KR100470953B1 - 반사굴절광학계및그조정방법 - Google Patents

반사굴절광학계및그조정방법 Download PDF

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Publication number
KR100470953B1
KR100470953B1 KR1019970022137A KR19970022137A KR100470953B1 KR 100470953 B1 KR100470953 B1 KR 100470953B1 KR 1019970022137 A KR1019970022137 A KR 1019970022137A KR 19970022137 A KR19970022137 A KR 19970022137A KR 100470953 B1 KR100470953 B1 KR 100470953B1
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KR
South Korea
Prior art keywords
optical system
optical
axis
imaging
path
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Expired - Fee Related
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KR1019970022137A
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English (en)
Korean (ko)
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KR980005331A (ko
Inventor
데쯔오 다까하시
야스히로 오무라
Original Assignee
가부시키가이샤 니콘
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Publication of KR980005331A publication Critical patent/KR980005331A/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1019970022137A 1996-06-28 1997-05-30 반사굴절광학계및그조정방법 Expired - Fee Related KR100470953B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8188365A JPH1020197A (ja) 1996-06-28 1996-06-28 反射屈折光学系及びその調整方法
JP188365/1996 1996-06-28

Publications (2)

Publication Number Publication Date
KR980005331A KR980005331A (ko) 1998-03-30
KR100470953B1 true KR100470953B1 (ko) 2005-06-17

Family

ID=16222350

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970022137A Expired - Fee Related KR100470953B1 (ko) 1996-06-28 1997-05-30 반사굴절광학계및그조정방법

Country Status (3)

Country Link
US (1) US5835284A (enExample)
JP (1) JPH1020197A (enExample)
KR (1) KR100470953B1 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6512631B2 (en) * 1996-07-22 2003-01-28 Kla-Tencor Corporation Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
US5969882A (en) * 1997-04-01 1999-10-19 Nikon Corporation Catadioptric optical system
WO1999049366A1 (en) 1998-03-20 1999-09-30 Nikon Corporation Photomask and projection exposure system
EP1079253A4 (en) * 1998-04-07 2004-09-01 Nikon Corp DEVICE AND PROCESS FOR PROJECTION EXPOSURE, AND OPTICAL SYSTEM WITH REFLECTION AND REFRACTION
EP1293831A1 (en) 1998-06-08 2003-03-19 Nikon Corporation Projection exposure apparatus and method
DE19939088A1 (de) 1998-08-18 2000-02-24 Nikon Corp Belichtungsvorrichtung und -verfahren
JP4717974B2 (ja) * 1999-07-13 2011-07-06 株式会社ニコン 反射屈折光学系及び該光学系を備える投影露光装置
JP4532647B2 (ja) * 2000-02-23 2010-08-25 キヤノン株式会社 露光装置
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2002083766A (ja) 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
DE10136387A1 (de) * 2001-07-26 2003-02-13 Zeiss Carl Objektiv, insbesondere Objektiv für die Halbleiter-Lithographie
TW575904B (en) * 2001-08-21 2004-02-11 Asml Us Inc Optical projection for microlithography
US7136220B2 (en) * 2001-08-21 2006-11-14 Carl Zeiss Smt Ag Catadioptric reduction lens
DE102006038398A1 (de) * 2006-08-15 2008-02-21 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61156737A (ja) * 1984-12-27 1986-07-16 Canon Inc 回路の製造方法及び露光装置
US5052763A (en) * 1990-08-28 1991-10-01 International Business Machines Corporation Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations
JPH07221007A (ja) * 1994-01-31 1995-08-18 Nec Corp 縮小投影露光装置
JPH0821955A (ja) * 1994-07-07 1996-01-23 Nikon Corp 反射屈折縮小投影光学系
JPH09190969A (ja) * 1996-01-10 1997-07-22 Canon Inc 投影露光装置及びそれを用いたデバイスの製造方法
WO1999052004A1 (en) * 1998-04-07 1999-10-14 Nikon Corporation Projection exposure apparatus and method, and reflection refraction optical system

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5668673A (en) * 1991-08-05 1997-09-16 Nikon Corporation Catadioptric reduction projection optical system
JPH06331932A (ja) * 1993-05-19 1994-12-02 Topcon Corp 投影光学装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61156737A (ja) * 1984-12-27 1986-07-16 Canon Inc 回路の製造方法及び露光装置
US5052763A (en) * 1990-08-28 1991-10-01 International Business Machines Corporation Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations
JPH07221007A (ja) * 1994-01-31 1995-08-18 Nec Corp 縮小投影露光装置
JPH0821955A (ja) * 1994-07-07 1996-01-23 Nikon Corp 反射屈折縮小投影光学系
JPH09190969A (ja) * 1996-01-10 1997-07-22 Canon Inc 投影露光装置及びそれを用いたデバイスの製造方法
WO1999052004A1 (en) * 1998-04-07 1999-10-14 Nikon Corporation Projection exposure apparatus and method, and reflection refraction optical system

Also Published As

Publication number Publication date
JPH1020197A (ja) 1998-01-23
US5835284A (en) 1998-11-10
KR980005331A (ko) 1998-03-30

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