JPH10289868A5 - - Google Patents

Info

Publication number
JPH10289868A5
JPH10289868A5 JP1997111806A JP11180697A JPH10289868A5 JP H10289868 A5 JPH10289868 A5 JP H10289868A5 JP 1997111806 A JP1997111806 A JP 1997111806A JP 11180697 A JP11180697 A JP 11180697A JP H10289868 A5 JPH10289868 A5 JP H10289868A5
Authority
JP
Japan
Prior art keywords
exposure
exposure apparatus
data
error
data relating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997111806A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10289868A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9111806A priority Critical patent/JPH10289868A/ja
Priority claimed from JP9111806A external-priority patent/JPH10289868A/ja
Publication of JPH10289868A publication Critical patent/JPH10289868A/ja
Publication of JPH10289868A5 publication Critical patent/JPH10289868A5/ja
Pending legal-status Critical Current

Links

JP9111806A 1997-04-15 1997-04-15 露光装置及び露光方法 Pending JPH10289868A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9111806A JPH10289868A (ja) 1997-04-15 1997-04-15 露光装置及び露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9111806A JPH10289868A (ja) 1997-04-15 1997-04-15 露光装置及び露光方法

Publications (2)

Publication Number Publication Date
JPH10289868A JPH10289868A (ja) 1998-10-27
JPH10289868A5 true JPH10289868A5 (enExample) 2005-05-19

Family

ID=14570633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9111806A Pending JPH10289868A (ja) 1997-04-15 1997-04-15 露光装置及び露光方法

Country Status (1)

Country Link
JP (1) JPH10289868A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002217095A (ja) * 2000-11-14 2002-08-02 Canon Inc 露光装置、半導体デバイス製造方法、半導体製造工場及び露光装置の保守方法並びに位置検出装置
JP2002289506A (ja) * 2001-03-28 2002-10-04 Nikon Corp 基板処理装置
US7228257B1 (en) * 2003-06-13 2007-06-05 Lam Research Corporation Architecture for general purpose programmable semiconductor processing system and methods therefor
DE102018105322A1 (de) 2018-03-08 2019-09-12 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer industriellen Maschine

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