JP4593814B2 - 縦型熱処理装置 - Google Patents

縦型熱処理装置

Info

Publication number
JP4593814B2
JP4593814B2 JP2001078739A JP2001078739A JP4593814B2 JP 4593814 B2 JP4593814 B2 JP 4593814B2 JP 2001078739 A JP2001078739 A JP 2001078739A JP 2001078739 A JP2001078739 A JP 2001078739A JP 4593814 B2 JP4593814 B2 JP 4593814B2
Authority
JP
Japan
Prior art keywords
inner tube
top plate
heat treatment
tube
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001078739A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002280310A (ja
JP2002280310A5 (enExample
Inventor
寛晃 池川
貴尚 田代
裕史 酒井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2001078739A priority Critical patent/JP4593814B2/ja
Publication of JP2002280310A publication Critical patent/JP2002280310A/ja
Publication of JP2002280310A5 publication Critical patent/JP2002280310A5/ja
Application granted granted Critical
Publication of JP4593814B2 publication Critical patent/JP4593814B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001078739A 2001-03-19 2001-03-19 縦型熱処理装置 Expired - Fee Related JP4593814B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001078739A JP4593814B2 (ja) 2001-03-19 2001-03-19 縦型熱処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001078739A JP4593814B2 (ja) 2001-03-19 2001-03-19 縦型熱処理装置

Publications (3)

Publication Number Publication Date
JP2002280310A JP2002280310A (ja) 2002-09-27
JP2002280310A5 JP2002280310A5 (enExample) 2007-12-27
JP4593814B2 true JP4593814B2 (ja) 2010-12-08

Family

ID=18935312

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001078739A Expired - Fee Related JP4593814B2 (ja) 2001-03-19 2001-03-19 縦型熱処理装置

Country Status (1)

Country Link
JP (1) JP4593814B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102953049B (zh) * 2011-08-25 2015-07-08 沈阳金研机床工具有限公司 化学气相沉积法涂层装置
KR102731012B1 (ko) * 2019-09-04 2024-11-15 주식회사 원익아이피에스 기판처리장치
CN116153809A (zh) * 2022-12-16 2023-05-23 江苏卓远半导体有限公司 一种半导体的热处理设备及其使用方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0530357Y2 (enExample) * 1987-10-09 1993-08-03
JP2500421Y2 (ja) * 1989-11-20 1996-06-05 国際電気株式会社 低圧化学気相生成装置
JPH0953180A (ja) * 1995-08-18 1997-02-25 Sony Corp Ｃｖｄ装置
JP3423254B2 (ja) * 1998-06-02 2003-07-07 東京エレクトロン株式会社 真空処理装置

Also Published As

Publication number Publication date
JP2002280310A (ja) 2002-09-27

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