JPH1020197A5 - - Google Patents

Info

Publication number
JPH1020197A5
JPH1020197A5 JP1996188365A JP18836596A JPH1020197A5 JP H1020197 A5 JPH1020197 A5 JP H1020197A5 JP 1996188365 A JP1996188365 A JP 1996188365A JP 18836596 A JP18836596 A JP 18836596A JP H1020197 A5 JPH1020197 A5 JP H1020197A5
Authority
JP
Japan
Prior art keywords
optical system
catadioptric
imaging
concave mirror
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996188365A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1020197A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8188365A priority Critical patent/JPH1020197A/ja
Priority claimed from JP8188365A external-priority patent/JPH1020197A/ja
Priority to KR1019970022137A priority patent/KR100470953B1/ko
Priority to US08/882,939 priority patent/US5835284A/en
Publication of JPH1020197A publication Critical patent/JPH1020197A/ja
Publication of JPH1020197A5 publication Critical patent/JPH1020197A5/ja
Pending legal-status Critical Current

Links

JP8188365A 1996-06-28 1996-06-28 反射屈折光学系及びその調整方法 Pending JPH1020197A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8188365A JPH1020197A (ja) 1996-06-28 1996-06-28 反射屈折光学系及びその調整方法
KR1019970022137A KR100470953B1 (ko) 1996-06-28 1997-05-30 반사굴절광학계및그조정방법
US08/882,939 US5835284A (en) 1996-06-28 1997-06-26 Catadioptric optical system and adjusting method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8188365A JPH1020197A (ja) 1996-06-28 1996-06-28 反射屈折光学系及びその調整方法

Publications (2)

Publication Number Publication Date
JPH1020197A JPH1020197A (ja) 1998-01-23
JPH1020197A5 true JPH1020197A5 (enExample) 2004-10-21

Family

ID=16222350

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8188365A Pending JPH1020197A (ja) 1996-06-28 1996-06-28 反射屈折光学系及びその調整方法

Country Status (3)

Country Link
US (1) US5835284A (enExample)
JP (1) JPH1020197A (enExample)
KR (1) KR100470953B1 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6512631B2 (en) * 1996-07-22 2003-01-28 Kla-Tencor Corporation Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
US5969882A (en) * 1997-04-01 1999-10-19 Nikon Corporation Catadioptric optical system
WO1999049366A1 (en) * 1998-03-20 1999-09-30 Nikon Corporation Photomask and projection exposure system
EP1079253A4 (en) * 1998-04-07 2004-09-01 Nikon Corp DEVICE AND PROCESS FOR PROJECTION EXPOSURE, AND OPTICAL SYSTEM WITH REFLECTION AND REFRACTION
EP1293832A1 (en) 1998-06-08 2003-03-19 Nikon Corporation Projection exposure apparatus and method
DE19939088A1 (de) 1998-08-18 2000-02-24 Nikon Corp Belichtungsvorrichtung und -verfahren
JP4717974B2 (ja) * 1999-07-13 2011-07-06 株式会社ニコン 反射屈折光学系及び該光学系を備える投影露光装置
JP4532647B2 (ja) * 2000-02-23 2010-08-25 キヤノン株式会社 露光装置
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2002083766A (ja) 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
DE10136387A1 (de) * 2001-07-26 2003-02-13 Zeiss Carl Objektiv, insbesondere Objektiv für die Halbleiter-Lithographie
TW575904B (en) * 2001-08-21 2004-02-11 Asml Us Inc Optical projection for microlithography
US7136220B2 (en) * 2001-08-21 2006-11-14 Carl Zeiss Smt Ag Catadioptric reduction lens
DE102006038398A1 (de) * 2006-08-15 2008-02-21 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61156737A (ja) * 1984-12-27 1986-07-16 Canon Inc 回路の製造方法及び露光装置
US5052763A (en) * 1990-08-28 1991-10-01 International Business Machines Corporation Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations
JPH0821955A (ja) * 1994-07-07 1996-01-23 Nikon Corp 反射屈折縮小投影光学系
US5668673A (en) * 1991-08-05 1997-09-16 Nikon Corporation Catadioptric reduction projection optical system
JPH06331932A (ja) * 1993-05-19 1994-12-02 Topcon Corp 投影光学装置
JP2817615B2 (ja) * 1994-01-31 1998-10-30 日本電気株式会社 縮小投影露光装置
JP3232473B2 (ja) * 1996-01-10 2001-11-26 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
EP1079253A4 (en) * 1998-04-07 2004-09-01 Nikon Corp DEVICE AND PROCESS FOR PROJECTION EXPOSURE, AND OPTICAL SYSTEM WITH REFLECTION AND REFRACTION

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