JPH10284407A - 露光装置及び露光装置を用いた半導体デバイスの製造方法 - Google Patents

露光装置及び露光装置を用いた半導体デバイスの製造方法

Info

Publication number
JPH10284407A
JPH10284407A JP9105214A JP10521497A JPH10284407A JP H10284407 A JPH10284407 A JP H10284407A JP 9105214 A JP9105214 A JP 9105214A JP 10521497 A JP10521497 A JP 10521497A JP H10284407 A JPH10284407 A JP H10284407A
Authority
JP
Japan
Prior art keywords
illuminance
light
optical system
projection optical
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9105214A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10284407A5 (enExample
Inventor
Tetsuo Kikuchi
哲男 菊池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP9105214A priority Critical patent/JPH10284407A/ja
Publication of JPH10284407A publication Critical patent/JPH10284407A/ja
Publication of JPH10284407A5 publication Critical patent/JPH10284407A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9105214A 1997-04-08 1997-04-08 露光装置及び露光装置を用いた半導体デバイスの製造方法 Pending JPH10284407A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9105214A JPH10284407A (ja) 1997-04-08 1997-04-08 露光装置及び露光装置を用いた半導体デバイスの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9105214A JPH10284407A (ja) 1997-04-08 1997-04-08 露光装置及び露光装置を用いた半導体デバイスの製造方法

Publications (2)

Publication Number Publication Date
JPH10284407A true JPH10284407A (ja) 1998-10-23
JPH10284407A5 JPH10284407A5 (enExample) 2005-06-02

Family

ID=14401428

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9105214A Pending JPH10284407A (ja) 1997-04-08 1997-04-08 露光装置及び露光装置を用いた半導体デバイスの製造方法

Country Status (1)

Country Link
JP (1) JPH10284407A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018159005A1 (ja) * 2017-03-01 2018-09-07 株式会社Ｓｃｒｅｅｎホールディングス 露光装置、基板処理装置、基板の露光方法および基板処理方法
US10401736B2 (en) 2017-03-01 2019-09-03 SCREEN Holdings Co., Ltd. Exposure device, substrate processing apparatus, exposure method of substrate and substrate processing method
US10444636B2 (en) 2017-03-01 2019-10-15 SCREEN Holdings Co., Ltd. Exposure device substrate processing apparatus, exposure method of substrate and substrate processing method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018159005A1 (ja) * 2017-03-01 2018-09-07 株式会社Ｓｃｒｅｅｎホールディングス 露光装置、基板処理装置、基板の露光方法および基板処理方法
JP2018147918A (ja) * 2017-03-01 2018-09-20 株式会社Ｓｃｒｅｅｎホールディングス 露光装置、基板処理装置、基板の露光方法および基板処理方法
US10401736B2 (en) 2017-03-01 2019-09-03 SCREEN Holdings Co., Ltd. Exposure device, substrate processing apparatus, exposure method of substrate and substrate processing method
US10444636B2 (en) 2017-03-01 2019-10-15 SCREEN Holdings Co., Ltd. Exposure device substrate processing apparatus, exposure method of substrate and substrate processing method

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