JP2002280310A5 - - Google Patents

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Publication number
JP2002280310A5
JP2002280310A5 JP2001078739A JP2001078739A JP2002280310A5 JP 2002280310 A5 JP2002280310 A5 JP 2002280310A5 JP 2001078739 A JP2001078739 A JP 2001078739A JP 2001078739 A JP2001078739 A JP 2001078739A JP 2002280310 A5 JP2002280310 A5 JP 2002280310A5
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JP
Japan
Prior art keywords
inner tube
substrate
heat treatment
reaction vessel
treatment apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001078739A
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English (en)
Japanese (ja)
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JP2002280310A (ja
JP4593814B2 (ja
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Application filed filed Critical
Priority to JP2001078739A priority Critical patent/JP4593814B2/ja
Priority claimed from JP2001078739A external-priority patent/JP4593814B2/ja
Publication of JP2002280310A publication Critical patent/JP2002280310A/ja
Publication of JP2002280310A5 publication Critical patent/JP2002280310A5/ja
Application granted granted Critical
Publication of JP4593814B2 publication Critical patent/JP4593814B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001078739A 2001-03-19 2001-03-19 縦型熱処理装置 Expired - Fee Related JP4593814B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001078739A JP4593814B2 (ja) 2001-03-19 2001-03-19 縦型熱処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001078739A JP4593814B2 (ja) 2001-03-19 2001-03-19 縦型熱処理装置

Publications (3)

Publication Number Publication Date
JP2002280310A JP2002280310A (ja) 2002-09-27
JP2002280310A5 true JP2002280310A5 (enExample) 2007-12-27
JP4593814B2 JP4593814B2 (ja) 2010-12-08

Family

ID=18935312

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001078739A Expired - Fee Related JP4593814B2 (ja) 2001-03-19 2001-03-19 縦型熱処理装置

Country Status (1)

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JP (1) JP4593814B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102953049B (zh) * 2011-08-25 2015-07-08 沈阳金研机床工具有限公司 化学气相沉积法涂层装置
KR102731012B1 (ko) * 2019-09-04 2024-11-15 주식회사 원익아이피에스 기판처리장치
CN116153809A (zh) * 2022-12-16 2023-05-23 江苏卓远半导体有限公司 一种半导体的热处理设备及其使用方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0530357Y2 (enExample) * 1987-10-09 1993-08-03
JP2500421Y2 (ja) * 1989-11-20 1996-06-05 国際電気株式会社 低圧化学気相生成装置
JPH0953180A (ja) * 1995-08-18 1997-02-25 Sony Corp Ｃｖｄ装置
JP3423254B2 (ja) * 1998-06-02 2003-07-07 東京エレクトロン株式会社 真空処理装置

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