JPH10189424A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPH10189424A
JPH10189424A JP8350085A JP35008596A JPH10189424A JP H10189424 A JPH10189424 A JP H10189424A JP 8350085 A JP8350085 A JP 8350085A JP 35008596 A JP35008596 A JP 35008596A JP H10189424 A JPH10189424 A JP H10189424A
Authority
JP
Japan
Prior art keywords
mask
substrate
amount
photosensitive substrate
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8350085A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10189424A5 (enExample
Inventor
Tsuneo Miyai
恒夫 宮井
Masahiro Nei
正洋 根井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8350085A priority Critical patent/JPH10189424A/ja
Publication of JPH10189424A publication Critical patent/JPH10189424A/ja
Publication of JPH10189424A5 publication Critical patent/JPH10189424A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8350085A 1996-12-27 1996-12-27 露光装置 Pending JPH10189424A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8350085A JPH10189424A (ja) 1996-12-27 1996-12-27 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8350085A JPH10189424A (ja) 1996-12-27 1996-12-27 露光装置

Publications (2)

Publication Number Publication Date
JPH10189424A true JPH10189424A (ja) 1998-07-21
JPH10189424A5 JPH10189424A5 (enExample) 2004-12-16

Family

ID=18408141

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8350085A Pending JPH10189424A (ja) 1996-12-27 1996-12-27 露光装置

Country Status (1)

Country Link
JP (1) JPH10189424A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020064453A (ko) * 2001-02-01 2002-08-09 삼성전자 주식회사 반도체 노광시스템 및 이를 이용한 반도체 노광방법
JP2006135080A (ja) * 2004-11-05 2006-05-25 Toshiba Corp パターン形成方法
WO2007066687A1 (ja) * 2005-12-06 2007-06-14 Nikon Corporation 温度計測方法、露光方法、露光装置、及びデバイス製造方法
US9703212B2 (en) 2015-03-12 2017-07-11 Kabushiki Kaisha Toshiba Exposure apparatus
US11199784B2 (en) 2019-05-17 2021-12-14 Canon Kabushiki Kaisha Exposure apparatus and article manufacturing method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020064453A (ko) * 2001-02-01 2002-08-09 삼성전자 주식회사 반도체 노광시스템 및 이를 이용한 반도체 노광방법
JP2006135080A (ja) * 2004-11-05 2006-05-25 Toshiba Corp パターン形成方法
WO2007066687A1 (ja) * 2005-12-06 2007-06-14 Nikon Corporation 温度計測方法、露光方法、露光装置、及びデバイス製造方法
US9703212B2 (en) 2015-03-12 2017-07-11 Kabushiki Kaisha Toshiba Exposure apparatus
US11199784B2 (en) 2019-05-17 2021-12-14 Canon Kabushiki Kaisha Exposure apparatus and article manufacturing method

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