JPH10209136A5 - - Google Patents

Info

Publication number
JPH10209136A5
JPH10209136A5 JP1997351610A JP35161097A JPH10209136A5 JP H10209136 A5 JPH10209136 A5 JP H10209136A5 JP 1997351610 A JP1997351610 A JP 1997351610A JP 35161097 A JP35161097 A JP 35161097A JP H10209136 A5 JPH10209136 A5 JP H10209136A5
Authority
JP
Japan
Prior art keywords
nozzle
cleaning
dispensing
sog
delivery
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997351610A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10209136A (ja
JP4113272B2 (ja
Filing date
Publication date
Application filed filed Critical
Publication of JPH10209136A publication Critical patent/JPH10209136A/ja
Publication of JPH10209136A5 publication Critical patent/JPH10209136A5/ja
Application granted granted Critical
Publication of JP4113272B2 publication Critical patent/JP4113272B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP35161097A 1996-12-19 1997-12-19 給配ノズルを洗浄液で洗浄する方法 Expired - Fee Related JP4113272B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US3386396P 1996-12-19 1996-12-19
US033863 1996-12-19

Publications (3)

Publication Number Publication Date
JPH10209136A JPH10209136A (ja) 1998-08-07
JPH10209136A5 true JPH10209136A5 (enExample) 2005-07-28
JP4113272B2 JP4113272B2 (ja) 2008-07-09

Family

ID=21872893

Family Applications (1)

Application Number Title Priority Date Filing Date
JP35161097A Expired - Fee Related JP4113272B2 (ja) 1996-12-19 1997-12-19 給配ノズルを洗浄液で洗浄する方法

Country Status (4)

Country Link
US (1) US5958517A (enExample)
EP (1) EP0849774B1 (enExample)
JP (1) JP4113272B2 (enExample)
DE (1) DE69731934T2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5902399A (en) * 1995-07-27 1999-05-11 Micron Technology, Inc. Method and apparatus for improved coating of a semiconductor wafer
KR100271759B1 (ko) * 1997-07-25 2000-12-01 윤종용 포토레지스트코팅장치및방법
US6248168B1 (en) * 1997-12-15 2001-06-19 Tokyo Electron Limited Spin coating apparatus including aging unit and solvent replacement unit
KR100314806B1 (ko) 1998-10-29 2002-02-19 박종섭 스핀온글래스막형성방법
US20080041488A1 (en) * 2006-08-18 2008-02-21 Integrated Designs L.P. Fluid dispensing system for semiconductor manufacturing processes with self-cleaning dispense valve
WO2009123126A1 (ja) * 2008-03-31 2009-10-08 昭和電工株式会社 両面塗布装置および塗液の両面塗布方法、並びエッジリンス装置およびエッジリンス方法
JP5965729B2 (ja) * 2012-05-31 2016-08-10 東京エレクトロン株式会社 ノズル洗浄装置、ノズル洗浄方法および基板処理装置
JP6077437B2 (ja) * 2013-05-31 2017-02-08 東京エレクトロン株式会社 基板処理装置およびノズル洗浄方法
EP3318334A1 (en) 2016-11-04 2018-05-09 Solar-Semi GmbH Cleaning device for rinsing dispensing nozzles
JP7236318B2 (ja) * 2019-04-26 2023-03-09 東京エレクトロン株式会社 液処理装置、及び液処理方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1622090A (en) * 1921-05-28 1927-03-22 American Moistening Co Self-cleaning nozzle
US4607588A (en) * 1984-04-04 1986-08-26 Stants Richard O Parts coating apparatus and method
US4886012A (en) * 1987-06-30 1989-12-12 Mitsubishi Denki Kabushiki Kaisha Spin coating apparatus
US4823820A (en) * 1987-07-28 1989-04-25 Safety-Kleen Corp. Solvent vapor collection and evacuation system
JP2504549B2 (ja) * 1988-12-15 1996-06-05 パイオニア株式会社 流体供給処理装置
JP2665404B2 (ja) * 1991-02-18 1997-10-22 シャープ株式会社 半導体装置の製造方法
US5360995A (en) * 1993-09-14 1994-11-01 Texas Instruments Incorporated Buffered capped interconnect for a semiconductor device
US5565034A (en) * 1993-10-29 1996-10-15 Tokyo Electron Limited Apparatus for processing substrates having a film formed on a surface of the substrate
US5849084A (en) * 1996-06-21 1998-12-15 Micron Technology, Inc. Spin coating dispense arm assembly
US5779799A (en) * 1996-06-21 1998-07-14 Micron Technology, Inc. Substrate coating apparatus

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