 A5 JP H10321546A5
Authority
JP
Japan
Prior art keywords
sealed chamber
wafer
treatment apparatus
heat treatment
introduction pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997131790A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10321546A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP13179097A priority Critical patent/JPH10321546A/ja
Priority claimed from JP13179097A external-priority patent/JPH10321546A/ja
Publication of JPH10321546A publication Critical patent/JPH10321546A/ja
Publication of JPH10321546A5 publication Critical patent/JPH10321546A5/ja
Pending legal-status Critical Current

Links

JP13179097A 1997-05-22 1997-05-22 熱処理炉 Pending JPH10321546A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13179097A JPH10321546A (ja) 1997-05-22 1997-05-22 熱処理炉

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13179097A JPH10321546A (ja) 1997-05-22 1997-05-22 熱処理炉

Publications (2)

Publication Number Publication Date
JPH10321546A JPH10321546A (ja) 1998-12-04
JPH10321546A5 true JPH10321546A5 (enExample) 2005-04-07

Family

ID=15066202

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13179097A Pending JPH10321546A (ja) 1997-05-22 1997-05-22 熱処理炉

Country Status (1)

Country Link
JP (1) JPH10321546A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101297981B1 (ko) * 2011-10-07 2013-08-23 (주) 예스티 기판의 열처리 장치
CN102643958B (zh) * 2012-04-26 2013-06-19 西北工业大学 盘形件梯度热处理装置
KR101458962B1 (ko) * 2014-02-18 2014-11-07 민정은 급속 열처리 장치
JP7008727B2 (ja) 2017-12-15 2022-01-25 芝浦メカトロニクス株式会社 有機膜形成装置
KR20250048007A (ko) * 2023-09-27 2025-04-07 주식회사 히타치하이테크 웨이퍼 처리 장치

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