JPH10289868A - 露光装置及び露光方法 - Google Patents

露光装置及び露光方法

Info

Publication number
JPH10289868A
JPH10289868A JP9111806A JP11180697A JPH10289868A JP H10289868 A JPH10289868 A JP H10289868A JP 9111806 A JP9111806 A JP 9111806A JP 11180697 A JP11180697 A JP 11180697A JP H10289868 A JPH10289868 A JP H10289868A
Authority
JP
Japan
Prior art keywords
error
exposure apparatus
exposure
information
data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9111806A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10289868A5 (enExample
Inventor
Takakazu Muto
貴和 武藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP9111806A priority Critical patent/JPH10289868A/ja
Publication of JPH10289868A publication Critical patent/JPH10289868A/ja
Publication of JPH10289868A5 publication Critical patent/JPH10289868A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9111806A 1997-04-15 1997-04-15 露光装置及び露光方法 Pending JPH10289868A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9111806A JPH10289868A (ja) 1997-04-15 1997-04-15 露光装置及び露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9111806A JPH10289868A (ja) 1997-04-15 1997-04-15 露光装置及び露光方法

Publications (2)

Publication Number Publication Date
JPH10289868A true JPH10289868A (ja) 1998-10-27
JPH10289868A5 JPH10289868A5 (enExample) 2005-05-19

Family

ID=14570633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9111806A Pending JPH10289868A (ja) 1997-04-15 1997-04-15 露光装置及び露光方法

Country Status (1)

Country Link
JP (1) JPH10289868A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002217095A (ja) * 2000-11-14 2002-08-02 Canon Inc 露光装置、半導体デバイス製造方法、半導体製造工場及び露光装置の保守方法並びに位置検出装置
JP2002289506A (ja) * 2001-03-28 2002-10-04 Nikon Corp 基板処理装置
JP2012147002A (ja) * 2003-06-13 2012-08-02 Lam Research Corporation 汎用プログラマブル半導体処理システムのためのアーキテクチャおよびその方法
KR20190106754A (ko) * 2018-03-08 2019-09-18 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피용 기계를 작동하기 위한 방법

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002217095A (ja) * 2000-11-14 2002-08-02 Canon Inc 露光装置、半導体デバイス製造方法、半導体製造工場及び露光装置の保守方法並びに位置検出装置
JP2002289506A (ja) * 2001-03-28 2002-10-04 Nikon Corp 基板処理装置
JP2012147002A (ja) * 2003-06-13 2012-08-02 Lam Research Corporation 汎用プログラマブル半導体処理システムのためのアーキテクチャおよびその方法
KR20190106754A (ko) * 2018-03-08 2019-09-18 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피용 기계를 작동하기 위한 방법
US11480883B2 (en) 2018-03-08 2022-10-25 Carl Zeiss Smt Gmbh Method for operating a machine for microlithography

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