JPH1022219A5 - - Google Patents

Info

Publication number
JPH1022219A5
JPH1022219A5 JP1996195531A JP19553196A JPH1022219A5 JP H1022219 A5 JPH1022219 A5 JP H1022219A5 JP 1996195531 A JP1996195531 A JP 1996195531A JP 19553196 A JP19553196 A JP 19553196A JP H1022219 A5 JPH1022219 A5 JP H1022219A5
Authority
JP
Japan
Prior art keywords
mask
photosensitive substrate
mirror
optical system
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996195531A
Other languages
English (en)
Japanese (ja)
Other versions
JP3669063B2 (ja
JPH1022219A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP19553196A priority Critical patent/JP3669063B2/ja
Priority claimed from JP19553196A external-priority patent/JP3669063B2/ja
Priority to KR1019970024882A priority patent/KR100492278B1/ko
Publication of JPH1022219A publication Critical patent/JPH1022219A/ja
Priority to US09/209,270 priority patent/US6317196B1/en
Priority to US09/955,116 priority patent/US6570641B2/en
Publication of JPH1022219A5 publication Critical patent/JPH1022219A5/ja
Application granted granted Critical
Publication of JP3669063B2 publication Critical patent/JP3669063B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP19553196A 1996-06-25 1996-07-05 投影露光装置 Expired - Fee Related JP3669063B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP19553196A JP3669063B2 (ja) 1996-07-05 1996-07-05 投影露光装置
KR1019970024882A KR100492278B1 (ko) 1996-07-05 1997-06-16 투영노광장치
US09/209,270 US6317196B1 (en) 1996-06-25 1998-12-11 Projection exposure apparatus
US09/955,116 US6570641B2 (en) 1996-06-25 2001-09-19 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19553196A JP3669063B2 (ja) 1996-07-05 1996-07-05 投影露光装置

Publications (3)

Publication Number Publication Date
JPH1022219A JPH1022219A (ja) 1998-01-23
JPH1022219A5 true JPH1022219A5 (enrdf_load_stackoverflow) 2004-07-29
JP3669063B2 JP3669063B2 (ja) 2005-07-06

Family

ID=16342647

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19553196A Expired - Fee Related JP3669063B2 (ja) 1996-06-25 1996-07-05 投影露光装置

Country Status (2)

Country Link
JP (1) JP3669063B2 (enrdf_load_stackoverflow)
KR (1) KR100492278B1 (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1070012C (zh) * 1998-08-04 2001-08-22 国家科学技术委员会高技术研究发展中心 全数字vsb调制器
TW392065B (en) * 1998-08-20 2000-06-01 Nikon Corp Laser interferometer, position measuring device and measuring method, exposure device and manufacturing methods thereof
EP1285222A4 (en) * 2000-05-17 2006-11-15 Zygo Corp INTERFEROMETRIC DEVICE AND INTERFEROMETRIC PROCEDURE
US7903258B2 (en) * 2004-02-11 2011-03-08 Koninklijke Philips Electronics N.V. System and method for positioning a product using a laser interferometer

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61251025A (ja) * 1985-04-30 1986-11-08 Canon Inc 投影露光装置
US4749867A (en) * 1985-04-30 1988-06-07 Canon Kabushiki Kaisha Exposure apparatus
JPH07249567A (ja) * 1994-03-09 1995-09-26 Nikon Corp 露光装置
KR100363932B1 (ko) * 1994-04-12 2003-08-21 가부시키가이샤 니콘 주사형노광장치
JPH07326567A (ja) * 1994-05-31 1995-12-12 Nikon Corp 等倍投影型露光装置

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