JPH10214973A5 - - Google Patents
Info
- Publication number
- JPH10214973A5 JPH10214973A5 JP1997029552A JP2955297A JPH10214973A5 JP H10214973 A5 JPH10214973 A5 JP H10214973A5 JP 1997029552 A JP1997029552 A JP 1997029552A JP 2955297 A JP2955297 A JP 2955297A JP H10214973 A5 JPH10214973 A5 JP H10214973A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- insulating film
- forming
- semiconductor device
- active layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP02955297A JP3696710B2 (ja) | 1997-01-28 | 1997-01-28 | 半導体装置の作製方法 |
| US09/014,639 US6355509B1 (en) | 1997-01-28 | 1998-01-28 | Removing a crystallization catalyst from a semiconductor film during semiconductor device fabrication |
| KR1019980003625A KR19980071177A (ko) | 1997-01-28 | 1998-01-30 | 반도체 장치의 제작 방법 |
| KR1019980003635A KR19980071187A (ko) | 1997-01-28 | 1998-01-31 | 액체운송 장치 및 액체운송 펌프의 제어방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP02955297A JP3696710B2 (ja) | 1997-01-28 | 1997-01-28 | 半導体装置の作製方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004276793A Division JP4317105B2 (ja) | 2004-09-24 | 2004-09-24 | 半導体装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10214973A JPH10214973A (ja) | 1998-08-11 |
| JPH10214973A5 true JPH10214973A5 (https=) | 2004-12-24 |
| JP3696710B2 JP3696710B2 (ja) | 2005-09-21 |
Family
ID=12279316
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP02955297A Expired - Fee Related JP3696710B2 (ja) | 1997-01-28 | 1997-01-28 | 半導体装置の作製方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP3696710B2 (https=) |
| KR (1) | KR19980071177A (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4712156B2 (ja) * | 1999-05-10 | 2011-06-29 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| US6858480B2 (en) | 2001-01-18 | 2005-02-22 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing semiconductor device |
-
1997
- 1997-01-28 JP JP02955297A patent/JP3696710B2/ja not_active Expired - Fee Related
-
1998
- 1998-01-30 KR KR1019980003625A patent/KR19980071177A/ko not_active Ceased
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