JPH10294290A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPH10294290A
JPH10294290A JP10119097A JP10119097A JPH10294290A JP H10294290 A JPH10294290 A JP H10294290A JP 10119097 A JP10119097 A JP 10119097A JP 10119097 A JP10119097 A JP 10119097A JP H10294290 A JPH10294290 A JP H10294290A
Authority
JP
Japan
Prior art keywords
film
forming
insulating film
etching
atmosphere
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10119097A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10294290A5 (enExample
Inventor
Tetsuo Gocho
哲雄 牛膓
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP10119097A priority Critical patent/JPH10294290A/ja
Publication of JPH10294290A publication Critical patent/JPH10294290A/ja
Publication of JPH10294290A5 publication Critical patent/JPH10294290A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP10119097A 1997-04-18 1997-04-18 半導体装置の製造方法 Pending JPH10294290A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10119097A JPH10294290A (ja) 1997-04-18 1997-04-18 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10119097A JPH10294290A (ja) 1997-04-18 1997-04-18 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPH10294290A true JPH10294290A (ja) 1998-11-04
JPH10294290A5 JPH10294290A5 (enExample) 2004-10-07

Family

ID=14294049

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10119097A Pending JPH10294290A (ja) 1997-04-18 1997-04-18 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPH10294290A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100447256B1 (ko) * 2002-06-29 2004-09-07 주식회사 하이닉스반도체 반도체 소자의 제조 방법
KR100646984B1 (ko) * 2000-06-30 2006-11-17 주식회사 하이닉스반도체 반도체 소자의 게이트 전극 형성 방법
US7732272B2 (en) 2002-11-19 2010-06-08 Oki Semiconductor Co., Ltd. Method of manufacturing semiconductor element

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100646984B1 (ko) * 2000-06-30 2006-11-17 주식회사 하이닉스반도체 반도체 소자의 게이트 전극 형성 방법
KR100447256B1 (ko) * 2002-06-29 2004-09-07 주식회사 하이닉스반도체 반도체 소자의 제조 방법
US7732272B2 (en) 2002-11-19 2010-06-08 Oki Semiconductor Co., Ltd. Method of manufacturing semiconductor element

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